Method of cleaning a nozzle

1 . A method of cleaning a nozzle, the method comprising:

positioning a first hole of a function switching plate to engage a first cleaning device with the nozzle;

vacuuming the nozzle using the first cleaning device;

positioning a second hole, different from the first hole, of the function switching plate to engage a second cleaning device with the nozzle, wherein positioning the second hole comprises rotating the function switching plate;

mechanically cleaning the nozzle using the second cleaning device; and

measuring a level of contaminant particles in a gas stream emitted from the nozzle following the vacuuming and the mechanical cleaning.

2 . The method of claim 1 , further comprising determining whether the level of contaminant particles in the gas stream satisfies a predetermined level.

3 . The method of claim 2 , further comprising repeating, in response to a determination that the level of contaminant particles in the gas stream fails to satisfy the predetermined level, the positioning of the first hole and the vacuuming of the nozzle.

4 . The method of claim 2 , further comprising capturing an image of the nozzle in response to a determination that the level of contaminant particles in the gas stream satisfies the predetermined level.

5 . The method of claim 4 , further comprising positioning a third hole of the function switching plate to engage an imaging device with the nozzle, wherein the capturing the image of the nozzle is performed using the imaging device.

6 . The method of claim 1 , further comprising measuring a temperature or a humidity of the gas stream from the nozzle.

7 . The method of claim 1 , further comprising disengaging the function switching plate from the nozzle.

8 . The method of claim 1 , where mechanically cleaning the nozzle comprises mechanically cleaning the nozzle using at least one brush.

9 . A method of cleaning a nozzle, the method comprising:

reducing a flow rate of a gas stream emitted from the nozzle;

loading a cleaning apparatus on the nozzle, wherein the cleaning apparatus includes a function switching plate, a first cleaning device, and a second cleaning device;

positioning a first hole of the function switching plate to engage the first cleaning device with the nozzle;

vacuuming the nozzle using the first cleaning device;

positioning a second hole, different from the first hole, of the function switching plate to engage the second cleaning device with the nozzle, wherein positioning the second hole comprises moving the function switching plate;

mechanically cleaning the nozzle using the second cleaning device;

measuring a level of contaminant particles in the gas stream following the vacuuming and the mechanical cleaning; and

disengaging the cleaning apparatus from the nozzle in response to a determination that the level of the contaminant particles satisfies a predetermined level.

10 . The method of claim 9 , further comprising positioning a third hole of the function switching plate to engage an imaging device with the nozzle prior to disengaging the cleaning apparatus from the nozzle.

11 . The method of claim 10 , further comprising capturing an image of the nozzle using the imaging device.

12 . The method of claim 9 , further comprising repeating the vacuuming and the mechanical cleaning of the nozzle in response to a determination that the level of the contaminant particles fails to satisfy the predetermined level.

13 . The method of claim 9 , wherein the reducing the flow rate of the gas stream is after the loading the cleaning apparatus on the nozzle.

14 . The method of claim 9 , wherein the mechanically cleaning comprises cleaning the nozzle using a brush for a predetermined period of time.

15 . The method of claim 9 , wherein positioning the second hole of the function switching plate comprises rotating the function switching plate.

16 . A method of cleaning a nozzle, the method comprising:

arranging a function switching plate at a first position where a first hole of the function switching plate is aligned with a vacuum;

engaging the vacuum with the nozzle through the first hole;

removing contaminant particles from the nozzle using the vacuum;

moving the function switching plate to a second position where a second hole, different from the first hole, of the function switching plate is aligned with a brush;

engaging the brush with the nozzle through the second hole;

removing contaminant particles adhering to the nozzle using the brush;

measuring a level of contaminant particles in a gas stream from the nozzle using a monitoring device;

determining whether the level of contaminant particles satisfies a predetermined level; and

in response to a determination that the level of contaminant particles fails to satisfy the predetermined level, repeating the removing of contaminant particles from the nozzle using the vacuum.

17 . The method of claim 16 , further comprising capturing an image of the nozzle using an imaging device in response to a determination that the level of contaminant particles satisfies the predetermined level.

18 . The method of claim 17 , further comprising moving the function switching plate to a third position where a third hole of the function switching plate is aligned with the imaging device prior to capturing the image of the nozzle.

19 . The method of claim 16 , further comprising measuring a temperature or a humidity of the gas stream from the nozzle.

20 . The method of claim 16 , wherein the brush is a particle-free brush.