Multi-layer high-efficiency dielectric grating with improved manufacturability

Inventors: Justin Hannigan (Eugene, OR); Dmitri Iazikov (Eugene, OR); Christoph Greiner (Eugene, OR); John Hostetler (Eugene, OR)

Assignee: II-VI DELEWARE, INC.

G02B5/1857 G02B5/1861 G02B5/1866

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Quick Facts

Patent No.: US 12710572
App. No.: 18/382,366
Granted: Aug 18, 2026
Kind: B2

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Abstract

Systems and methods are provided for multi-layer high-efficiency dielectric grating with improved manufacturability. An example diffraction grating based morphology includes a plurality of grating lines; a plurality of intermediate layers; and a substrate bearing both of the plurality of grating lines and the plurality of intermediate layers; where one or more of the plurality of grating lines include a plurality of grating layers; and where at least two of the plurality of grating layers include different refractive index (RI) material. The plurality of grating layers includes one or more layers having low refractive index (RI) material and one or more layers having high refractive index (RI) material. The plurality of intermediate layers includes a plurality of matching layers and a plurality of dielectric layers.

Claims (30)

1 . A diffraction grating based morphology comprising:

a plurality of grating lines;

a plurality of intermediate layers; and

a substrate bearing both of the plurality of grating lines and the plurality of intermediate layers;

wherein one or more of the plurality of grating lines comprise a plurality of grating layers;

wherein at least two of the plurality of grating layers comprise different refractive index (RI) material;

wherein at least two of the plurality of intermediate layers comprise different refractive index (RI) material; and

wherein at least one intermediate layer comprises refractive index (RI) material not used in the plurality of grating layers.

2 . The diffraction grating based morphology according to claim 1 , wherein the plurality of grating layers comprises one or more layers comprising low refractive index (RI) material and one or more layers comprising high refractive index (RI) material, wherein the low refractive index (RI) material and the high refractive index (RI) material differ based on, at least, the high refractive index (RI) material having a refractive index (RI) that is higher by a pre-determined minimum difference.

3 . The diffraction grating based morphology according to claim 2 , wherein a top layer of the plurality of grating layers comprises the low refractive index (RI) material.

4 . The diffraction grating based morphology according to claim 2 , wherein the one or more layers comprising the low refractive index (RI) material and one or more layers comprising the high refractive index (RI) material are arranged in alternating manner.

5 . The diffraction grating based morphology according to claim 2 , wherein the low refractive index (RI) material comprises silicon dioxide (SiO 2 ).

6 . The diffraction grating based morphology according to claim 2 , wherein the high refractive index (RI) material comprises hafnium dioxide (HfO 2 ).

7 . The diffraction grating based morphology according to claim 1 , wherein the plurality of intermediate layers comprises a plurality of matching layers.

8 . The diffraction grating based morphology according to claim 7 , wherein a first layer of the plurality of matching layers that is in contact with the plurality of grating lines is an etch-stop layer.

9 . The diffraction grating based morphology according to claim 8 , wherein the etch-stop layer comprises high refractive index (RI) material.

10 . The diffraction grating based morphology according to claim 7 , wherein the plurality of matching layers comprises layers having different refractive index (RI) material.

11 . The diffraction grating based morphology according to claim 10 , wherein the plurality of matching layers comprises one or more layers comprising low refractive index (RI) material and one or more layers comprising high refractive index (RI) material, wherein the low refractive index (RI) material and the high refractive index (RI) material differ based on, at least, the high refractive index (RI) material having a refractive index (RI) that is higher by a pre-determined minimum difference.

12 . The diffraction grating based morphology according to claim 11 , wherein the one or more layers comprising the low refractive index (RI) material and one or more layers comprising the high refractive index (RI) material are arranged in alternating manner.

13 . The diffraction grating based morphology according to claim 11 , wherein the low refractive index (RI) material comprises silicon dioxide (SiO 2 ).

14 . The diffraction grating based morphology according to claim 11 , wherein the high refractive index (RI) material comprises hafnium dioxide (HfO 2 ).

15 . The diffraction grating based morphology according to claim 1 , wherein the plurality of intermediate layers comprises a plurality of dielectric layers.

16 . The diffraction grating based morphology according to claim 15 , wherein the plurality of dielectric layers comprises layers having different refractive index (RI) material.

17 . The diffraction grating based morphology according to claim 16 , wherein the plurality of dielectric layers comprises one or more layers comprising low refractive index (RI) material and one or more layers comprising high refractive index (RI) material, wherein the low refractive index (RI) material and the high refractive index (RI) material differ based on, at least, the high refractive index (RI) material having a refractive index (RI) that is higher by a pre-determined minimum difference.

18 . The diffraction grating based morphology according to claim 17 , wherein the one or more layers comprising the low refractive index (RI) material and one or more layers comprising the high refractive index (RI) material are arranged in alternating manner.

19 . The diffraction grating based morphology according to claim 17 , wherein the low refractive index (RI) material comprises silicon dioxide (SiO 2 ).

20 . The diffraction grating based morphology according to claim 17 , wherein the one or more layers comprising the high refractive index (RI) material comprises at least one first layer comprising a first high refractive index (RI) material and at least one second layer comprising a second high refractive index (RI) material, and wherein the first high refractive index (RI) material and the second high refractive index (RI) material are different.

21 . The diffraction grating based morphology according to claim 20 , wherein the first high refractive index (RI) material comprises tantalum pentoxide (Ta 2 O 5 ).

22 . The diffraction grating based morphology according to claim 20 , wherein the second high refractive index (RI) material comprises hafnium dioxide (HfO 2 ).

23 . The diffraction grating based morphology according to claim 1 , wherein the substrate comprises silicon (Si).