FinFET device having flat-top epitaxial features and method of making the same
A semiconductor device includes a substrate, a semiconductor feature protruding from the substrate and extending lengthwise in a first direction, an epitaxial feature directly above the semiconductor feature, and a gate stack adjacent the epitaxial feature. The epitaxial feature comprises a lower portion and an upper portion over the lower portion. The upper portion extends partially through the lower portion in a cross section perpendicular to the first direction. A topmost surface of the upper portion is substantially flat.
1 . A semiconductor device, comprising:
a substrate;
a semiconductor feature protruding from the substrate and extending lengthwise in a first direction;
an epitaxial feature directly above the semiconductor feature; and
a gate stack adjacent the epitaxial feature,
wherein:
the epitaxial feature comprises a lower portion and an upper portion over the lower portion,
the upper portion extends partially through the lower portion in a cross section perpendicular to the first direction, and
a topmost surface of the upper portion is substantially flat.
2 . The semiconductor device of claim 1 , wherein a bottom surface of the upper portion facing the substrate is substantially flat.
3 . The semiconductor device of claim 1 , wherein the upper portion includes a first slanted side surface facing upwards and a second slanted side surface facing downwards.
4 . The semiconductor device of claim 3 , further comprising:
a contact feature atop the upper portion, wherein the contact feature is in physical contact with the topmost surface, the first slanted side surface, and the second slanted side surface of the upper portion.
5 . The semiconductor device of claim 1 , wherein the upper portion includes a side surface substantially perpendicular to a top surface of the substrate.
6 . The semiconductor device of claim 5 , further comprising:
a contact feature atop the upper portion, wherein the contact feature is in physical contact with the topmost surface and the side surface of the upper portion.
7 . The semiconductor device of claim 1 , wherein the upper portion and the lower portion have a same type of dopant at different dopant concentrations.
8 . The semiconductor device of claim 7 , wherein the upper portion has a higher dopant concentration than the lower portion.
9 . The semiconductor device of claim 1 , further comprising:
an isolation structure over the substrate, wherein the lower portion extends partially through the isolation structure.
10 . The semiconductor device of claim 9 , further comprising:
a set of dielectric features disposed on the isolation structure and on opposing sides of the semiconductor feature, wherein the lower portion is sandwiched by the set of dielectric features.
11 . A semiconductor device, comprising:
a substrate;
first and second fins protruding from the substrate;
a first epitaxial feature over the first fin, wherein the first epitaxial feature comprises a first lower portion and a first upper portion with different dopant concentrations, the first upper portion extends partially through the first lower portion, and a top surface of the first epitaxial feature is substantially flat;
a second epitaxial feature over the second fin, wherein the second epitaxial feature has a rhombus-shaped profile, wherein a width of the first epitaxial feature is greater than a width of the second epitaxial feature; and
a conductive feature directly interfacing the top surface of the first upper portion and the second epitaxial feature.
12 . The semiconductor device of claim 11 , wherein the first epitaxial feature has a first slanted side surface facing downwards, the second epitaxial feature has a second slanted side surface facing downwards, and the conductive feature directly interfaces the first slanted side surface and the second slanted side surface.
13 . The semiconductor device of claim 11 , wherein the first epitaxial feature has a first side surface substantially perpendicular to a top surface of the substrate, the second epitaxial feature has a second side surface facing downwards, and the conductive feature directly interfaces the first side surface and the second side surface.
14 . The semiconductor device of claim 11 , wherein the first epitaxial feature and the second epitaxial feature are of opposite conductivity types.
15 . The semiconductor device of claim 11 , wherein the second epitaxial feature comprises a second lower portion and a second upper portion with different dopant concentrations, and the second upper portion extends partially through the second lower portion.
16 . The semiconductor device of claim 11 , wherein the first upper portion has a bottom surface facing the substrate, a vertical distance from the bottom surface to the top surface of the first epitaxial feature is less than a width of the first upper portion.
17 . A semiconductor device, comprising:
a substrate;
a fin-shape structure protruding from the substrate;
an epitaxial feature directly above the fin-shape structure;
a gate stack adjacent the epitaxial feature; and
a contact feature over the epitaxial feature,
wherein:
the epitaxial feature comprises a lower portion and an upper portion over the lower portion,
the upper portion extends partially through the lower portion,
the upper portion has a first slanted side surface facing upwards and a second slanted side surface facing downwards,
the contact feature is in physical contact with the first slanted side surface and the second slanted side surface, and
a bottommost portion of the contact feature is above a bottom surface of the lower portion of the epitaxial feature.
18 . The semiconductor device of claim 17 , wherein the contact feature includes a portion extending downwards below a widest part of the upper portion.
19 . The semiconductor device of claim 17 , wherein the upper portion extends partially through the lower portion in a cross section perpendicular to a lengthwise direction of the fin-shape structure.
20 . The semiconductor device of claim 17 , wherein the upper portion has a higher dopant concentration than the lower portion.