Polishing head, polishing apparatus, and elastic body
According to one embodiment, a polishing head includes: a head body disposed to face a polishing pad for polishing a surface to be polished of a substrate to be processed, the head body being capable of rotating the substrate to be processed with respect to the polishing pad; a plurality of substrate pressing parts provided concentrically on a surface of the head body on a polishing pad side, the substrate pressing parts being independently displaceable with respect to the polishing pad with a pressure change of contained gas; and an elastic body provided between the surface to be polished and surfaces of the plurality of substrate pressing parts on the polishing pad side, the elastic body being capable of holding the substrate to be processed on a substrate holding surface facing the polishing pad. The substrate holding surface of the elastic body fits inside a range facing an outermost peripheral substrate pressing part among the plurality of substrate pressing parts.
1 . A polishing head comprising:
a head body disposed to face a polishing pad for polishing a surface to be polished of a substrate to be processed, the head body being capable of rotating the substrate to be processed with respect to the polishing pad;
a plurality of substrate pressing parts provided concentrically on a surface of the head body on a polishing pad side, the substrate pressing parts being independently displaceable with respect to the polishing pad with a pressure change of contained gas; and
an elastic body provided between the surface to be polished and surfaces of the plurality of substrate pressing parts on the polishing pad side, the elastic body being capable of holding the substrate to be processed on a substrate holding surface facing the polishing pad, wherein
the elastic body includes a step portion recessed from the substrate holding surface toward an outermost peripheral substrate pressing part among the plurality of substrate pressing parts in a range facing the outermost peripheral substrate pressing part, and
the substrate holding surface of the elastic body fits inside the range facing the outermost peripheral substrate pressing part.
2 . The polishing head according to claim 1 , wherein
the step portion includes a side surface bending and extending in an upward direction from the substrate holding surface, and a bottom surface bending from an upper end of the side surface and extending toward an outside of the elastic body, and
the bottom surface faces the substrate to be processed in a range overlapping the outermost peripheral substrate pressing part in a vertical direction.
3 . The polishing head according to claim 1 , wherein
a material of the elastic body is at least one of silicone rubber, butyl rubber, and chloroprene rubber.
4 . A polishing head comprising:
a head body disposed to face a polishing pad for polishing a surface to be polished of a substrate to be processed, the head body being capable of rotating the substrate to be processed with respect to the polishing pad;
a plurality of substrate pressing parts provided concentrically on a surface of the head body on a polishing pad side, the substrate pressing parts being independently displaceable with respect to the polishing pad with a pressure change of contained gas; and
an elastic body provided between the surface to be polished and surfaces of the plurality of substrate pressing parts on the polishing pad side, the elastic body being capable of holding the substrate to be processed on a substrate holding surface facing the polishing pad, wherein
an outer peripheral edge of the elastic body is positioned inside an outer peripheral edge of an outermost peripheral substrate pressing part among the plurality of substrate pressing parts,
the substrate holding surface of the elastic body fits inside a range facing the outermost peripheral substrate pressing part, and
the outermost peripheral substrate pressing part faces the substrate to be processed without interposing the elastic body between the outermost peripheral substrate pressing part and the substrate to be processed.
5 . The polishing head according to claim 4 , wherein
a material of the elastic body is at least one of silicone rubber, butyl rubber, and chloroprene rubber.
6 . A polishing apparatus comprising:
a polishing pad against which a surface to be polished of a substrate to be processed is pressed to polish the surface to be polished;
a plurality of substrate pressing parts provided concentrically on a surface of a head body on a polishing pad side, the substrate pressing parts being independently displaceable with respect to the polishing pad with a pressure change of contained gas; and
an elastic body provided between the surface to be polished and surfaces of the plurality of substrate pressing parts on the polishing pad side, the elastic body being capable of holding the substrate to be processed on a substrate holding surface, wherein
the elastic body includes a step portion recessed from the substrate holding surface toward an outermost peripheral substrate pressing part among the plurality of substrate pressing parts in a range facing the outermost peripheral substrate pressing part, and
the substrate holding surface of the elastic body fits inside the range facing the outermost peripheral substrate pressing part.
7 . The polishing apparatus according to claim 6 , wherein
the step portion includes a side surface bending and extending in an upward direction from the substrate holding surface, and a bottom surface bending from an upper end of the side surface and extending toward an outside of the elastic body, and
the bottom surface faces the substrate to be processed in a range overlapping the outermost peripheral substrate pressing part in a vertical direction.
8 . The polishing apparatus according to claim 6 , wherein
a material of the elastic body is at least one of silicone rubber, butyl rubber, and chloroprene rubber.
9 . A polishing apparatus comprising:
a polishing pad against which a surface to be polished of a substrate to be processed is pressed to polish the surface to be polished;
a plurality of substrate pressing parts provided concentrically on a surface of a head body on a polishing pad side, the substrate pressing parts being independently displaceable with respect to the polishing pad with a pressure change of contained gas; and
an elastic body provided between the surface to be polished and surfaces of the plurality of substrate pressing parts on the polishing pad side, the elastic body being capable of holding the substrate to be processed on a substrate holding surface, wherein
an outer peripheral edge of the elastic body is positioned inside an outer peripheral edge of an outermost peripheral substrate pressing part among the plurality of substrate pressing parts,
the substrate holding surface of the elastic body fits inside a range facing the outermost peripheral substrate pressing part, and
the outermost peripheral substrate pressing part faces the substrate to be processed without interposing the elastic body between the outermost peripheral substrate pressing part and the substrate to be processed.
10 . The polishing apparatus according to claim 9 , wherein
a material of the elastic body is at least one of silicone rubber, butyl rubber, and chloroprene rubber.
11 . An elastic body used in a polishing head that presses a surface to be polished of a substrate to be processed against a polishing pad to polish the surface to be polished,
the elastic body being provided between the surface to be polished and surfaces of a plurality of substrate pressing parts on a polishing pad side, the plurality of substrate pressing parts being concentrically provided on a surface of the polishing head on the polishing pad side and independently displaceable with respect to the polishing pad with a pressure change of contained gas,
the elastic body being configured to be capable of holding the substrate to be processed on a substrate holding surface, wherein
the elastic body includes a step portion recessed from the substrate holding surface toward an outermost peripheral substrate pressing part among the plurality of substrate pressing parts in a range facing the outermost peripheral substrate pressing part, and
the substrate holding surface fits inside the range facing the outermost peripheral substrate pressing part.
12 . The elastic body according to claim 11 , wherein
the step portion includes a side surface bending and extending in an upward direction from the substrate holding surface, and a bottom surface bending from an upper end of the side surface and extending toward an outside of the elastic body, and
the bottom surface faces the substrate to be processed in a range overlapping the outermost peripheral substrate pressing part in a vertical direction.
13 . The elastic body according to claim 11 , wherein
a material of the elastic body is at least one of silicone rubber, butyl rubber, and chloroprene rubber.
14 . An elastic body used in a polishing head that presses a surface to be polished of a substrate to be processed against a polishing pad to polish the surface to be polished,
the elastic body being provided between the surface to be polished and surfaces of a plurality of substrate pressing parts on a polishing pad side, the plurality of substrate pressing parts being concentrically provided on a surface of the polishing head on the polishing pad side and independently displaceable with respect to the polishing pad with a pressure change of contained gas,
the elastic body being configured to be capable of holding the substrate to be processed on a substrate holding surface, wherein
an outer peripheral edge of the elastic body is positioned inside an outer peripheral edge of an outermost peripheral substrate pressing part among the plurality of substrate pressing parts,
the substrate holding surface fits inside a range facing the outermost peripheral substrate pressing part, and
the outermost peripheral substrate pressing part faces the substrate to be processed without interposing the elastic body between the outermost peripheral substrate pressing part and the substrate to be processed.
15 . The elastic body according to claim 14 , wherein
a material of the elastic body is at least one of silicone rubber, butyl rubber, and chloroprene rubber.