Antenna unit and substrate treating apparatus including the same
An antenna unit having a slot structure capable of achieving maximum emission efficiency and a substrate treating apparatus including the antenna unit are provided. The substrate treating apparatus includes: a chamber housing; a substrate support unit supporting a substrate; a showerhead unit providing a process gas, which is for treating the substrate, onto the substrate; a plasma generation unit including a high-frequency power source and generating plasma in an internal space of the chamber housing using the process gas and power provided by the high-frequency power source; and an antenna unit connected to the high-frequency power source and operating as an electrode for generating the plasma, wherein the antenna unit includes a plurality of slot pairs, which are formed in a slot plate, and the slot pairs are arranged radially from a central region of the slot plate.
1 . An antenna unit installed in a substrate treating apparatus antenna unit, which treats a substrate using plasma, to operate as an electrode, the antenna unit comprising:
a first dielectric module provided as a top cover for the chamber housing;
an antenna module disposed on the first dielectric module and including a slot plate and a plurality of slot pairs, which are formed in the slot plate; and
a second dielectric module disposed on the antenna module,
wherein the slot pairs are arranged radially from a central region of the slot plate, and
wherein the slot pairs are arranged in a row at intervals of their respective distance from an outer end of the slot plate, calculated by the following equation: the distance=((1/2*n)+1/4)*λg where λg refers to the wavelength within a waveguide and n is 0 or a positive integer.
2 . The antenna unit of claim 1 , wherein the slot pairs are arranged in consideration of an interference between a propagating wave moving from the central region to the outer end of the slot plate and a reflective wave of the propagating wave.
3 . The antenna unit of claim 1 , wherein the slot pairs are arranged in consideration of an electric field generated by both a propagating wave moving from the central region to the outer end of the slot plate and a standing wave generated by a reflective wave of the propagating wave.
4 . The antenna unit of claim 1 , wherein the slot pairs are disposed at positions related to crests of a propagating wave moving from the central region to the outer end of the slot plate and crests of a standing wave generated by a reflective wave of the propagating wave.
5 . The antenna unit of claim 1 , wherein a size of the slot pairs increases in a direction from the central region to the outer end of the slot plate.
6 . The antenna unit of claim 1 , wherein the slot pairs are arranged in the row at regular intervals from the central region to the outer end of the slot plate.
7 . The antenna unit of claim 6 , wherein the slot pairs are arranged in the row in the same shape.
8 . The antenna unit of claim 7 , wherein the slot pairs are arranged in the row to form an X shape.
9 . The antenna unit of claim 1 , wherein
each of the slot pairs includes first and second slots, and
the first slot intersects with the second slot.
10 . The antenna unit of claim 9 ,
wherein the first slot is divided into first and second portions based on an intersection point between the first and second slots, and
a length of the first portion is the same as a length of the second portion.
11 . The antenna unit of claim 10 , wherein
the second slot is divided into third and fourth portions based on the intersection point between the first and second slots, and
an angle between the first and third portions is the same as an angle between the first and fourth portions.
12 . The antenna unit of claim 1 , wherein the slot pairs are further arranged in a concentric circular fashion around the central region of the slot plate.
13 . The antenna unit of claim 1 , wherein
the internal space of the chamber housing includes a plasma region where radicals are generated based on the process gas, and
a size of the antenna module is the same as or greater than a size of the plasma region.
14 . The antenna unit of claim 1 , wherein
the antenna unit further includes a temperature control module, which is disposed on the second dielectric module, and
the temperature control module is grounded.