Semiconductor memory devices having stacked structures therein that support high integration

1 . A semiconductor device, comprising:

a lower stack structure;

an upper stack structure on the lower stack structure; and

a channel structure penetrating through the lower and upper stack structures,

wherein the lower stack structure includes lower insulating layers and lower conductive layers alternately stacked in a vertical direction,

wherein the upper stack structure includes upper insulating layers and upper conductive layers alternately stacked in the vertical direction,

wherein the lower conductive layers include:

a first lowermost layer;

a first uppermost layer; and

first intermediate layers between the first lowermost layer and the first uppermost layer,

wherein the upper conductive layers include:

a second lowermost layer;

a second uppermost layer; and

second intermediate layers between the second lowermost layer and the second uppermost layer,

wherein the first lowermost layer is a lowermost layer among the lower conductive layers,

wherein the first uppermost layer is an uppermost layer among the lower conductive layers,

wherein the second lowermost layer is a lowermost layer among the upper conductive layers,

wherein the second uppermost layer is an uppermost layer among the upper conductive layers,

wherein the first intermediate layers include:

a first lower layer, a second lower layer, a third lower layer, a fourth lower layer, and a fifth lower layer sequentially stacked on the first lowermost layer; and

a lower word line adjacent to a center of the lower stack structure and at a higher level than the fifth lower layer,

wherein the second intermediate layers include:

a first upper layer and a second upper layer sequentially stacked on the second lowermost layer;

an upper word line adjacent to a center of the upper stack structure and at a higher level than the second upper layer; and

a third upper layer, a fourth upper layer, and a fifth upper layer sequentially stacked and at a higher level than the upper word line,

wherein the fifth upper layer is adjacent to the second uppermost layer, and

wherein a thickness in the vertical direction of each of the first lowermost layer, the first uppermost layer, the second lowermost layer, and the second uppermost layer is greater than a thickness in the vertical direction of each of the lower word line and the upper word line.

2 . The semiconductor device as claimed in claim 1 ,

wherein a distance between the first uppermost layer and the second lowermost layer is greater than the thickness in the vertical direction of each of the first lowermost layer, the first uppermost layer, the second lowermost layer, and the second uppermost layer.

3 . The semiconductor device as claimed in claim 1 ,

wherein a thickness in the vertical direction of at least one of the first, second, third, fourth, and fifth lower layers is greater than the thickness in the vertical direction of each of the lower word line and the upper word line.

4 . The semiconductor device as claimed in claim 1 ,

wherein a thickness in the vertical direction of the second lower layer is greater than a thickness in the vertical direction of at least one of the first lowermost layer, the first lower layer, the third lower layer, the fourth lower layer, and the fifth lower layer.

5 . The semiconductor device as claimed in claim 4 ,

wherein the thickness in the vertical direction of the first uppermost layer is greater than the thickness in the vertical direction of the second lower layer.

6 . The semiconductor device as claimed in claim 1 ,

wherein the thickness in the vertical direction of the first uppermost layer is greater than the thickness in the vertical direction of each of the first lowermost layer, the first lower layer, the second lower layer, the third lower layer, the fourth lower layer, and the fifth lower layer.

7 . The semiconductor device as claimed in claim 1 ,

wherein the thickness in the vertical direction of the first uppermost layer is greater than the thickness in the vertical direction of the second lowermost layer.

8 . The semiconductor device as claimed in claim 1 ,

wherein a thickness in the vertical direction of at least one of the first upper layer and the second upper layer is greater than the thickness in the vertical direction of each of the lower word line and the upper word line.

9 . The semiconductor device as claimed in claim 8 ,

wherein the thickness in the vertical direction of the second lowermost layer is greater than the thickness in the vertical direction of at least one of the first upper layer and the second upper layer.

10 . The semiconductor device as claimed in claim 1 ,

wherein the thickness in the vertical direction of the second uppermost layer is greater than the thickness in the vertical direction of the second lowermost layer.

11 . The semiconductor device as claimed in claim 1 ,

wherein a thickness in the vertical direction of at least one of the third upper layer, the fourth upper layer, and the fifth upper layer is greater than the thickness in the vertical direction of each of the lower word line and the upper word line.

12 . The semiconductor device as claimed in claim 1 ,

wherein the lower insulating layers include:

a first lower insulating layer between the first lowermost layer and the first lower layer;

a second lower insulating layer between the first lower layer and the second lower layer;

a third lower insulating layer between the third lower layer and the fourth lower layer; and

a fourth lower insulating layer adjacent to the lower word line in the vertical direction,

wherein the upper insulating layers include:

a first upper insulating layer between the second lowermost layer and the first upper layer;

a second upper insulating layer between the first upper layer and the second upper layer;

a third upper insulating layer adjacent to the upper word line in the vertical direction;

a fourth upper insulating layer between the third upper layer and the fourth upper layer;

a fifth upper insulating layer between the fourth upper layer and the fifth upper layer; and

a sixth upper insulating layer between the fifth upper layer and the second uppermost layer.

13 . The semiconductor device as claimed in claim 12 ,

wherein a thickness in the vertical direction of at least one of the first lower insulating layer and the second lower insulating layer is greater than a thickness in the vertical direction of at least one of the third lower insulating layer and the fourth lower insulating layer.

14 . The semiconductor device as claimed in claim 13 ,

wherein a distance between the second lower layer and the third lower layer is greater than the thickness in the vertical direction of at least one of the first lower insulating layer and the second lower insulating layer.

15 . The semiconductor device as claimed in claim 13 ,

wherein the thickness in the vertical direction of at least one of the first lower insulating layer and the second lower insulating layer is greater than a thickness in the vertical direction of at least one of the first upper insulating layer and the second upper insulating layer.

16 . The semiconductor device as claimed in claim 12 ,

wherein the thickness in the vertical direction of at least one of the fourth upper insulating layer, the fifth upper insulating layer, and the sixth upper insulating layer is greater than a thickness in the vertical direction of at least one of the first upper insulating layer and the third upper insulating layer.

17 . A semiconductor device, comprising:

a lower stack structure;

an upper stack structure on the lower stack structure; and

a channel structure penetrating through the lower and upper stack structures,

wherein the lower stack structure includes lower insulating layers and lower conductive layers alternately stacked in a vertical direction,

wherein the upper stack structure includes upper insulating layers and upper conductive layers alternately stacked in the vertical direction,

wherein the lower conductive layers include:

a first lowermost layer;

a first uppermost layer; and

first intermediate layers between the first lowermost layer and the first uppermost layer,

wherein the upper conductive layers include:

a second lowermost layer;

a second uppermost layer; and

second intermediate layers between the second lowermost layer and the second uppermost layer,

wherein the first lowermost layer is a lowermost layer among the lower conductive layers,

wherein the first uppermost layer is an uppermost layer among the lower conductive layers,

wherein the second lowermost layer is a lowermost layer among the upper conductive layers,

wherein the second uppermost layer is an uppermost layer among the upper conductive layers,

wherein the first intermediate layers include:

a first lower layer, a second lower layer, a third lower layer, a fourth lower layer, and a fifth lower layer sequentially stacked on the first lowermost layer; and

a lower word line adjacent to a center of the lower stack structure and at a higher level than the fifth lower layer,

wherein the second intermediate layers include:

a first upper layer and a second upper layer sequentially stacked on the second lowermost layer;

an upper word line adjacent to a center of the upper stack structure and at a higher level than the second upper layer; and

a third upper layer, a fourth upper layer, and a fifth upper layer sequentially stacked and at a higher level than the upper word line,

wherein the fifth upper layer is adjacent to the second uppermost layer,

wherein the lower insulating layers include:

a first lower insulating layer between the first lowermost layer and the first lower layer;

a second lower insulating layer between the first lower layer and the second lower layer;

a third lower insulating layer between the third lower layer and the fourth lower layer; and

a fourth lower insulating layer adjacent to the lower word line in the vertical direction,

wherein the upper insulating layers include:

a first upper insulating layer between the second lowermost layer and the first upper layer;

a second upper insulating layer between the first upper layer and the second upper layer;

a third upper insulating layer adjacent to the upper word line in the vertical direction;

a fourth upper insulating layer between the third upper layer and the fourth upper layer;

a fifth upper insulating layer between the fourth upper layer and the fifth upper layer; and

a sixth upper insulating layer between the fifth upper layer and the second uppermost layer,

wherein a thickness in the vertical direction of each of the first lowermost layer and the second uppermost layer is greater than a thickness in the vertical direction of each of the lower word line and the upper word line, and

wherein a thickness in the vertical direction of each of the first lower insulating layer and the sixth upper insulating layer is greater than a thickness in the vertical direction of each of the fourth lower insulating layer and the third upper insulating layer.

18 . The semiconductor device as claimed in claim 17 ,

wherein a thickness in the vertical direction of at least one of the first, second, third, fourth, and fifth lower layers is greater than the thickness in the vertical direction of each of the lower word line and the upper word line,

wherein a thickness in the vertical direction of at least one of the third upper layer, the fourth upper layer, and the fifth upper layer is greater than the thickness in the vertical direction of each of the lower word line and the upper word line, and

wherein a thickness in the vertical direction of each of the second lower insulating layer and the fifth upper insulating layer is greater than the thickness in the vertical direction of each of the fourth lower insulating layer and the third upper insulating layer.

19 . The semiconductor device as claimed in claim 18 ,

wherein a thickness in the vertical direction of at least one of the first uppermost layer and the second lowermost layer is greater than the thickness in the vertical direction of each of the lower word line and the upper word line.

20 . A semiconductor device, comprising:

a lower stack structure, said lower stack structure comprising an alternating vertical arrangement of a plurality of lower insulating layers and a plurality of lower electrode layers, and said plurality of lower electrode layers including at least first and second lower electrode layers;

an upper stack structure on the lower stack structure, said upper stack structure comprising an alternating vertical arrangement of a plurality of upper insulating layers and a plurality of upper electrode layers, and said plurality of upper electrode layers including at least first and second upper electrode layers; and

a channel structure extending at least partially through the upper stack structure and at least partially through the lower stack structure and extending in a vertical direction, which is perpendicular to an upper surface of a substrate,

wherein a thickness in the vertical direction of at least one of the first lower electrode layer and the first upper electrode layer is greater than a thickness in the vertical direction of the second lower electrode layer,

wherein, among the plurality of lower electrode layers, the first lower electrode layer is disposed nearest an interface between the lower stack structure and the upper stack structure;

wherein, among the plurality of upper electrode layers, the first upper electrode layer is disposed nearest the interface, and

wherein a fourth one of the plurality of upper electrode layers extends between the first and second upper electrode layers and a thickness of the fourth one in the vertical direction is greater than a thickness of the second upper electrode layer in the vertical direction.