Imprint mold, method for manufacturing the same and method for manufacturing reproduced imprint mold

1 . An imprint mold comprising:

a synthetic quartz glass substrate having a transfer pattern formed on a surface thereof; and

a coating layer formed on at least a part of the transfer pattern by at least one of materials different from the substrate,

wherein the coating layer is capable of being removed from the pattern,

wherein a fracture strength of a portion of the transfer pattern where the coating layer is formed is higher than a fracture strength of the transfer pattern before the coating layer is formed,

wherein the coating layer has a thickness of 50 nm or less, and variation in thickness is within 10% of an average value of the thickness of the coating layer,

wherein the coating layer consists of a deposition of an atomic layer of the reaction product of at least two reactive precursors, and

wherein the at least two reactive precursors are trimethylaluminum and water, which are reacted on the surface of the substrate to form an Al 2 O 3 layer, and the coating layer is obtained by heating the Al 2 O 3 layer formed on the surface of the substrate at a temperature of 100 to 900° C.

2 . The imprint mold according to claim 1 , wherein the material different from the substrate is a metal, an inorganic oxide, or an inorganic nitride.

3 . The imprint mold according to claim 1 , wherein the fracture strength of a portion of the transfer pattern where the coating layer is formed is 1.05 times or more of the fracture strength of the transfer pattern before the coating layer is formed.

4 . The imprint mold according to claim 2 , wherein the material different from the substrate comprises at least one material selected from the group consisting of Cu, Ni, alloy containing Cu and Ni, Al 2 O 3 , ZrO 2 , HfO 2 , TaN, and WN.

5 . The imprint mold according to claim 4 , wherein the material different from the substrate is Al 2 O 3 .

6 . The imprint mold according to claim 1 , the coating layer has a Mohs hardness of 6 or more.

7 . The imprint mold according to claim 1 , wherein the coating layer is disposed on the synthetic quartz glass substrate so that the coating layer covers an entire surface of the synthetic quartz glass substrate, on which the transfer pattern is formed.

8 . An imprint mold comprising:

a synthetic quartz glass substrate having a transfer pattern formed on a surface thereof; and

a coating layer formed on at least a part of the transfer pattern by at least one of materials different from the substrate,

wherein the coating layer is capable of being removed from the pattern,

wherein a fracture strength of a portion of the transfer pattern where the coating layer is formed is higher than a fracture strength of the transfer pattern before the coating layer is formed,

wherein the coating layer has a thickness of 3 nm or less, and variation in thickness is within 10% of an average value of the thickness of the coating layer,

wherein the coating layer consists of a deposition of the atomic layer of the reaction product of at least two reactive precursors, and

wherein the at least two reactive precursors are trimethylaluminum and water, which are reacted on the surface of the substrate to form an Al 2 O 3 layer, and the coating layer is obtained by heating the Al 2 O 3 layer formed on the surface of the substrate at a temperature of 100 to 900° C.

9 . An imprint mold comprising:

a synthetic quartz glass substrate having a transfer pattern formed on a surface thereof; and

a coating layer formed on at least a part of the transfer pattern by at least one of materials different from the substrate,

wherein the coating layer is capable of being removed from the pattern,

wherein a fracture strength of a portion of the transfer pattern where the coating layer is formed is higher than a fracture strength of the transfer pattern before the coating layer is formed,

wherein the coating layer has a thickness of 3 nm or less, and variation in thickness is within 10% of an average value of the thickness of the coating layer, and

wherein the coating layer consists of a deposition of the atomic layer of the reaction product of at least two reactive precursors, and

wherein the at least two reactive precursors are trimethylaluminum and water, which are alternately supplied and reacted on the substrate surface by repeating the alternate supply up to 20 cycles to form an Al 2 O 3 layer, and the coating layer is obtained by heating the Al 2 O 3 layer formed on the surface of the substrate at a temperature of 100 to 900° C.

10 . The imprint mold according to claim 8 , wherein the fracture strength of a portion of the transfer pattern where the coating layer is formed is 1.05 times or more of the fracture strength of the transfer pattern before the coating layer is formed.

11 . The imprint mold according to claim 8 , the coating layer has a Mohs hardness of 6 or more.

12 . The imprint mold according to claim 8 , wherein the coating layer is disposed on the synthetic quartz glass substrate so that the coating layer covers an entire surface of the synthetic quartz glass substrate, on which the transfer pattern is formed.

13 . The imprint mold according to claim 9 , wherein the fracture strength of a portion of the transfer pattern where the coating layer is formed is 1.05 times or more of the fracture strength of the transfer pattern before the coating layer is formed.

14 . The imprint mold according to claim 9 , the coating layer has a Mohs hardness of 6 or more.

15 . The imprint mold according to claim 9 , wherein the coating layer is disposed on the synthetic quartz glass substrate so that the coating layer covers an entire surface of the synthetic quartz glass substrate, on which the transfer pattern is formed.