Polydimethylsiloxane antireflective layer for an image sensor
An image sensor may include a polydimethylsiloxane (PDMS) layer that is subwavelength, hydrophobic, and/or antireflective. The PDMS layer may be fabricated to include a surface having a plurality of nanostructures (e.g., an array of convex protuberances and/or an array of concave recesses). The nanostructures may be formed through the use of a porous anodic aluminum oxide (AAO) template that uses a plurality of nanopores to form the array of convex protuberances and/or the array of concave recesses. The nanostructures may each have a respective width that is less than the wavelength of incident light that is to be collected by the image sensor to increase light absorption by increasing the angle of incidence for which the image sensor is capable of collecting incident light. This may increase the quantum efficiency of the image sensor and may increase the sensitivity of the image sensor.
1 . A pixel array, comprising:
a pixel sensor;
a polydimethylsiloxane (PDMS) layer above the pixel sensor; and
a planarization layer that is formed either above the PDMS layer or below the PDMS layer.
2 . The pixel array of claim 1 , wherein the planarization layer is above the PDMS layer.
3 . The pixel array of claim 2 , further comprising:
a color filter layer above the planarization layer.
4 . The pixel array of claim 1 , wherein the planarization layer is below the PDMS layer.
5 . The pixel array of claim 4 , further comprising:
a color filter layer below the planarization layer.
6 . The pixel array of claim 1 , wherein the PDMS layer comprises one or more structures.
7 . The pixel array of claim 1 , wherein the PDMS layer is planar, flat, or smooth.
8 . A pixel array, comprising:
a pixel sensor;
a plurality of planarization layers above the pixel sensor; and
a polydimethylsiloxane (PDMS) layer above the pixel sensor,
wherein the PDMS layer is formed either:
directly on the pixel sensor and below the plurality of planarization layers, or
the plurality of planarization layers.
9 . The pixel array of claim 8 , wherein the PDMS layer is directly on the pixel sensor and below the plurality of planarization layers.
10 . The pixel array of claim 9 , further comprising:
a color filter array between the plurality of planarization layers.
11 . The pixel array of claim 8 , wherein the PDMS layer is between the plurality of planarization layers.
12 . The pixel array of claim 11 , further comprising:
a color filter array above the pixel sensor and below the plurality of planarization layers.
13 . The pixel array of claim 8 , wherein the PDMS layer comprises one or more structures.
14 . The pixel array of claim 8 , wherein the PDMS layer is at least one of planar, flat, or smooth.
15 . A method, comprising:
depositing a polydimethylsiloxane (PDMS) layer above a pixel array; and
depositing a first planarization layer above the PDMS layer.
16 . The method of claim 15 , wherein the PDMS layer is deposited directly on the pixel array.
17 . The method of claim 16 , further comprising:
depositing a color filter region above the first planarization layer.
18 . The method of claim 17 , further comprising:
depositing a second planarization layer above the color filter region.
19 . The method of claim 15 , further comprising:
depositing a second planarization layer above the pixel array,
wherein the PDMS layer is deposited above the second planarization layer.
20 . The method of claim 19 , further comprising:
depositing a color filter region above the pixel array,
wherein the second planarization layer is deposited above the color filter region.