Systems and methods for detecting a substrate in a chamber of a substrate processing system
Methods, systems, and apparatus are provided for detecting a substrate in a chamber of a substrate processing system. In some embodiments, the system may include a sensor system comprising: a light source configured to generate light; a first light guide fixed relative to the light source and having a light input and a light output offset from the light input, the light input configured to receive light generated by the light source, wherein the first light guide guides the light between the light input and the light output so that the light output emits a light beam into a volume of the chamber; and a sensor configured to sense the light beam emitted from the light output.
1 . A substrate processing system comprising:
a chamber having an interior volume; and
a sensor system coupled to the chamber, the sensor system comprising:
a light source configured to generate light;
a first light guide and a second light guide fixed relative to the light source, the first light guide and the second light guide each having a light input and a light output offset from the light input, the light input configured to receive light generated by the light source, wherein each of the first light guide and the second light guide guides the light between the respective light input and the light output so that the light output emits a light beam into the interior volume of the chamber;
a first sensor configured to sense the light beam emitted from the light output of the first light guide; and
a second sensor configured to sense the light beam emitted from the light output of the second light guide,
wherein the light output of the first light guide and the light output of the second light guide are arranged along a common axis and configured to emit light in parallel directions.
2 . The substrate processing system of claim 1 , further comprising a controller to determine a center of a substrate based on an output of the sensor.
3 . The substrate processing system of claim 1 , further comprising a reflector spaced from the first light guide and configured to receive and reflect the light beam towards the sensor.
4 . The substrate processing system of claim 1 , further comprising a second light guide on a lid of the chamber, wherein the second light guide is positioned on an optical path between the first light guide and the sensor.
5 . The substrate processing system of claim 1 , wherein the first light guide is comprised of at least one of polycarbonate, glass, or quartz.
6 . The substrate processing system of claim 1 , wherein the light is received at the light input along a first direction and the light emitted at the light output is emitted along a second direction different from the first direction.
7 . The substrate processing system of claim 1 , wherein the first light guide and the second light guide includes a plurality of light outputs offset from one another and configured to emit light in parallel directions, wherein the plurality of light outputs are arranged along the common axis.
8 . The substrate processing system of claim 1 , further comprising a robot arm configured for supporting a substrate horizontally along a path of movement within the interior volume that is coincident with an optical path between the first light guide and the sensor for triggering the sensor.
9 . The substrate processing system of claim 1 , wherein the chamber includes a wall that includes a slit valve opening being located along the path of movement, and further comprising a slit valve door selectively opening and closing the slit valve opening.
10 . The substrate processing system of claim 9 , wherein the first light guide is fixed to the slit valve within the interior volume of the chamber.
11 . The substrate processing system of claim 9 , further comprising a mounting frame for mounting the slit valve to at least one of the wall or a base of the chamber, wherein the light source is fixed to the mounting frame.
12 . A sensor system for detecting a substrate in a chamber of a substrate processing system, the sensor system comprising:
a light source configured to generate light;
a first light guide and a second light guide fixed relative to the light source, the first light guide and the second light guide each having a light input and a light output offset from the light input, the light input configured to receive light generated by the light source, wherein each of the first light guide and the second light guide guides the light between the respective light input and the light output so that the light output emits a light beam into a volume of the chamber;
a first sensor configured to sense the light beam emitted from the light output of the first light guide; and
a second sensor configured to sense the light beam emitted from the light output of the second light guide,
wherein the light outputs of the first light guide and the second light guide are arranged along a common axis and configured to emit light in parallel directions.
13 . The substrate processing system of claim 12 , wherein the light source includes at least one of a light emitting diode or a laser.
14 . The sensor system of claim 12 , further comprising a reflector spaced from the first light guide and configured to receive and reflect the light beam towards the sensor.
15 . The sensor system of claim 12 , wherein the first light guide is comprised of at least one of polycarbonate, glass, or quartz.
16 . The sensor system of claim 12 , wherein the first light guide and the second light guide includes a plurality of light outputs offset from one another and configured to emit light in parallel directions, and wherein the plurality of light outputs are arranged along the common axis.
17 . The sensor system of claim 16 , further comprising a beam splitter between the plurality of light outputs, wherein the beam splitter is configured to split the light generated by the light source into a portion of light for each of the plurality of light outputs.
18 . A method for detecting a substrate in a chamber of a substrate processing system, the method comprising:
generating an array of light beams within the chamber transverse to a path of movement of the substrate within the chamber, wherein the array of light beams is generated by one or more sensor system comprising:
a light source configured to generate light;
a first light guide and a second light guide fixed relative to the light source the first light guide and the second light guide each having a light input and a light output offset from the light input, the light input configured to receive light generated by the light source, wherein each of the first light guide and the second light guide guides the light between the respective light input and the light output so that the light output emits a light beam into a volume of the chamber;
a first sensor configured to sense the light beam emitted from the light output of the first light guide; and
a second sensor configured to sense the light beam emitted from the light output of the second light guide,
wherein the light outputs of the first light guide and the second light guide are arranged along a common axis and configured to emit light in parallel directions;
moving the substrate along the path such that leading and trailing edges of the substrate trigger the sensor to thereby generate associated sensor outputs that represent positions associated with the light outputs along the path of movement; and
determining a center of the substrate based on the sensor outputs.
19 . The method of claim 18 , wherein the first light guide includes a plurality of light outputs offset from one another and configured to emit light in parallel directions, and wherein the array of light beams includes light beams output from the plurality of light outputs.
20 . The method of claim 18 , wherein the sensor system further includes a reflector spaced from the first light guide and configured to receive and reflect a light beam of the array of light beams towards the sensor.