Laminate and method for manufacturing the same
There is provided a laminate that improves the electromagnetic wave shielding effect in a low frequency region. A laminate includes at least one non-magnetic metal layer and at least one magnetic metal layer, wherein the at least one magnetic metal layer contains an amorphous phase.
1 . A laminate comprising at least one non-magnetic metal layer and at least one magnetic metal layer, wherein the at least one non-magnetic metal layer is selected from the group consisting of copper foil and copper alloy foil, and at least one of the at least one magnetic metal layer comprises an amorphous phase, and wherein the at least one magnetic metal layer comprising the amorphous phase has a crystallinity of 40% or more and 75% or less.
2 . The laminate according to claim 1 , wherein the laminate is a formed product.
3 . The laminate according to claim 1 , wherein the at least one non-magnetic metal layer has a thickness of 4 to 100 μm.
4 . The laminate according to claim 1 , wherein the at least one magnetic metal layer has a thickness of 4 to 100 μm.
5 . The laminate according to claim 1 , wherein a total thickness of the at least one non-magnetic metal layer and the at least one magnetic metal layer is 15 to 150 μm.
6 . The laminate according to claim 1 , wherein in the at least one magnetic metal layer comprising the amorphous phase, a total amount of Fe, Ni and Co is 65.0 to 90.0 at %, an amount of Cu is 0 to 2.0 at %, a total amount of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Ag, Zn, Al, Sn, As, Sb, Bi and REM is 0 to 8.0 at %, and the rest is at least one selected from the group consisting of B, Si, P and C and impurities, and wherein a total amount of Fe, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Co, Ni, Ag, Zn, Al, Sn, As, Sb, Bi and REM is 65.0 to 90.0 at %.
7 . The laminate according to claim 1 , wherein in the at least one magnetic metal layer comprising the amorphous phase, a total amount of Fe, Ni and Co is 65.0 to 92.0 at %, an amount of Cu is 0 to 2.0 at %, a total amount of Ti, V, Ta, Cr, Mo, W, Mn, Ag, Zn, Al, Sn, As, Sb, Bi and REM is 0 to 8.0 at %, a total amount of B, Si, P and C is 0 to 10.0 at %, and the rest is at least one selected from the group consisting of Zr, Hf and Nb and impurities.
8 . The laminate according to claim 1 , wherein in the at least one magnetic metal layer comprising the amorphous phase, an amount of Fe is 79.0 to 88.0 at %, an amount of B is 5.0 to 15.0 at %, an amount of Si is 0 to 8.0 at %, an amount of P is 1.0 to 8.0 at %, an amount of C is 0 to 5.0 at %, an amount of Cu is 0 to 1.4 at %, a total amount of Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Ag, Zn, Al, Sn, As, Sb, Bi and REM is 0 to 8.0 at %, a total amount of Fe, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Co, Ni, Ag, Zn, Al, Sn, As, Sb, Bi and REM is 79.0 to 88.0 at %, and a total amount of Fe, B, Si, P, C, Cu, Ti, Zr, Hf, V, Nb, Ta, Cr, Mo, W, Mn, Co, Ni, Ag, Zn, Al, Sn, As, Sb, Bi and REM is 100%.
9 . The laminate according to claim 1 , wherein an electrical conductivity of the at least one non-magnetic metal layer is 30.0×10 6 S/m or more, and a saturation magnetic flux density of the at least one magnetic metal layer comprising the amorphous phase is 1.50 T or more.
10 . The laminate according to claim 1 , wherein the at least one non-magnetic metal layer and the at least one magnetic metal layer comprising the amorphous phase are in contact.
11 . A method for manufacturing the laminate of claim 1 , comprising a lamination step of forming an unfired laminate by laminating a material comprising the at least one non-magnetic metal and an unfired at least one amorphous magnetic metal layer.
12 . The method for manufacturing the laminate according to claim 11 , further comprising a firing step of firing the unfired laminate such that a crystallinity of the amorphous magnetic metal in the fired laminate is 40% or more and 75% or less.
13 . The method for manufacturing the laminate according to claim 12 , further comprising a forming process step of processing the unfired laminate into a predetermined shape before the firing step.
14 . The method for manufacturing the laminate according to claim 13 , further comprising a preliminary firing step of preliminarily firing the unfired laminate such that the crystallinity of the amorphous magnetic metal after the preliminary firing is increased to between 10% to 75% before the forming process step.
15 . The method for manufacturing the laminate according to claim 11 , wherein in the lamination step, the non-magnetic metal and the amorphous magnetic metal are bonded by a surface activated bonding method.
16 . The laminate according to claim 1 , wherein the at least one magnetic metal layer comprising the amorphous phase has a crystallinity of 50% or more and 75% or less.