Fluid delivery system
Systems for processing articles are essential for semiconductor fabrication. In one embodiment, a system is disclosed comprising a plurality of fluid supplies configured to supply process fluids, a plurality of apparatuses for controlling flow, a plurality of mounting substrates, a vacuum manifold fluidly coupled to the plurality of mounting substrates, an outlet manifold fluidly coupled to the plurality of mounting substrates, a vacuum source fluidly coupled to the vacuum manifold, and a processing chamber fluidly coupled to the outlet manifold. The plurality of apparatuses for controlling flow have a bleed port and an outlet. The outlets of the plurality of apparatuses are fluidly coupled to corresponding outlet ports of the plurality of mounting substrates. The bleed ports of the plurality of apparatuses are fluidly coupled to the corresponding vacuum ports of the plurality of mounting substrates.
1 . An apparatus for controlling flow of a process fluid, the apparatus comprising:
an inlet;
an outlet;
a bleed port;
a flow path extending from the inlet to the outlet;
a bleed path extending from the flow path, the bleed path comprising the bleed port;
a first valve operably coupled to the flow path and located between the inlet and the outlet, the first valve configured to control flow of the process fluid in the flow path;
a flow restrictor having a flow impedance, the flow restrictor operably coupled to the flow path and located between the inlet and the outlet;
a second valve operably coupled to the flow path and located between the inlet and the outlet, the second valve configured to control flow of the process fluid from the flow path to the bleed port, wherein the second valve comprises:
a valve seat; and
a closure element configured to sealingly engage the valve seat, wherein the valve seat is positioned in the bleed path and not the flow path; and
a mounting portion, the mounting portion comprising the outlet and the bleed port.
2 . The apparatus of claim 1 , wherein the mounting portion comprises a sealing surface and a plurality of mounting holes.
3 . The apparatus of claim 1 , wherein the mounting portion comprises a planar surface.
4 . The apparatus of claim 1 , wherein the mounting portion comprises:
a first portion, wherein the inlet is defined in the first portion; and
a second portion, wherein the outlet and the bleed port are defined in the second portion, and wherein the first portion and the second portion are separated by a gap.
5 . The apparatus of claim 1 , wherein the flow path comprises:
a first angled segment extending intermediate the inlet and the first valve; and
a second angled segment extending intermediate the first valve and the second valve.
6 . The apparatus of claim 5 , wherein the flow path comprises a third angled segment extending intermediate the second valve and the outlet.
7 . An apparatus for controlling flow of a process fluid, the apparatus comprising:
an inlet;
an outlet;
a flow path extending from the inlet to the outlet;
a bleed path extending from the flow path to a bleed port;
a first valve configured to control flow of the process fluid in the flow path;
a flow restrictor having a flow impedance, the flow restrictor being positioned in the flow path between the inlet and the outlet;
a second valve configured to control flow of the process fluid from the flow path to the bleed port, wherein the second valve comprises:
a valve seat; and
a closure element configured to sealingly engage the valve seat, wherein the valve seat is positioned in the bleed path and is offset from the flow path; and
a mounting portion comprising the outlet and the bleed port.