IP Library Granted Patent US 12706289
Granted Patent B2
US 12706289 · App. 18/015,804 · Granted Aug 11, 2026

Sample support

Inventors: Akira Tashiro (Hamamatsu, JP); Takayuki Ohmura (Hamamatsu, JP); Masahiro Kotani (Hamamatsu, JP); Takamasa Ikeda (Hamamatsu, JP)
Assignee: HAMAMATSU PHOTONICS K.K.
H01J49/0418
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Quick Facts
Patent No.
US 12706289
App. No.
18/015,804
Granted
Aug 11, 2026
Kind
B2
Abstract

A sample support used for sample component ionization includes: a substrate having a first surface and a plurality of holes opening to the first surface; and a conductive layer provided on the first surface so as not to block the hole, in which the conductive layer is configured by a plurality of nanoparticles and has a thickness of 30 nm or more.

Claims (22)

1 . A sample support used for sample component ionization, the sample support comprising:

a substrate having a first surface and a plurality of holes opening to the first surface; and

a conductive layer provided on the first surface so as not to block the hole,

wherein the conductive layer is configured by a plurality of nanoparticles connected to each other to form the conductive layer and has a thickness of 30 nm or more, and

wherein the conductive layer has nanosized irregularities on its outermost surface.

2 . The sample support according to claim 1 , wherein the nanoparticles are deposited on the first surface and a part of an inner wall surface of the hole on a first surface side.

3 . The sample support according to claim 1 , wherein an average particle size of the nanoparticles is 100 nm or less.

4 . The sample support according to claim 1 , wherein the conductive layer has a thickness of 300 nm or less.

5 . The sample support according to claim 1 , wherein a width of each of the plurality of holes is 50 nm to 400 nm.

6 . The sample support according to claim 1 , wherein the plurality of holes regularly extend along a thickness direction of the substrate.

7 . The sample support according to claim 6 , wherein a ratio of the thickness of the conductive layer to a pitch between the holes is 0.5 to 1.

8 . The sample support according to claim 1 , wherein

the substrate has a second surface on a side opposite to the first surface, and

each of the plurality of holes penetrates the substrate from the first surface to the second surface.

9 . The sample support according to claim 1 , wherein a material of the conductive layer is platinum or gold.

10 . A sample support used for sample component ionization, the sample support comprising:

a substrate having a first surface and a plurality of holes opening to the first surface; and

a conductive layer provided on the first surface so as not to block the hole,

wherein the conductive layer is configured by a plurality of nanoparticles and has a thickness of 30 nm or more,

the substrate has a second surface on a side opposite to the first surface,

each of the plurality of holes penetrates the substrate from the first surface to the second surface, and

the conductive layer has nanosized irregularities on its outermost surface.