IP Library › Granted Patent US 12707832
Granted Patent B2
US 12707832 · App. 17/531,304 · Granted Aug 11, 2026

Display panel with flow rate regulating structure for regulating flow rate of process liquid, method for manufacturing the same, and display device

Inventors: Kun Yu (Beijing, CN); Xingxing Song (Beijing, CN); Fude Zha (Beijing, CN); Ming Wang (Beijing, CN); Haitao Wang (Beijing, CN); Yanming Lv (Beijing, CN); Yusheng An (Beijing, CN); Qingyong Meng (Beijing, CN)
Assignees: Hefei BOE Optoelectronics Technology Co., Ltd.; BOE Technology Group Co., Ltd.
H10K59/131H10K59/88H10K59/12H10K59/1201
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Quick Facts
Patent No.
US 12707832
App. No.
17/531,304
Granted
Aug 11, 2026
Kind
B2
Abstract

A display panel, a mask plate, a method for manufacturing the display panel, and a display device are provided. The display panel includes a display area and a peripheral area surrounding the display area, and the display panel further includes: at least two integrated chips located in the peripheral area of the display area and arranged along a boundary direction of the display area; at least one flow rate regulating structure is respectively located between two adjacent integrated chips and located on a side of the integrated chips remote from the display area, and the flow rate regulating structure is configured to adjust a flow rate of process liquid.

Claims (27)

1 . A display panel, comprising:

a display area;

a peripheral area surrounding the display area, wherein the peripheral area abuts one sides of the display area;

at least two integrated chips located in the peripheral area of at least one side of the display area and arranged along a boundary direction of the display area, wherein the boundary is a boundary close to a side of the at least two integrated chips; and

at least one flow rate regulating structure, located between the at least two integrated chips and on a side of the at least two integrated chips remote from the display area, wherein the flow rate regulating structure is configured to regulate a flow rate of process liquid;

wherein the flow rate regulating structure comprises: at least one seventh retaining wall and at least one eighth retaining wall, wherein each seventh retaining wall and each eighth retaining wall intersect at a side of the at least two integrated chips remote from the display area;

the flow rate regulating structure further comprises ninth retaining walls, at least one ninth retaining wall and the at least one seventh retaining wall intersect and are distributed in a third grid-like structure; and the at least one ninth retaining wall and the at least one eighth retaining wall intersect and are distributed in the third grid-like structure which has an unevenly distributed grid density;

wherein a plurality of the seventh retaining walls are arranged in parallel in a first direction and a plurality of the eighth retaining walls are arranged in parallel in a second direction, the first direction is a direction pointing vertically-downwards and towards the display area and the second direction is a direction pointing vertically downwards and away from the display area.

2 . The display panel according to claim 1 , wherein the number of the integrated chips is 4 to 8, and one flow rate regulating structure is provided between two adjacent integrated chips.

3 . The display panel according to claim 1 , further comprising a gate electrode layer, wherein the flow rate regulating structure is provided at the gate electrode layer.

4 . A method for manufacturing a display panel, wherein the display panel comprises a display area and the peripheral area surrounding the display area, and the peripheral area abuts all one sides of the display area, the manufacturing method of the display panel comprises:

manufacturing the at least two integrated chips in the peripheral area of at least one side of the display area, wherein the at least two integrated chips are arranged along a boundary direction of the display area, and the boundary is a boundary close to a side of the at least two integrated chips;

manufacturing at least one flow rate regulating structure, wherein the flow rate regulating structure is located between the at least two integrated chips and on the side of the at least two integrated chips remote from the display area and the flow rate regulating structure is configured to regulate the flow rate of the process liquid;

wherein the flow rate regulating structure comprises: at least one seventh retaining wall and at least one eighth retaining wall, wherein each seventh retaining wall and each eighth retaining wall intersect at a side of the at least two integrated chips remote from the display area;

the flow rate regulating structure further comprises ninth retaining walls, at least one ninth retaining wall and the at least one seventh retaining wall intersect and are distributed in a third grid-like structure; and the at least one ninth retaining wall and the at least one eighth retaining wall intersect and are distributed in the third grid-like structure which has an unevenly distributed grid density;

wherein a plurality of the seventh retaining walls are arranged in parallel in a first direction and a plurality of the eighth retaining walls are arranged in parallel in a second direction, the first direction is a direction pointing vertically downwards and towards the display area and the second direction is a direction pointing vertically downwards and away from the display area.

5 . A display device, comprising a display panel;

wherein the display panel comprises:

a display area;

a peripheral area surrounding the display area, wherein the peripheral area abuts one sides of the display area;

at least two integrated chips located in the peripheral area of at least one side of the display area and arranged along a boundary direction of the display area, wherein the boundary is a boundary close to a side of the at least two integrated chips; and

at least one flow rate regulating structure, located between the at least two integrated chips and on a side of the at least two integrated chips remote from the display area, wherein the flow rate regulating structure is configured to regulate a flow rate of process liquid;

wherein the flow rate regulating structure comprises: at least one seventh retaining wall and at least one eighth retaining wall, wherein each seventh retaining wall and each eighth retaining wall intersect at a side of the at least two integrated chips remote from the display area;

the flow rate regulating structure further comprises ninth retaining walls, at least one ninth retaining wall and the at least one seventh retaining wall intersect and are distributed in a third grid-like structure; and the at least one ninth retaining wall and the at least one eighth retaining wall intersect and are distributed in the third grid-like structure which has an unevenly distributed grid density;

wherein a plurality of the seventh retaining walls are arranged in parallel in a first direction and a plurality of the eighth retaining walls are arranged in parallel in a second direction, the first direction is a direction pointing vertically downwards and towards the display area and the second direction is a direction pointing vertically downwards and away from the display area.

6 . The display device according to claim 5 , wherein the number of the integrated chips is 4 to 8, and one flow rate regulating structure is provided between two adjacent integrated chips.

7 . The display device according to claim 5 , further comprising a gate electrode layer, wherein the flow rate regulating structure is provided at the gate electrode layer.