Microwave treatment of replicated optical structures

1 . A method comprising:

pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nano-sized microwave susceptors are embedded in the replication material, and wherein the plurality of nano-sized microwave susceptors comprise silicon carbide (SiC);

curing the replication material by applying microwaves to the replication material; and

removing the face of the stamp from contact with the replication material.

2 . The method of claim 1 , wherein a plurality of optical nanoparticles are embedded in the replication material, the plurality of optical nanoparticles composed of a material different from the SiC of the plurality of nano-sized microwave susceptors.

3 . The method of claim 2 , wherein the plurality of nano-sized microwave susceptors have a smaller size than the plurality of optical nanoparticles.

4 . The method of claim 2 , wherein the plurality of optical nanoparticles have a higher refractive index than the plurality of nano-sized microwave susceptors.

5 . The method of claim 2 , wherein the plurality of optical nanoparticles are composed of a transition metal oxide, a chalcogenide, or an antimonide.

6 . The method of claim 1 , wherein the predetermined characteristic comprises a surface structure of the replication material.

7 . The method of claim 1 , wherein at least one of a portion of the substrate or a portion of the stamp is substantially transparent to microwaves.

8 . The method of claim 1 , wherein the plurality of nano-sized microwave susceptors have a diameter in a range from 10 nm to 100 nm.

9 . The method of claim 1 , wherein the plurality of nano-sized microwave susceptors have a microwave loss tangent in a range from 0.01 to 2.0 at 25° C.

10 . The method of claim 1 , wherein the plurality of nano-sized microwave susceptors have a microwave loss tangent of at least 2.0 at 25° C.

11 . A method comprising:

pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nanoparticles are embedded in the replication material, at least a portion of the plurality of nanoparticles being nano-sized microwave susceptors, wherein the nano-sized microwave susceptors comprise silicon carbide (SiC);

at least partially curing the replication material while the stamp is in contact with the replication material, wherein the at least partially curing the replication material does not include microwave radiation;

after the at least partially curing the replication material, removing the stamp from contact with the replication material; and

after removing the stamp from contact with the replication material, applying microwaves to the plurality of nanoparticles.

12 . The method of claim 11 , wherein the applying microwaves to the plurality of nanoparticles causes removal of at least some of the replication material.

13 . The method of claim 11 , wherein the at least partially curing the replication material comprises applying at least one of non-microwave heating or UV radiation.

14 . The method of claim 11 , wherein the applying microwaves to the plurality of nanoparticles causes the plurality of nanoparticles to sinter.

15 . The method of claim 14 , wherein the sintered plurality of nanoparticles form an optical metastructure.

16 . The method of claim 11 , wherein the predetermined characteristic comprises a surface structure of the replication material.

17 . The method of claim 11 , wherein at least a portion of the substrate is substantially transparent to the microwaves.

18 . The method of claim 11 , wherein the at least partially curing the replication material is limited to a partial cure, and wherein the microwaves are configured to completely cure the replication material.

19 . A method comprising:

pressing a face of a stamp into a replication material disposed on a substrate, to cause the replication material to have a predetermined characteristic, wherein a plurality of nano-sized microwave susceptors are embedded in the replication material, and wherein the plurality of nano-sized microwave susceptors comprise silicon carbide (SiC) or yttria-stabilized zirconia (YSZ),

wherein a plurality of optical nanoparticles are embedded in the replication material, the plurality of optical nanoparticles composed of a material different from the SiC or the YSZ of the plurality of nano-sized microwave susceptors, and

wherein the plurality of nano-sized microwave susceptors have a smaller size than the plurality of optical nanoparticles;

curing the replication material by applying microwaves to the replication material; and

removing the face of the stamp from contact with the replication material.

20 . The method of claim 19 , wherein the plurality of optical nanoparticles have a higher refractive index than the plurality of nano-sized microwave susceptors.

21 . The method of claim 19 , wherein the plurality of nano-sized microwave susceptors have a microwave loss tangent in a range from 0.01 to 2.0 at 25° C.