Substrate holder systems
Embodiments described herein relate to substrate holder systems. An apparatus includes a substrate holder having a surface to receive a substrate. The surface has a texture that causes an optical beam incident on the surface to scatter in at least one direction away from an optical detector to be located above the substrate holder.
1 . An apparatus comprising:
a substrate holder of a metrology system, the substrate holder having a surface to receive a substrate, wherein the surface comprises:
a structural element defined by a pattern of shapes; and
a porous material element disposed on the structural element;
wherein the structural element and the porous material element define a texture that causes an optical beam to be scattered in at least one direction away from an optical detector located above the substrate holder.
2 . The apparatus of claim 1 , wherein the substrate holder comprises a chuck.
3 . The apparatus of claim 1 , further comprising:
the substrate secured to the substrate holder; and
a patterning film disposed on the substrate.
4 . The apparatus of claim 1 , wherein at least one of the structural element or the porous material element comprises nickel.
5 . The apparatus of claim 1 , wherein the structural element is defined by a needle pattern.
6 . The apparatus of claim 1 , wherein the structural element is defined by a honeycomb pattern.
7 . The apparatus of claim 1 , wherein the structural element is defined by a periodical pattern.
8 . The apparatus of claim 1 , wherein the surface further comprises a passivation layer.
9 . The apparatus of claim 8 , wherein the passivation layer comprises nickel fluoride.
10 . A metrology system comprising:
a substrate holder having a surface to receive a substrate, wherein the surface comprises structural element defined by a pattern of shapes, and a porous material element disposed on the structural element; and
an optical detector located above the substrate holder;
wherein the structural element and the porous material element define a texture that causes an optical beam to be scattered in at least one direction away from the optical detector.
11 . The metrology system of claim 10 , wherein the substrate holder comprises a chuck.
12 . The metrology system of claim 10 , further comprising:
the substrate secured to the substrate holder; and
a patterning film disposed on the substrate.
13 . The metrology system of claim 10 , wherein the structural element is defined by one of: a needle pattern, a honeycomb pattern, or a periodical pattern.
14 . The metrology system of claim 10 , wherein the surface further comprises a passivation layer.
15 . The metrology system of claim 14 , wherein at least one of the structural element or the porous material element comprises nickel, and wherein the passivation layer comprises nickel fluoride.
16 . A method comprising:
obtaining a base material; and
forming, from the base material, a substrate holder of a metrology system, wherein the substrate holder comprises a surface comprising a structural element defined by a pattern of shapes, and a porous material element disposed on the structural element, and wherein the structural element and the porous material element define a texture that causes an optical beam to be scattered in at least one direction away from an optical detector located above the substrate holder.
17 . The method of claim 16 , wherein forming the substrate holder from the base material comprises forming at least a portion of the substrate holder using additive manufacturing.
18 . The method of claim 16 , wherein forming the substrate holder further comprises passivating the surface to form a passivation layer.
19 . The method of claim 18 , wherein passivating the surface of the substrate holder to form the passivation layer comprises using direct fluorination to fluorinate the surface.
20 . The method of claim 18 , wherein passivating the surface of the substrate holder to form the passivation layer comprises oxidizing the surface to form an oxide layer, and fluorinating the oxide layer.