IP Library › Granted Patent US 12712161
Granted Patent B2
US 12712161 · App. 18/158,379 · Granted Aug 18, 2026

Bipolar electrostatic chuck electrode designs

Inventors: Jian Li (Fremont, CA); Kallol Bera (Fremont, CA); Edward P. Hammond (Hillsborough, CA); Dmitry A. Dzilno (Sunnyvale, CA); Juan Carlos Rocha-Alvarez (San Carlos, CA); Xiaopu Li (San Jose, CA)
Assignee: Applied Materials, Inc.
H01J37/32724C23C16/4586H01J37/32082H01J37/32541H01J37/32568H01J37/32577H10P72/722H01J2237/2007H01J2237/332
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Quick Facts
Patent No.
US 12712161
App. No.
18/158,379
Granted
Aug 18, 2026
Kind
B2
Abstract

Exemplary substrate support assemblies may include an electrostatic chuck body defining a substrate support surface that defines a substrate seat. The assemblies may include a support stem coupled with the electrostatic chuck body. The assemblies may include a first bipolar electrode embedded within the electrostatic chuck body. The assemblies may include a second bipolar electrode embedded within the electrostatic chuck body. An entirety of the second bipolar electrode may be radially inward of at least a portion of the first bipolar electrode. The first bipolar electrode and the second bipolar electrode may be coaxial with one another. Each of the first bipolar electrode and the second bipolar electrode may be coupled with at least one RF power supply. Each of the first bipolar electrode and the second bipolar electrode may be coupled with at least one DC power supply.

Claims (47)

1 . A substrate support assembly, comprising:

an electrostatic chuck body defining a substrate support surface that defines a substrate seat;

a support stem coupled with the electrostatic chuck body;

a first bipolar electrode embedded within the electrostatic chuck body;

a second bipolar electrode embedded within the electrostatic chuck body, wherein:

an entirety of the second bipolar electrode is radially inward of at least a portion of the first bipolar electrode;

the first bipolar electrode and the second bipolar electrode are coaxial with one another;

each of the first bipolar electrode and the second bipolar electrode is coupled with at least one RF power supply;

each of the first bipolar electrode and the second bipolar electrode is coupled with at least one DC power supply; and

the first bipolar electrode and the second bipolar electrode have substantially the same area; and

an annular electrode disposed about the first bipolar electrode, wherein the annular electrode is DC floated and RF powered.

2 . The substrate support assembly of claim 1 , further comprising:

a spoked connector disposed within the electrostatic chuck body, the spoked connector coupling the annular electrode with an RF power supply.

3 . The substrate support assembly of claim 2 , wherein:

individual spokes of the spoked connector have a width of at least 5 mm.

4 . The substrate support assembly of claim 1 , wherein:

the first electrode comprises a generally annular shape; and

the second electrode comprises a generally circular shape.

5 . The substrate support assembly of claim 4 , wherein:

the annular electrode is coaxial with the first bipolar electrode.

6 . The substrate support assembly of claim 1 , wherein:

the second electrode comprises a first portion and a second portion that are coupled with one another and separated by a gap; and

a portion of first electrode extends into the gap formed between the first portion and the second portion.

7 . A substrate support assembly, comprising:

an electrostatic chuck body defining a substrate support surface that defines a substrate seat;

a support stem coupled with the electrostatic chuck body;

a first bipolar electrode embedded within the electrostatic chuck body;

a second bipolar electrode embedded within the electrostatic chuck body, wherein:

the second electrode comprises a first portion and a second portion that are coupled with one another and separated by a gap;

a portion of first electrode extends into the gap formed between the first portion and the second portion;

each of the first bipolar electrode and the second bipolar electrode is coupled with at least one RF power supply; and

each of the first bipolar electrode and the second bipolar electrode is coupled with at least one DC power supply, and

wherein the first bipolar electrode and the second bipolar electrode have substantially the same area.

8 . The substrate support assembly of claim 7 , wherein:

an entirety of the second bipolar electrode is radially inward of at least a portion of the first bipolar electrode.

9 . The substrate support assembly of claim 7 , further comprising:

an annular electrode disposed about the first bipolar electrode and the second bipolar electrode, wherein the annular electrode is DC floated and RF powered.

10 . The substrate support assembly of claim 7 , wherein:

the first bipolar electrode comprises a first outer portion and a first inner portion that are coupled via a first neck;

the second bipolar electrode comprises a second outer portion and a second inner portion that are coupled via a second neck; and

the second outer portion is interdigitated between the first outer portion and the first inner portion.

11 . The substrate support assembly of claim 10 , wherein:

a thickness of each of the first neck and the second neck is at least 1.5× a width a smaller of the first inner portion and the first outer portion.

12 . The substrate support assembly of claim 7 , wherein:

each of the first bipolar electrode and the second bipolar electrode comprises a spiral shape.

13 . The substrate support assembly of claim 12 , wherein:

a width of each segment of the spiral shape is at least 20 mm.