IP Library Granted Patent US 12704795
Granted Patent B2
US 12704795 · App. 18/169,053 · Granted Aug 11, 2026

Fine particle containing silicon and toner

Inventors: Ichiro Kanno (Chiba, JP); Hayato Ida (Ibaraki, JP); Hiroki Watanabe (Chiba, JP); Mari Kaburagi (Chiba, JP)
Assignee: Canon Kabushiki Kaisha
G03G9/09775C08G77/045C08J7/065C08J2383/04
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Quick Facts
Patent No.
US 12704795
App. No.
18/169,053
Granted
Aug 11, 2026
Kind
B2
Abstract

The present disclosure provides a fine particle containing silicon, wherein the fine particle has a number-average particle diameter of a primary particle of 0.05 μm or more and 0.20 μm or less, wherein the fine particle contains a silicon atom at a ratio of 20% or more with respect to all elements in measurement by X-ray fluorescence.

Claims (31)

1 . A fine particle containing silicon,

wherein the fine particle has a number-average particle diameter of a primary particle of 0.05 μm or more and 0.20 μm or less,

wherein the fine particle contains a silicon atom at a ratio of 20% or more with respect to all elements in measurement by X-ray fluorescence (XRF), and

wherein, regarding a ratio of the silicon atom measured under etching the fine particle by irradiation with an Ar-Kα ray in analysis by X-ray photoelectron spectroscopy (XPS), when a ratio of a silicon atom having following structure (a) is represented by X, and a sum of ratios of silicon atoms having following structures (b) to (d) is represented by Y,

(i) a relationship of X<Y is always satisfied in a measurement range of following condition A, and

(ii) there is a point at which the relationship of X<Y is changed to a relationship of X>Y, and the relationship of X>Y is always satisfied after the change, in a measurement range of following condition B:

Condition A: a period of time starting with a time required for cutting a test piece made of PET by a depth of 2 nm by the irradiation with the Ar-Kα ray and ending with a time required for cutting the test piece by a depth of 20 nm;

Condition B: a period of time starting with the time required for cutting the test piece made of PET by a depth of 20 nm by the irradiation with the Ar-Kα ray and ending with a time required for cutting the test piece by a depth of 50 nm:

where R 1 , R 2 , and R 3 each independently represent a hydrocarbon group having 1 to 6 carbon atoms,

the fine particle is a polycondensate of silicon compounds that are only bifunctional silanes and tetrafunctional silanes,

a ratio of the bifunctional silanes to the sum of the bifunctional silanes and the tetrafunctional silanes is 30 mol % or more and 70 mol % or less, and

the X and the Y satisfy a relationship of 0.20≤Y/(X+Y) at a point of the time required for cutting the test piece made of PET by a depth of 50 nm by the irradiation with the Ar-Kα ray.

2 . The fine particle according to claim 1 , wherein the X and the Y satisfy a relationship of 1.2≤X/Y≤2.0 at a point of the time required for cutting the test piece made of PET by a depth of 50 nm by the irradiation with the Ar-Kα ray.

3 . The fine particle according to claim 1 , wherein the fine particle is subjected to surface treatment with at least one compound selected from an alkylsilazane compound, an alkylalkoxysilane compound, a chlorosilane compound, and silicone oil.

4 . The fine particle according to claim 1 , wherein the fine particle has a Young's modulus of 10 GPa or more and 30 GPa or less.

5 . The fine particle according to claim 1 , wherein the R 1 , the R 2 , and the R 3 in the structures (b) to (d) each independently represent an alkyl group having 1 to 6 carbon atoms.

6 . A toner comprising a toner particle and a fine particle,

wherein the fine particle is a fine particle containing silicon,

wherein the fine particle has a number-average particle diameter of a primary particle of 0.05 μm or more and 0.20 μm or less,

wherein the fine particle contains a silicon atom at a ratio of 20% or more with respect to all elements in measurement by X-ray fluorescence (XRF), and

wherein, regarding a ratio of the silicon atom measured under etching the fine particle by irradiation with an Ar-Kα ray in analysis by X-ray photoelectron spectroscopy (XPS), when a ratio of a silicon atom having following structure (a) is represented by X, and a sum of ratios of silicon atoms having following structures (b) to (d) is represented by Y,

(i) a relationship of X<Y is always satisfied in a measurement range of following condition A, and

(ii) there is a point at which the relationship of X<Y is changed to a relationship of X>Y, and the relationship of X>Y is always satisfied after the change, in a measurement range of following condition B:

Condition A: a period of time starting with a time required for cutting a test piece made of PET by a depth of 2 nm by the irradiation with the Ar-Kα ray and ending with a time required for cutting the test piece by a depth of 20 nm;

Condition B: a period of time starting with the time required for cutting the test piece made of PET by a depth of 20 nm by the irradiation with the Ar-Kα ray and ending with a time required for cutting the test piece by a depth of 50 nm:

where R 1 , R 2 , and R 3 each independently represent a hydrocarbon group having 1 to 6 carbon atoms,

the fine particle is a polycondensate of silicon compounds that are only bifunctional silanes and tetrafunctional silanes,

a ratio of the bifunctional silanes to the sum of the bifunctional silanes and the tetrafunctional silanes is 30 mol % or more and 70 mol % or less, and

the X and the Y satisfy a relationship of 0.20≤Y/(X+Y) at a point of the time required for cutting the test piece made of PET by a depth of 50 nm by the irradiation with the Ar-Kα ray.

7 . The toner according to claim 6 , wherein the fine particle is contained in an amount of 0.1 part by mass or more and 20.0 parts by mass or less with respect to 100 parts by mass of the toner particle.

8 . The toner according to claim 6 , wherein a sticking rate of the fine particle with respect to the toner particle is 50% or more.