Substrate measurement systems having substrate holders
An apparatus includes a substrate holder having a surface to receive a substrate. The surface has a texture that causes an optical beam incident on the surface to scatter in at least one direction away from an optical detector to be located above the substrate holder.
1 . An apparatus comprising:
a substrate holder having a surface to receive a substrate, wherein the surface has a texture defined by a pattern of holes that causes an optical beam incident on the surface to scatter in at least one direction away from an optical detector to be located above the substrate holder.
2 . The apparatus of claim 1 , wherein the substrate holder comprises a chuck.
3 . The apparatus of claim 1 , further comprising:
the substrate secured to the substrate holder; and
a patterning film disposed on the substrate.
4 . The apparatus of claim 1 , wherein the pattern of holes at least one of: circular holes, ovoid holes, or polygonal holes.
5 . The apparatus of claim 1 , wherein the pattern of holes comprises a hole having a depth of less than or equal to about 50 micrometers.
6 . The apparatus of claim 1 , wherein the texture of the surface is defined by a porosity that ranges from about 10% to about 90%.
7 . A system comprising:
a substrate holder having a surface to receive a substrate; and
an optical detector located above the substrate holder, wherein the surface has a texture defined by a pattern of holes that causes an optical beam incident on the surface to scatter in at least one direction away from an optical detector to be located above the substrate holder.
8 . The system of claim 7 , wherein the substrate holder comprises a chuck.
9 . The system of claim 7 , further comprising:
the substrate secured to the substrate holder; and
a patterning film disposed on the substrate.
10 . The system of claim 7 , wherein the pattern of holes at least one of: circular holes, ovoid holes, or polygonal holes.
11 . The system of claim 8 , wherein the pattern of holes comprises a hole having a depth of less than or equal to about 50 micrometers.
12 . The system of claim 7 , wherein the texture of the surface is defined by a porosity that ranges from about 10% to about 90%.
13 . A method comprising:
causing, by at least one processing device, at least one optical beam to be directed toward a substrate secured to a surface of a substrate holder;
receiving, by the at least one processing device, at least one reflected optical beam for processing, wherein the surface has a texture defined by a pattern of holes that causes an optical beam incident on the surface to scatter in at least one direction away from an optical detector to be located above the substrate holder; and
processing, by the at least one processing device, the at least one reflected optical beam to determine at least one property of the substrate.
14 . The method of claim 13 , wherein the substrate holder comprises a chuck.
15 . The method of claim 13 , wherein the substrate has a patterning film disposed thereon.
16 . The method of claim 13 , wherein the pattern of holes at least one of: circular holes, ovoid holes, or polygonal holes.
17 . The method of claim 13 , wherein the pattern of holes comprises a hole having a depth of less than or equal to about 50 micrometers.
18 . The method of claim 13 , wherein the texture of the surface is defined by a porosity that ranges from about 10% to about 90%.