Display apparatus, mask for manufacturing the same, and manufacturing method of display apparatus
A display apparatus includes a substrate, a pixel electrode disposed on the substrate, a first bank including a bank opening exposing a central portion of the pixel electrode, a second bank disposed on an outer side of the first bank and including a greater thickness than the first bank, an emission layer disposed in the bank opening and corresponding to the pixel electrode, an opposite electrode overlapping the first bank, the second bank, and the emission layer, wherein the first bank and the second bank each include a negative-type photoresist.
1 . A display apparatus comprising:
a substrate;
an insulating layer on the substrate;
a pixel electrode disposed on the insulating layer;
a first bank comprising a bank opening exposing a central portion of the pixel electrode;
a second bank disposed on an outer side of the first bank and including a greater thickness than the first bank;
an emission layer disposed in the bank opening and corresponding to the pixel electrode; and
an opposite electrode overlapping the first bank, the second bank, and the emission layer,
wherein the first bank and the second bank are contiguous regions of a single layer patterned from the same negative-type photoresist film,
wherein, in plan view, the first bank has a loop shape that surrounds the central portion of the pixel electrode, and
wherein the first bank and the second bank contact the insulating layer.
2 . The display apparatus of claim 1 , wherein the first bank and the second bank are integral with each other.
3 . The display apparatus of claim 1 , wherein a thickness of the first bank is less than or equal to about half of a thickness of the second bank.
4 . The display apparatus of claim 1 , wherein a thickness of the second bank is about 300 nm to about 3 μm.
5 . The display apparatus of claim 1 , wherein an angle formed by sidewalls of the first bank with an upper surface of the pixel electrode is greater than 0° and less than or equal to about 50°.
6 . The display apparatus of claim 1 , wherein an angle formed by sidewalls of the second bank with an upper surface of the first bank is greater than 0° and less than or equal to about 50°.
7 . The display apparatus of claim 1 , wherein a surface of each of the first bank and the second bank is liquid-repellent.
8 . The display apparatus of claim 1 , further comprising:
a spacer disposed on the substrate to be apart from the pixel electrode; and
a third bank overlapping the spacer and protruding from an upper surface of the second bank.
9 . The display apparatus of claim 8 , wherein the first bank, the second bank, and the third bank are integral with each other.
10 . The display apparatus of claim 8 , wherein the spacer comprises a positive-type photoresist.
11 . A method of manufacturing a display apparatus, the method comprising:
forming a pixel electrode on a substrate;
forming, on the pixel electrode, a first organic layer comprising a negative-type photoresist;
irradiating light onto the first organic layer by using a slit mask and developing the first organic layer into an organic pattern layer;
forming a first bank and a second bank by heating the organic pattern layer, the first bank comprising a bank opening exposing a central portion of the pixel electrode, and the second bank being disposed on an outer side of the first bank and being greater in thickness than the first bank;
forming an emission layer in the bank opening, in correspondence with the pixel electrode; and
forming an opposite electrode to overlap the first bank, the second bank, and the emission layer.
12 . The method of claim 11 , wherein the organic pattern layer comprises:
a first pattern comprising a plurality of line patterns; and
a second pattern disposed on an outer side of the first pattern.
13 . The method of claim 12 , wherein any one of the plurality of line patterns overlaps an edge of the pixel electrode.
14 . The method of claim 12 , wherein each of the plurality of line patterns has a loop shape surrounding the central portion of the pixel electrode in plan view.
15 . The method of claim 11 , further comprising:
forming a spacer that is apart from the pixel electrode, wherein the forming is performed between the forming of the pixel electrode and the forming of the first organic layer.
16 . The method of claim 15 , wherein, in the forming of the first bank and the second bank, a third bank overlapping the spacer and protruding from an upper surface of the second bank is formed.
17 . The method of claim 15 , wherein the spacer comprises a positive-type photoresist.
18 . The method of claim 11 , wherein the forming of the emission layer comprises forming an emission layer by discharging ink comprising a light-emitting material into the bank opening.
19 . The method of claim 11 , wherein an angle formed by sidewalls of the first bank with an upper surface of the pixel electrode is greater than 0° and less than or equal to about 50°.
20 . The method of claim 11 , wherein an angle formed by sidewalls of the second bank with an upper surface of the first bank is greater than 0° and less than or equal to about 50°.
21 . The method of claim 11 , wherein a surface of each of the first bank and the second bank is liquid-repellent.
22 . A mask used to manufacture a display apparatus, the mask comprising:
a light-transmissive layer;
a plurality of first mask patterns configured to align with a plurality of pixel electrodes of the display apparatus and formed on the light-transmissive layer; and
a plurality of second mask patterns, each second mask pattern comprising a plurality of slits through which light is capable of passing, the plurality of second mask patterns being formed on the light-transmissive layer,
wherein each of the plurality of second mask patterns is configured to surround a corresponding first mask pattern, and
wherein first mask patterns adjacent to each other among the plurality of first mask patterns are spaced apart from each other in a first direction by a first distance, and a width of each second mask pattern in the first direction is 30% to 35% of the first distance.
23 . The mask of claim 22 , wherein, in plan view, each of the plurality of slits has a loop shape configured to surround the first mask pattern.
24 . The mask of claim 22 , wherein any one of the plurality of slits is configured to align with an edge of the first mask pattern.