Treatment device for ablation
An ablation treatment device for ablating treatment procedure used with endoscope device is disclosed. The ablation treatment device is inserted through the endoscope device and protruded into the human body, where the equipped neutral electrode and a gas channel for injecting inert gas is protruded. Together with another gas channel formed on the endoscope device, two types of gases are injected into the human body together with application of high frequency currents to perform ablation procedure. The ablation treatment device is controlled through a control circuit that administers control of the injection of the gases and application of high frequency currents.
1 . An endoscope system, comprising:
an endoscope including an insertion channel;
a treatment tube inserted through and protruding out from a distal end of the insertion channel, wherein the treatment tube includes an electrode and a first gas channel;
a first gas source configured to supply a first gas at a first flow rate through the first gas channel;
a second gas source configured to supply a second gas at a second flow rate through a second gas channel, wherein the second gas channel is the insertion channel and supplies the second gas from the distal end of the insertion channel; and
a control circuit controlling the first gas source and the second gas source,
wherein the control circuit is configured to send a control signal to the first gas source and the second gas source so that the second flow rate is larger than the first flow rate when both of the first gas and the second gas are supplied.
2 . The endoscope system as in claim 1 , wherein the second gas is carbon dioxide.
3 . The endoscope system according to claim 1 , wherein the first gas is Argon and the second gas is carbon dioxide, and wherein a first high frequency current applied to the electrode is sufficient to ionize Argon into the plasma state but not sufficient to ionize the carbon dioxide into the plasma state.
4 . The endoscope system according to claim 1 , wherein a plenum between an outer surface of a wall of the electrode and an inner surface of the wall of the treatment tube forms the first gas channel.
5 . The endoscope system according to claim 1 , wherein a plenum between an outer surface of a wall of the treatment tube and an inner surface of the wall of the insertion channel forms the second gas channel.
6 . The endoscope system according to claim 1 , wherein the second gas channel is formed within the endoscope and is separate from the insertion channel, and wherein the second gas channel has an opening in a distal end of the endoscope that is spaced apart from an opening for the treatment tube in the distal end of the endoscope.
7 . The endoscope system according to claim 1 , further comprising:
an electricity power source configured to supply a first high frequency current to the electrode sufficient to ionize the first gas into a plasma state.
8 . The endoscope system according to claim 7 , wherein the control circuit is programmed to supply the second gas prior to or simultaneously with supplying the first gas or supply the second gas prior to or simultaneously with applying the first high frequency current to the electrode.
9 . The endoscope system according to claim 7 , wherein the control circuit is programmed to supply the second gas after supplying the first gas and the applying of the first high frequency current to the electrode.
10 . The endoscope system according to claim 7 , wherein the control circuit is programmed to stop the supply of the second gas prior to stopping the supply of the first gas or stopping the application of the first high frequency current.
11 . The endoscope system according to claim 7 , wherein the control circuit is programmed to stop the supply of the second gas after stopping the supply of the first gas or stopping the application of the first high frequency current.
12 . A control device for an endoscope, comprising:
a controller including a control circuit for controlling a first gas source, and a second gas source,
wherein the first gas source is configured to supply a first gas through a first gas channel from a treatment tool inserted into the endoscope,
wherein the second gas source is configured to supply a second gas through a second gas channel,
wherein the second gas channel is the insertion channel of the endoscope and supplies the second gas from a distal end of the insertion channel,
wherein a flow rate of the first gas is a first flow rate and a flow rate of the second gas is a second flow rate, and
wherein the control circuit is configured to send a control signal to the first gas source and the second gas source so that the second flow rate is larger than the first flow rate when both of the first gas and the second gas are supplied.
13 . The control device as in claim 12 , wherein the control circuit is programmed to supply the second gas prior to or simultaneously with supplying the first gas or supply the second gas prior to or simultaneously with applying a first high frequency current to an electrode of the endoscope.
14 . The control device as in claim 12 , wherein the control circuit is programmed to supply the second gas after supplying the first gas and applying a first high frequency current to an electrode of the endoscope.
15 . The control device as in claim 13 , wherein the control circuit is programmed to stop the supply of the second gas prior to stopping the supply of the first gas or stopping the application of the first high frequency current.
16 . The control device as in claim 13 , wherein the control circuit is programmed to stop the supply of the second gas after stopping the supply of the first gas or stopping the application of the first high frequency current.
17 . A method of controlling a flow of a first gas and a second gas in an endoscope, a first gas source configured to supply the first gas through a first gas channel in a treatment tube located in an insertion channel of the endoscope, and a second gas source configured to supply the second gas through a second gas channel in the endoscope, the method comprising:
supplying the first gas at a first flow rate through the first gas channel aimed to reach beyond a distal end of an electrode; and
supplying the second gas at a second flow rate through the second gas channel not aimed to reach beyond the distal end of an electrode included in the treatment tube,
wherein the second gas channel is the insertion channel and supplies the second gas from a distal end of the insertion channel,
wherein the second flow rate is larger than the first flow rate when both of the first gas and the second gas are supplied.
18 . The method as in claim 17 , wherein the second gas is supplied prior to or simultaneously with supplying the first gas or the second gas is supplied prior to or simultaneously with applying a first high frequency current to an electrode of the endoscope.
19 . The method as in claim 17 , the second gas is supplied after supplying the first gas and applying a first high frequency current to an electrode of the endoscope.
20 . The method as in claim 18 , wherein the supply of the second gas is stopped prior to stopping the supply of the first gas or stopping the application of the first high frequency current.
21 . The method as in claim 18 , wherein the supply of the second gas is stopped after stopping the supply of the first gas or stopping the application of the first high frequency current.
22 . The endoscope system according to claim 7 , wherein the first gas ionizes into the plasma state at the first high frequency amperage, the second gas ionizes into a plasma state at a second high frequency amperage, and the second high frequency current is higher than the first high frequency amperage.
23 . The endoscope system according to claim 1 , further comprising:
a cap attached to an outer surface of the endoscope, a distal end of the cap located distally relative to a distal end of the endoscope,
wherein the second gas is discharged only from a distal opening of the cap toward an outside of the cap, and
wherein the first gas is discharged only from a distal opening of the treatment tube toward outside of the cap.
24 . The control device as in claim 12 , wherein the control circuit further controls an electricity power source, and wherein the electricity power source is configured to supply a first high frequency current to an electrode located in a treatment tube of the endoscope that is sufficient to ionize the first gas into a plasma state.
25 . The control device as in claim 24 , wherein the first gas ionizes into the plasma state at the first high frequency amperage, the second gas ionizes into a plasma state at a second high frequency amperage, and the second high frequency current is higher than the first high frequency amperage.
26 . The method as in claim 17 , further comprising applying a first high frequency current to an electrode to ionize the first gas to a plasma state,
wherein the first high frequency current is sufficient to ionize the first gas into a plasma state, and
wherein the first gas ionizes into the plasma state at the first high frequency current, the second gas ionizes into a plasma state at a second high frequency current, and the second high frequency current is higher than the first high frequency current.
27 . The endoscope system as in claim 1 , wherein the control circuit is configured to:
supply the first gas, and
supply the second gas before the electrode is activated,
wherein the first gas is inert gas, and
wherein the second gas is other than inert gas.
28 . The method as in claim 17 , wherein the first gas is inert gas, and
wherein the second gas is other than inert gas.