Granted Patent
Utility
US 6,703,171 · App. 10/072,880
Photomask, the manufacturing method, a patterning method, and a semiconductor device manufacturing method
Inventors:
Takashi Hattori, Yasuko Gotoh, Hidetoshi Satoh, Toshihiko Tanaka, Hiroshi Shiraishi
Patented Case
View Patent ↗
Granted: Mar 9, 2004
Filed: Feb 12, 2002
Inventors
Takashi Hattori
Yasuko Gotoh
Hidetoshi Satoh
Toshihiko Tanaka
Hiroshi Shiraishi
Assignee (at issue)
HITACHI, LTD.
This patent predates the USPTO's electronic file wrapper — prosecution documents from this era exist only in the Patent Office's paper records. A certified copy of the file history can be ordered from the USPTO's paper archives.