Apparatus for and method of reducing contamination from source material in an EUV light source

Inventors: Yue Ma (Escondido, CA); Dzmitry Labetski (Eindhoven, NL); Andrew David LaForge (Poway, CA)

Assignee: ASML Netherlands B.V.

H05G2/0094 G03F7/70033 G03F7/70858

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Quick Facts

Patent No.: US 12713511
App. No.: 18/528,933
Granted: Aug 18, 2026
Kind: B2

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Abstract

Disclosed is a source for and method of generating extreme ultraviolet radiation in which spitting of molten target material is hindered through depletion of the number of hydrogen radicals available to enter deposits of molten target material and create hydrogen bubbles therein by introducing an active gas that reacts with the hydrogen radicals.

Claims (32)

1 . Apparatus for generating EUV radiation, the apparatus comprising:

a vessel;

a collector mirror positioned within the vessel, wherein the collector mirror has a first focal point and a second focal point, the first focal point being located between the collector mirror and the second focal point;

an exhaust port positioned in a side wall of the vessel to remove an oxygen gas from the vessel prior to the oxygen gas reaching the first focal point; and

at least one inlet adapted to be placed in fluid communication with a source of the oxygen gas and positioned in the side wall in a region between the exhaust port and the second focal point.

2 . Apparatus as claimed in claim 1 wherein the oxygen gas comprises molecular oxygen.

3 . Apparatus as claimed in claim 1 wherein the oxygen gas comprises oxygen radicals.

4 . Apparatus as claimed in claim 1 wherein the source of oxygen gas further comprises a source of methane.

5 . Apparatus as claimed in claim 1 wherein the source of oxygen gas further comprises a source of one or more of CO, CO 2 , a halogen, acetone vapor, H 2 S, NO 2 , N 2 , NH 3 , H 2 O, hydrazine, and NF 3 .

6 . Apparatus as claimed in claim 1 wherein the source of oxygen gas further comprises a source of radicals of one or more of CO, CO 2 , a halogen, acetone vapor, H 2 S, NO 2 , N 2 , NH 3 , H 2 O, hydrazine, and NF 3 .

7 . Apparatus as claimed in claim 1 wherein a partial pressure of the oxygen gas is in a range of about 10E-4 mbar to about 10E-2 mbar.

8 . Apparatus for generating EUV radiation, the apparatus comprising:

a vessel;

a collector mirror positioned within the vessel, the collector mirror having a primary focus;

at least one exhaust port positioned in a side wall of the vessel to remove an oxygen gas from the vessel prior to the oxygen gas reaching the primary focus; and

at least one inlet adapted to be placed in fluid communication with a source of the oxygen gas and positioned in the side wall closer to the at least one exhaust port than to the primary focus.

9 . Apparatus as claimed in claim 8 wherein the oxygen gas comprises molecular oxygen.

10 . Apparatus as claimed in claim 8 wherein the oxygen gas comprises oxygen radicals.

11 . Apparatus as claimed in claim 8 wherein the source of oxygen gas further comprises a source of methane.

12 . Apparatus as claimed in claim 8 wherein the source of oxygen gas further comprises a source of one or more of CO, CO 2 , a halogen, acetone vapor, H 2 S, NO 2 , N 2 , NH 3 , H 2 O, hydrazine, and NF 3 .

13 . Apparatus as claimed in claim 8 wherein the source of oxygen gas further comprises a source of radicals of one or more of CO, CO 2 , a halogen, acetone vapor, H 2 S, NO 2 , N 2 , NH 3 , H 2 O, hydrazine, and NF 3 .

14 . Apparatus as claimed in claim 8 wherein a partial pressure of the oxygen gas is in a range of about 10E-4 mbar to about 10E-2 mbar.

15 . Apparatus for generating EUV radiation, the apparatus comprising:

a vessel;

a collector mirror positioned within the vessel, wherein the collector mirror has a first focal point within the vessel where target material may be irradiated to produce plasma and a second focal point, the first focal point being located between the collector mirror and the second focal point;

an exhaust port positioned in a side wall of the vessel; and

at least one inlet adapted to be placed in fluid communication with a source of oxygen gas and positioned in the side wall in a region between the exhaust port and the second focal point.

16 . Apparatus as claimed in claim 15 wherein the oxygen gas comprises molecular oxygen.

17 . Apparatus as claimed in claim 15 wherein the oxygen gas comprises oxygen radicals.

18 . Apparatus as claimed in claim 15 wherein the source of oxygen gas further comprises a source of methane.

19 . Apparatus as claimed in claim 15 wherein the source of oxygen gas further comprises a source of one or more of CO, CO 2 , a halogen, acetone vapor, H 2 S, NO 2 , N 2 , NH 3 , H 2 O, hydrazine, and NF 3 .

20 . Apparatus as claimed in claim 15 wherein the source of oxygen gas further comprises a source of radicals of one or more of CO, CO 2 , a halogen, acetone vapor, H 2 S, NO 2 , N 2 , NH 3 , H 2 O, hydrazine, and NF 3 .