Substrate processing apparatus
The substrate processing apparatus according to the disclosure is a substrate processing apparatus for processing a substrate. The substrate processing apparatus includes a swing module, which includes a base portion, an arm which is supported by the base portion and is rotatable about the base portion, and a cover which covers an upper surface of the arm. The cover has an elongated shape in plan view and has a protrusion formed on an outer peripheral portion of an upper surface of the cover to protrude upward. The protrusion is provided to be continuous to a distal end which is an end on the side farther from the base portion of the upper surface of the cover in a longitudinal direction and both ends of the upper surface of the cover in a transverse direction.
1 . A substrate processing apparatus for processing a substrate, comprising:
a swing module,
wherein the swing module includes a base portion, an arm which is supported by the base portion and is rotatable about the base portion, and a cover which covers an upper surface of the arm,
wherein the cover has an elongated shape in plan view and has an upper surface, a side surface extending downward from an outer peripheral portion of the upper surface, a distal end which is an end on a side farther from the base portion of the upper surface in a longitudinal direction, and a first end and a second end of the upper surface in a transverse direction,
the cover includes a protrusion formed on the outer peripheral portion of the upper surface of the cover to protrude upward, and
wherein the protrusion is provided at the distal end, the first end and the second end of the cover to be continuous with the outer peripheral portion of the upper surface extending above the side surface of the cover.
2 . The substrate processing apparatus according to claim 1 ,
wherein the substrate processing apparatus includes a polishing device for polishing the substrate using a polishing liquid,
wherein the polishing device includes a polishing table which supports a polishing pad having a polishing surface, and
wherein the arm is a dresser arm which supports a dresser for dressing the polishing surface of the polishing pad.
3 . The substrate processing apparatus according to claim 1 ,
wherein the upper surface of the cover has an inclined surface inclined downward and toward the base portion, and
wherein the inclined surface extends continuously in the longitudinal direction of the cover from the distal end to a proximal end which is an end on a side near the base portion in the longitudinal direction without being horizontal.
4 . The substrate processing apparatus according to claim 3 ,
wherein the inclined surface has an inclination of 10° or more with respect to a horizontal plane.
5 . The substrate processing apparatus according to claim 2 ,
wherein the protrusion is provided on an entire portion that passes directly above the polishing table due to rotation of the arm in the outer peripheral portion of the upper surface of the cover.
6 . The substrate processing apparatus according to claim 1 ,
wherein the protrusion has a height of 3 mm or more.
7 . The substrate processing apparatus according to claim 1 ,
wherein the protrusion has a width of 3 mm or less.
8 . The substrate processing apparatus according to claim 1 ,
wherein a water-repellent layer or a hydrophilic layer is formed on a surface of the cover.