Exercising band and exercising monitoring system having the same
In an exercising band and an exercising monitoring system having the exercising band, the exercising band includes a band part, at least one sensor part and a spacer. The band part is configured to be elongated according as an external force is applied. The sensor part is disposed inside of the band part, is configured to be elongated according as the band part is elongated, and has first and second sensors. The first and second sensors have conductivity. The spacer is configured to insulate the first and second sensors with each other. The first and second sensors are electrically contacted with each other, as the external force is applied along a direction substantially crossing an extending direction of the first and second sensors.
1 . An exercising band comprising:
a band part configured to be elongated according as an external force is applied; at least one sensor part being inside the band part, the at least one sensor part having a first sensor and a second sensor, the first and second sensors along a direction substantially same as an extension direction of the band part and being parallel to each other, the first and second sensors each having conductivity; and
a spacer being between the first and second sensors to make a distance therebetween and configured to insulate the first and second sensors from each other,
wherein when the external force is applied, the first and second sensors are configured to be elongated as the band part is elongated, and
wherein the external force applied to the band part is obtained based on an increase in length of the first and second sensors,
wherein the first and second sensors are shorted as the first and second sensors are in electrical contact with each other, and
wherein a position of the electrical contact of the first and second sensors is decided based on a voltage of both ends of the first sensor and a voltage of both ends of the second sensor.
2 . The exercising band of claim 1 , wherein the spacer has a mesh structure or a wire structure, and is configured to cover at least one of the first and second sensors.
3 . The exercising band of claim 2 , wherein sensitivity of the at least one sensor part decreases as a thickness of the spacer increases or an opening space of the spacer narrows.
4 . The exercising band of claim 1 , wherein momentum of both sides is compared with respect to the position of the electrical contact of the first and second sensors, based on a resistance between a first end of the first sensor and a first end of the second sensor, and a resistance between a second end of the first sensor and a second end of the second sensor.
5 . The exercising band of claim 1 , wherein a voltage is applied to both ends of each of the first and second sensors to obtain a resistance according to the voltage, and then the increase in length of the first and second sensors according to the elongation of the band part is obtained.
6 . The exercising band of claim 5 , wherein the external force applied to the band part by a user along the extension direction of the band part is obtained, based on the increase in length of the first and second sensors.
7 . An exercising monitoring system comprising:
the exercising band as claimed in claim 1 ;
first and second switches electrically connected to both ends of the first sensor, respectively; and
third and fourth switches electrically connected to both ends of the second sensor, respectively,
wherein a power is applied to a first end of the first sensor and a second end of the second sensor, and output voltages of a second end of the first sensor and a first end of the second sensor are monitored, so that a state of an external force is monitored.
8 . The exercising monitoring system of claim 7 , wherein a first resistor is connected in parallel between the first end of the second sensor and an output voltage terminal, and a second resistor is connected in parallel between the second end of the first sensor and the output voltage terminal.
9 . The exercising monitoring system of claim 7 , wherein the external force applied to the band part is monitored, when both of the first and second switches are ON and both of the third and fourth switches are OFF, or both of the first and second switches are OFF and both of the third and fourth switches are ON.
10 . The exercising monitoring system of claim 7 , wherein a position of the band part on which a user steps is monitored, when both of the first and third switches are ON and both of the second and fourth switches are OFF, or both of the first and third switches are OFF and both of the second and fourth switches are ON.