IP Library Granted Patent US 12713983
Granted Patent B2
US 12713983 · App. 18/173,690 · Granted Aug 18, 2026

Bonded structures

Inventors: Cyprian Emeka Uzoh (San Jose, CA); Rajesh Katkar (Milpitas, CA); Thomas Workman (San Jose, CA); Gaius Gillman Fountain, Jr. (Youngsville, NC); Guilian Gao (San Jose, CA); Jeremy Alfred Theil (Mountain View, CA); Gabriel Z. Guevara (San Jose, CA); Kyong-Mo Bang (Fremont, CA); Laura Wills Mirkarimi (Sunol, CA)
Assignee: Adeia Semiconductor Bonding Technologies Inc.
H10W90/00H10W20/20H10W70/65H10W72/01H10W74/00H10W74/10H10W80/312H10W80/327H10W80/701H10W90/20H10W90/792H10W90/794
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Quick Facts
Patent No.
US 12713983
App. No.
18/173,690
Granted
Aug 18, 2026
Kind
B2
Abstract

A bonded structure can include a carrier including a first conductive contact and a second conductive contact, a first singulated element including a third conductive contact directly bonded to the first conductive contact without an adhesive, and a second singulated element including a fourth conductive contact directly bonded to the second conductive contact without an adhesive, wherein the first and second conductive contacts are spaced apart by a contact spacing of no more than 250 microns.

Claims (30)

1 . A bonded structure comprising:

a carrier including a first conductive contact and a second conductive contact;

a first singulated element direct hybrid bonded to the carrier, the first singulated element including a third conductive contact directly bonded to the first conductive contact without an adhesive; and

a second singulated element direct hybrid bonded to the carrier, the second singulated element including a fourth conductive contact directly bonded to the second conductive contact without an adhesive,

wherein the first and second conductive contacts are spaced apart by a contact spacing of no more than 250 microns.

2 . The bonded structure of claim 1 , wherein the contact spacing is no more than 100 microns.

3 . The bonded structure of claim 1 , wherein the contact spacing is no more than 50 microns.

4 . The bonded structure of claim 1 , wherein the contact spacing is no more than 10 microns.

5 . The bonded structure of claim 1 , wherein the first and second singulated elements included respective nonconductive regions directly bonded to corresponding nonconductive region(s) of the carrier without an adhesive.

6 . A bonded structure comprising:

a carrier including a first conductive contact and a second conductive contact;

a first singulated element direct hybrid bonded to the carrier, the first singulated element including a third conductive contact directly bonded to the first conductive contact without an adhesive; and

a second singulated element direct hybrid bonded to the carrier, the second singulated element including a fourth conductive contact directly bonded to the second conductive contact without an adhesive,

wherein the first and second singulated elements are spaced apart by an element spacing of no more than 50 microns.

7 . The bonded structure of claim 6 , wherein the element spacing is no more than 20 microns.

8 . The bonded structure of claim 6 , wherein the element spacing is no more than 10 microns.

9 . The bonded structure of claim 6 , wherein the third conductive contact comprises an electrically active contact electrically connected to circuitry of the first singulated element.

10 . The bonded structure of claim 9 , wherein the third conductive contact is connected to a signal line, a power line, or electrical ground.

11 . The bonded structure of claim 6 , wherein at least one of the first and second singulated elements comprises an integrated device die having active circuitry.

12 . The bonded structure of claim 6 , further comprising a third element directly bonded to the second singulated element.

13 . The bonded structure of claim 12 , further comprising a conductive via through the second singulated element to connect to the third element.

14 . A bonded structure comprising:

a carrier;

a first element directly bonded to the carrier without an adhesive, the first element including a cutout region; and

a second singulated element directly bonded to the carrier without an adhesive, the second singulated element disposed at least partially laterally within the cutout region of the first element.

15 . The bonded structure of claim 14 , further comprising a third singulated element directly bonded to the carrier without an adhesive, the second singulated element disposed between the first element and the third singulated element.

16 . The bonded structure of claim 15 , further comprising a conductive via through the second singulated element to connect to the third element.

17 . The bonded structure of claim 16 , wherein the contact spacing is no more than a length of the conductive via.

18 . The bonded structure of claim 1 , wherein the first and second conductive contacts are dummy contacts.

19 . The bonded structure of claim 1 , wherein the first and second conductive contacts are connected to active circuitry.