IP Library Granted Patent US 12713627
Granted Patent B2
US 12713627 · App. 17/878,758 · Granted Aug 18, 2026

Package with a substrate comprising embedded stacked trench capacitor devices

Inventors: Ryan Lane (San Diego, CA); Charles David Paynter (Encinitas, CA); Durodami Lisk (San Diego, CA); Darko Popovic (San Diego, CA); Yue Li (San Diego, CA); Shree Krishna Pandey (San Diego, CA)
Assignee: QUALCOMM Incorporated
H10D1/042H10D1/716H10W20/496H10W70/685H10W90/724
View Patent ↗
Loading inventors, assignments & file history…
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this patent's details
Quick Facts
Patent No.
US 12713627
App. No.
17/878,758
Granted
Aug 18, 2026
Kind
B2
Abstract

A package comprising a substrate and an integrated device. The substrate includes a core layer comprising a first surface and a second surface; a plurality of core interconnects located in the core layer; at least one first dielectric layer coupled to the first surface of the core layer; a first plurality of interconnects located in the at least one first dielectric layer; at least one second dielectric layer coupled to the second surface of the core layer; a second plurality of interconnects located in the at least one second dielectric layer; and a capacitor structure located in the core layer. The capacitor structure includes a first trench capacitor device comprising a first front side and a first back side; and a second trench capacitor device coupled to the first trench capacitor device, where the second trench capacitor device comprises a second front side and a second back side.

Claims (96)

1 . A package comprising:

a substrate comprising:

a core layer comprising a first surface and a second surface;

a plurality of core interconnects located in the core layer;

at least one first dielectric layer coupled to the first surface of the core layer;

a first plurality of interconnects located in the at least one first dielectric layer;

at least one second dielectric layer coupled to the second surface of the core layer;

a second plurality of interconnects located in the at least one second dielectric layer; and

a capacitor structure located in the core layer, wherein the capacitor structure comprises:

a first trench capacitor device comprising a first front side and a first back side; and

a second trench capacitor device coupled to the first trench capacitor device,

wherein the second trench capacitor device comprises a second front side and a second back side,

wherein the second trench capacitor device is coupled to the first trench capacitor device such that there is an electrical path that extends between the first trench capacitor device and the second trench capacitor device;

a third dielectric layer at least partially surrounding the capacitor structure within a cavity of the core layer; and

an integrated device coupled to the substrate.

2 . The package of claim 1 ,

wherein the second trench capacitor device is located over the first trench capacitor device,

wherein the first trench capacitor device includes a first plurality of trench capacitors,

wherein the first front side of the first trench capacitor device is a side of the first trench capacitor device that includes the first plurality of trench capacitors,

wherein the second trench capacitor device includes a second plurality of trench capacitors, and

wherein the second front side of the second trench capacitor device is a side of the second trench capacitor device that includes the second plurality of trench capacitors.

3 . The package of claim 2 , wherein the first back side of the first trench capacitor device is coupled to the second back side of the second trench capacitor device.

4 . The package of claim 2 , wherein the first back side of the first trench capacitor device is coupled to the second front side of the second trench capacitor device.

5 . The package of claim 1 ,

wherein the second trench capacitor device is coupled to the first trench capacitor device through a plurality of solder interconnects, and

wherein the electrical path within the capacitor structure between the first trench capacitor device and the second trench capacitor device includes the plurality of solder interconnects.

6 . The package of claim 1 , wherein the second trench capacitor device is coupled to the first trench capacitor device through copper to copper bonding.

7 . The package of claim 1 ,

wherein the plurality of core interconnects includes a first core interconnect between the capacitor structure and the first surface of the core layer, and

wherein the first core interconnect is coupled to the capacitor structure and the first plurality of interconnects.

8 . The package of claim 7 ,

wherein the plurality of core interconnects further includes a second core interconnect between the capacitor structure and the second surface of the core layer, and

wherein the second core interconnect is coupled to the capacitor structure and the first plurality of interconnects.

9 . The package of claim 1 ,

wherein the plurality of core interconnects includes a core interconnect between the capacitor structure and the second surface of the core layer, and

wherein the core interconnect is coupled to the capacitor structure and the second plurality of interconnects.

10 . The package of claim 1 , wherein the integrated device is configured to be electrically coupled to the capacitor structure in the core layer.

11 . The package of claim 1 , wherein the capacitor structure includes 3 or more vertically stacked trench capacitors devices.

12 . The package of claim 1 , wherein the capacitor structure is configured to operate as a decoupling capacitor and a power management integrated circuit (PMIC) output capacitor.

13 . The package of claim 1 , further comprising another capacitor structure coupled to a first surface of the substrate or a second surface of the substrate.

14 . A device comprising:

a package comprising:

a substrate comprising:

a core layer comprising a first surface and a second surface;

a plurality of core interconnects located in the core layer;

at least one first dielectric layer coupled to the first surface of the core layer;

a first plurality of interconnects located in the at least one first dielectric layer;

at least one second dielectric layer coupled to the second surface of the core layer;

a second plurality of interconnects located in the at least one second dielectric layer; and

means for stacked trench capacitance located in the core layer, wherein the means for stacked trench capacitance comprises:

means for first trench capacitance; and

means for second trench capacitance coupled to the means for first trench capacitance, wherein the means for second trench capacitance is coupled to the means for first trench capacitance such that there is an electrical path within the means for stacked trench capacitance that is between the means for first trench capacitance and the means for second trench capacitance;

a third dielectric layer at least partially surrounding the means for stacked trench capacitance within a cavity of the core layer; and

an integrated device coupled to the substrate.

15 . The device of claim 14 ,

wherein the means for first trench capacitance comprises a first plurality of trench capacitors,

wherein a first front side of the means for first trench capacitance is a side of the first means for first trench capacitance that includes the first plurality of trench capacitors,

wherein the means for second trench capacitance comprises a first plurality of trench capacitors, and

wherein a second front side of the means for second trench capacitance is a side of the first means for first trench capacitance that includes the second plurality of trench capacitors.

16 . The device of claim 15 , wherein a first back side of the means for first trench capacitance is coupled to a second back side of the means for second trench capacitance.

17 . The device of claim 15 , wherein a first back side of the means for first trench capacitance is coupled to the second front side of the second trench capacitance.

18 . The device of claim 15 ,

wherein the means for second trench capacitance is coupled to the means for first trench capacitance through a plurality of solder interconnects,

wherein the electrical path within the means for stacked trench capacitance that is between the means for first trench capacitance and the means for second trench capacitance includes the plurality of solder interconnects.

19 . The device of claim 15 , wherein the means for second trench capacitance is coupled to the means for first trench capacitance through copper to copper bonding.

20 . The device of claim 14 ,

wherein the plurality of core interconnects includes a first core interconnect that is located between the means for capacitance means for stacked trench capacitance and the first surface of the core layer, and

wherein the first core interconnect is coupled to the means for stacked trench capacitance and the first plurality of interconnects.

21 . The device of claim 20 ,

wherein the plurality of core interconnects further includes a second core interconnect that is located between the means for stacked trench capacitance and the second surface of the core layer, and

wherein the second core interconnect is coupled to the means for stacked trench capacitance and the second plurality of interconnects.

22 . The device of claim 14 , wherein the device is selected from a group consisting of a music player, a video player, an entertainment unit, a navigation device, a communications device, a mobile device, a mobile phone, a smartphone, a personal digital assistant, a fixed location terminal, a tablet computer, a computer, a wearable device, a laptop computer, a server, an internet of things (IoT) device, and a device in an automotive vehicle.

23 . A method for fabricating a substrate, comprising:

providing a capacitor structure comprising:

a first trench capacitor device comprising a first front side and a first back side; and

a second trench capacitor device coupled to the first trench capacitor device,

wherein the second trench capacitor device comprises a second front side and a second back side, and

wherein the second trench capacitor device is coupled to the first trench capacitor device such that there is an electrical path that extends between the first trench capacitor device and the second trench capacitor device;

forming a core layer and a cavity within the core layer, such that the capacitor structure is located in the core layer and in the cavity, where the core layer comprising a first surface and a second surface;

forming a third dielectric layer at least partially surrounding the capacitor structure within the cavity;

forming a plurality of core interconnects in the core layer;

forming at least one first dielectric layer coupled to the first surface of the core layer;

forming at least one second dielectric layer coupled to the second surface of the core layer;

forming a first plurality of interconnects in the at least one first dielectric layer; and

forming a second plurality of interconnects in the at least one second dielectric layer.

24 . The method of claim 23 , wherein the second trench capacitor device is located over the first trench capacitor device.

25 . The method of claim 23 , wherein the first back side of the first trench capacitor device is coupled to the second back side of the second trench capacitor device.

26 . The method of claim 23 , wherein the first back side of the first trench capacitor device is coupled to the second front side of the second trench capacitor device.

27 . The method of claim 23 , wherein the second trench capacitor device is coupled to the first trench capacitor device through a plurality of solder interconnects.

28 . The method of claim 23 , wherein the second trench capacitor device is coupled to the first trench capacitor device through copper to copper bonding.

29 . The method of claim 23 ,

wherein the plurality of core interconnects includes a first core interconnect that is located between the capacitor structure and the first surface of the core layer, and

wherein the first core interconnect is coupled to the capacitor structure and the first plurality of interconnects.

30 . The method of claim 29 ,

wherein the plurality of core interconnects further includes a second core interconnect that is located between the capacitor structure and the second surface of the core layer, and

wherein the second core interconnect is coupled to the capacitor structure and the second plurality of interconnects.