Methods for measurement of rAIM
An overlay metrology system may receive an image of an overlay target on a sample in accordance with a metrology recipe, wherein the image is generated by illuminating via oblique illumination an overlay target comprising a plurality of Moiré structures with one or more pairs of illumination beams, wherein portions of the image associated with one or more Moiré structures of the plurality of Moiré structures having periodicity along a measurement direction are formed via Moiré diffraction orders from one of the one or more pairs of the illumination beams having a dipole separation axis orthogonal to the measurement direction, wherein the plurality of Moiré structures include Moiré structures comprising two or more gratings with overlapping regions. The overlay metrology system may determine overlay measurements associated with relative positions of sample layers based on the image of the overlay target.
1 . An overlay metrology system comprising:
one or more controllers comprising one or more processors configured to execute program instructions configured to:
receive an image of an overlay target on a sample in accordance with a metrology recipe, wherein the overlay target includes one or more Moiré structures having directions of periodicity along one or more measurement directions, wherein the image is generated by illuminating the overlay target with oblique illumination having one or more oblique illumination beams, wherein a particular Moiré structure of the one or more Moiré structures comprises overlapping gratings with different pitches along a particular measurement direction, wherein a portion of the image associated with the particular Moiré structure is formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence direction orthogonal to the particular measurement direction; and
determine overlay measurements associated with relative positions of sample layers along the one or more measurement directions based on the image of the overlay target.
2 . The overlay metrology system of claim 1 , wherein the one or more Moiré structures comprises a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample, wherein the first grating and the second grating have different pitches and have common directions of periodicity.
3 . The overlay metrology system of claim 1 , wherein the one or more Moiré structures comprises:
a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample, wherein the first grating and the second grating have different pitches and have common directions of periodicity; and
a second Moiré structure comprising:
a third grating with the second pitch on the first layer of the sample; and
a fourth grating with the first pitch of the second layer of the sample, wherein the third grating and the fourth grating are formed in a second overlapping region of the sample and have common directions of periodicity.
4 . The overlay metrology system of claim 1 , wherein the one or more Moiré structures comprises:
a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample, wherein the first grating and the second grating have different pitches and have common directions of periodicity; and
a second Moiré structure comprising:
a third grating with a third pitch on the first layer of the sample; and
a fourth grating with a fourth pitch of the second layer of the sample, wherein the third grating, the fourth grating, and at least one of the first grating or the second grating all have different pitches, wherein the third grating and the fourth grating are formed in a second overlapping region of the sample and have common directions of periodicity.
5 . The overlay metrology system of claim 1 , wherein the one or more oblique illumination beams are in a dipole distribution.
6 . The overlay metrology system of claim 1 , wherein the one or more oblique illumination beams are in a quadrupole distribution.
7 . The overlay metrology system of claim 1 , further comprising an optical element configured to split illumination into different channels based upon a position of the illumination in a collection pupil.
8 . The overlay metrology system of claim 1 , wherein the image formed by one or more illumination beams is generated exclusively with first Moiré diffraction orders and a zero-diffraction order.
9 . The overlay metrology system of claim 1 , wherein polar incidence angles of the one or more oblique illumination beams are adjustable.
10 . The overlay metrology system of claim 1 , wherein the overlay target comprises:
a robust advanced imaging metrology (rAIM) target.
11 . The overlay metrology system of claim 1 , wherein at least two of the one or more oblique illumination beams have different wavelengths.
12 . The overlay metrology system of claim 11 , further comprising a collection sub-system configured to separately collect illumination of different wavelengths of each illumination beam of two of the one or more oblique illumination beams.
13 . The overlay metrology system of claim 1 , wherein the one or more Moiré structures comprises:
one or more first Moiré structures having directions of periodicity along a first measurement direction of the one or more measurement directions, wherein portions of the image associated with the one or more first Moiré structures are formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence angle orthogonal to the first measurement direction; and
one or more second Moiré structures having directions of periodicity along a second measurement direction of the one or more measurement directions, wherein portions of the image associated with the one or more second Moiré structures are formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence direction orthogonal to the second measurement direction.
14 . The overlay metrology system of claim 13 , wherein the one or more oblique illumination beams comprise two oblique illumination beams in a quadrupole distribution having the azimuth incidence angle orthogonal to the first measurement direction and two oblique illumination beams having the azimuth incidence angle orthogonal to the second measurement direction.
15 . The overlay metrology system of claim 13 , further comprising an analyzer configured to polarize illumination from one of the one or more oblique illumination beams.
16 . An overlay metrology system comprising:
an illumination sub-system including one or more lenses configured to illuminate via oblique illumination an overlay target on a sample in accordance with a metrology recipe, wherein the overlay target includes one or more Moiré structures having directions of periodicity along one or more measurement directions, wherein an image is generated by illuminating the overlay target one or more oblique illumination beams, wherein a particular Moiré structure of the one or more Moiré structures comprises overlapping gratings with different pitches along a particular measurement direction, wherein a portion of the image associated with the particular Moiré structure is formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence direction orthogonal to the particular measurement direction;
a collection sub-system including at least an objective lens configured to collect at least one Moiré diffraction order associated with diffraction of the one or more Moiré structures by the one or more oblique illumination beams;
a detector configured to generate an image of the overlay target using illumination collected by the collection sub-system; and
a controller communicatively coupled to the collection sub-system, the controller including one or more processors configured to execute program instructions causing the one or more processors to:
receive the image of the overlay target; and
determine overlay measurements associated with relative positions of sample layers along the one or more measurement directions based on the image of the overlay target.
17 . The overlay metrology system of claim 16 , wherein the one or more Moiré structures comprises a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample, wherein the first grating and the second grating have different pitches and have common directions of periodicity.
18 . The overlay metrology system of claim 16 , wherein the one or more Moiré structures comprises:
a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample, wherein the first grating and the second grating have different pitches and have common directions of periodicity; and
a second Moiré structure comprising:
a third grating with the second pitch on the first layer of the sample; and
a fourth grating with the first pitch of the second layer of the sample, wherein the third grating and the fourth grating are formed in a second overlapping region of the sample and have common directions of periodicity.
19 . The overlay metrology system of claim 16 , wherein the one or more Moiré structures comprises:
a first Moiré structure comprising:
a first grating with a first pitch on a first layer of the sample; and
a second grating with a second pitch on a second layer of the sample, wherein the first grating and the second grating are formed in a first overlapping region of the sample, wherein the first grating and the second grating have different pitches and have common directions of periodicity; and
a second Moiré structure comprising:
a third grating with a third pitch on the first layer of the sample; and
a fourth grating with a fourth pitch of the second layer of the sample, wherein the third grating, the fourth grating, and at least one of the first grating or the second grating all have different pitches, wherein the third grating and the fourth grating are formed in a second overlapping region of the sample and have common directions of periodicity.
20 . The overlay metrology system of claim 16 , wherein the one or more oblique illumination beams are in a dipole distribution.
21 . The overlay metrology system of claim 16 , wherein the one or more oblique illumination beams are in a quadrupole distribution.
22 . The overlay metrology system of claim 16 , wherein the collection sub-system comprises collection sub-system optics configured to split illumination into different channels based upon a position of the illumination in a collection pupil.
23 . The overlay metrology system of claim 16 , wherein the image formed by one or more illumination beams is generated exclusively with first Moiré diffraction orders and a zero-diffraction order.
24 . The overlay metrology system of claim 16 , wherein polar incidence angles of the one or more oblique illumination beams are adjustable.
25 . The overlay metrology system of claim 16 , wherein the overlay target comprises:
a robust advanced imaging metrology (rAIM) target.
26 . The overlay metrology system of claim 16 , wherein at least two of the one or more oblique illumination beams have different wavelengths.
27 . The overlay metrology system of claim 26 , wherein the collection sub-system is configured to separately collect illumination of different wavelengths of each illumination beam of two of the one or more oblique illumination beams.
28 . The overlay metrology system of claim 16 , wherein the one or more Moiré structures comprises:
one or more first Moiré structures having directions of periodicity along a first measurement direction of the one or more measurement directions, wherein portions of the image associated with the one or more first Moiré structures are formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence angle orthogonal to the first measurement direction; and
one or more second Moiré structures having directions of periodicity along a second measurement direction of the one or more measurement directions, wherein portions of the image associated with the one or more second Moiré structures are formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence direction orthogonal to the second measurement direction.
29 . The overlay metrology system of claim 28 , wherein the one or more oblique illumination beams comprise two oblique illumination beams in a quadrupole distribution having the azimuth incidence angle orthogonal to the first measurement direction and two oblique illumination beams having the azimuth incidence angle orthogonal to the second measurement direction.
30 . The overlay metrology system of claim 28 , wherein the collection sub-system comprises an analyzer configured to polarize illumination from one of the one or more oblique illumination beams.
31 . A metrology method comprising:
receiving an image of an overlay target on a sample in accordance with a metrology recipe, wherein the overlay target includes one or more Moiré structures having directions of periodicity along one or more measurement directions, wherein the image is generated by illuminating the overlay target with oblique illumination having one or more oblique illumination beams, wherein a particular Moiré structure of the one or more Moiré structures comprises overlapping gratings with different pitches along a particular measurement direction, wherein a portion of the image associated with the particular Moiré structure is formed via Moiré diffraction orders from at least one of the one or more oblique illumination beams having an azimuth incidence direction orthogonal to the particular measurement direction; and
determining overlay measurements associated with relative positions of sample layers along the one or more measurement directions based on the image of the overlay target.