Measurement method and measurement system
A measurement method according to an exemplary embodiment acquires a measured value indicating a capacitance between a measuring instrument and an edge ring in a chamber. The measuring instrument includes a base substrate and a sensor electrode provided on the base substrate. The method includes holding, on a stage in the chamber, the edge ring having a conductive film formed on a surface thereof. The method includes transporting the measuring instrument to a region on the stage which is surrounded by the edge ring. The method includes acquiring the measured value indicating the capacitance between the measuring instrument and the edge ring having the conductive film by using the measuring instrument transported to the inner side of the region.
1 . A measurement method, the method comprising:
providing a processing system including:
a process module including a chamber main body and a stage, the chamber main body including a chamber, the stage being provided in the chamber and on which a measuring instrument is to be placed;
a transport device configured to transport the measuring instrument into the chamber, the transport device being an articulated robot; and
controller circuitry configured to control an operation of the transport device, the measuring instrument including:
a disc-shaped base substrate; and
sensor electrodes provided on the disc-shaped base substrate and facing outward in a radial direction,
holding an edge ring on the stage;
transporting the measuring instrument to a region surrounded by the edge ring on the stage; and
acquiring measured values indicating capacitances between the sensor electrodes and the edge ring by using the measuring instrument transported to an inner side of the region, wherein
the edge ring includes an edge ring body and a conductive film, the conductive film being formed on at least a part of a surface of the edge ring body and the conductive film having a composition different from a composition of the edge ring body in composition.
2 . The measurement method according to claim 1 , wherein the measuring instrument includes a circuit substrate calculating the measured values.
3 . The measurement method according to claim 1 , wherein the edge ring body is formed of an insulator.
4 . The measurement method according to claim 1 , wherein the conductive film contains carbon.
5 . The measurement method according to claim 1 , wherein the holding the edge ring on the stage includes placing the edge ring body on the stage and forming the conductive film on the surface of the edge ring body while the edge ring body remains on the stage.
6 . The measurement method according to claim 5 , wherein the conductive film is formed by chemical vapor deposition (CVD).
7 . The measurement method according to claim 6 , wherein the CVD is plasma CVD.
8 . The measurement method according to claim 7 , wherein the plasma CVD includes forming the conductive film by a plasma of a hydrocarbon gas, a hydrofluorocarbon gas, a fluorocarbon gas, or a gas including combinations thereof.
9 . The measurement method according to claim 7 , further comprising:
before the forming the conductive film, placing a covering member on the region surrounded by the edge ring body on the stage; and
after the forming the conductive film, removing the covering member from the region surrounded by the edge ring on the stage.
10 . The measurement method according to claim 7 , further comprising:
after the acquiring the measured values, removing the conductive film by a plasma containing oxygen.
11 . The measurement method according to claim 1 , wherein the conductive film is formed on at least a part of the edge ring body that faces the sensor electrodes of the measuring instrument.
12 . The measurement method according to claim 1 , further comprising:
after the acquiring the measured values, adjusting a transport position of the transport device based on the measured values.
13 . The measurement method according to claim 1 , wherein the measuring instrument includes:
a radio frequency oscillator supplying a radio frequency signal to the sensor electrodes;
capacitance-to-voltage (C/V) conversion circuits generating voltage signals corresponding to respective capacitances formed by the respective sensor electrodes;
an analog to digital (A/D) converter converting the voltage signals output from the respective C/V conversion circuits into digital values, respectively; and
arithmetic circuitry calculating the measured values indicating the capacitances respectively formed by the sensor electrodes, based on the digital values output from the A/D converter.
14 . A measurement system, the measurement system comprising:
a measuring instrument including
a disc-shaped base substrate,
sensor electrodes provided on the disc-shaped base substrate and facing outward in a radial direction, and
arithmetic circuitry configured to calculate measured values indicating capacitances respectively formed by the sensor electrodes; and
a processing system including
a process module including a chamber main body and a stage, the chamber main body including a chamber, the stage being provided in the chamber and on which the measuring instrument is to be placed;
a transport device configured to transport the measuring instrument into the chamber, the transport device being an articulated robot; and
controller circuitry configured to control an operation of the transport device, wherein
the stage is configured to hold an edge ring,
the controller circuitry is configured to control the transport device to transport the measuring instrument to a region surrounded by the edge ring on the stage,
the arithmetic circuitry is configured to calculate the measured values indicating the capacitances between the sensor electrodes of the measuring instrument transported to an inner side of the region and the edge ring, and
the edge ring includes an edge ring body and a conductive film, the conductive film being formed on at least a part of a surface of the edge ring body and the conductive film having a composition different from a composition of the edge ring body.
15 . The measurement system according to claim 14 , wherein the arithmetic circuitry includes a circuit substrate configured to calculate the measured values.
16 . The measurement system according to claim 14 , wherein the conductive film is configured to be formed on the surface of the edge ring body while the edge ring body remains on the stage.
17 . The measurement system according to claim 16 , wherein the conductive film is formed by plasma chemical vapor deposition (CVD), including by plasma of a hydrocarbon gas, a hydrofluorocarbon gas, a fluorocarbon gas, or a gas including combinations thereof.
18 . The measurement system according to claim 14 , wherein the conductive film is formed on at least a part of the edge ring body that faces the sensor electrodes of the measuring instrument.
19 . The measurement system according to claim 14 , wherein a transport position of the transport device is configured to be adjusted based on the measured values.
20 . The measurement system according to claim 14 , wherein the measuring instrument further includes:
a radio frequency oscillator configured to supply a radio frequency signal to the sensor electrodes;
capacitance-to-voltage (C/V) conversion circuits configured to generate voltage signals corresponding to respective capacitances formed by the respective sensor electrodes;
an analog to digital (A/D) converter configured to convert the voltage signals output from the respective C/V conversion circuits into digital values, respectively; and
the arithmetic circuitry configured to calculate the measured values indicating the capacitances respectively formed by the sensor electrodes, based on the digital values output from the A/D converter.