Substrate processing apparatus
A substrate processing apparatus includes a nozzle that supplies a processing liquid to a substrate, a mover that moves the nozzle between a supply position above a substrate and a waiting position outward of the substrate, a nozzle container that is located at the waiting position and contains the nozzle, a first exhaust flow path that guides a gas in a processing space in which a processing liquid is supplied to a substrate to an exhaust device, and a second exhaust flow path that guides a gas in the nozzle container to the first exhaust flow path.
1 . A substrate processing apparatus comprising:
a nozzle that supplies a processing liquid to a substrate;
a mover that moves the nozzle between a supply position above the substrate and a waiting position outward of the substrate;
a nozzle container that is located at the waiting position and contains the nozzle;
a first exhaust flow path that guides a gas in a processing space in which a processing liquid is supplied to the substrate to an exhaust device; and
a second exhaust flow path that guides a gas in the nozzle container to the first exhaust flow path.
2 . The substrate processing apparatus according to claim 1 , further comprising a flow-rate regulator that regulates a flow rate of a gas flowing through the second exhaust flow path.
3 . The substrate processing apparatus according to claim 2 , wherein
the flow-rate regulator further includes an operation unit to be operated by a user in order to regulate the flow rate of the gas in the second exhaust flow path, and
the operation unit is provided to be directed toward a maintenance space formed to be adjacent to a casing including the nozzle container and the processing space.
4 . The substrate processing apparatus according to claim 1 , wherein
the nozzle container includes
an opening that causes an inner space of the nozzle container and the second exhaust flow path to communicate with each other, and
a flow-path forming member that is provided in the nozzle container and covers the opening.
5 . The substrate processing apparatus according to claim 4 , wherein
the opening is formed in a sidewall of the nozzle container,
the flow-path forming member is provided to partition the inner space of the nozzle container into a third exhaust flow path and another space, and
the third exhaust flow path has an exhaust port connected to the opening and an intake port that opens downwardly.
6 . The substrate processing apparatus according to claim 5 , wherein
a lower end of the flow-path forming member is located farther downwardly than a lower end of the nozzle contained in the nozzle container.