IP Library Granted Patent US 7,583,539
Granted Patent B2
US 7,583,539 · App. 11/618,786 · Granted Sep 1, 2009

Non-volatile storage with bias for temperature compensation

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Quick Facts
Patent No.
US 7,583,539
App. No.
11/618,786
Filed
Dec 30, 2006
Granted
Sep 1, 2009
Kind
B2
Examiner
LAM, DAVID
Art Unit
2827
USPC
365/185.27
Abstract

A non-volatile storage system in which a body bias is applied to a non-volatile storage system to compensate for temperature-dependent variations in threshold voltage, sub-threshold slope, depletion layer width and/or 1/f noise. A desired bias level is set based on a temperature-dependent reference signal. In one approach, a level of the biasing can decrease as temperature increases. The body bias can be applied by applying a voltage to a p-well and n-well of a substrate, applying a voltage to the p-well while grounding the n-well, or grounding the body and applying a voltage to the source and/or drain of a set of non-volatile storage elements. Further, temperature-independent and/or temperature-dependent voltages can be applied to selected and unselected word lines in the non-volatile storage system during program, read or verify operations. The temperature-dependent voltages can vary based on different temperature coefficients.

Claims (36)

1. A non-volatile storage system, comprising:

a set of non-volatile storage elements formed, at least in part, on a substrate;

a set of word lines in communication with the set of non-volatile storage elements, at least one non-volatile storage element of the set of non-volatile storage elements is in communication with a selected word line of the set of word lines; and

one or more control circuits in communication with the set of non-volatile storage elements, the one or more control circuits provide temperature-dependent biasing of the substrate and during the biasing:

perform an operation on the at least one non-volatile storage element;

apply a temperature-independent voltage to at least one of a source side and a drain side of the set of non-volatile storage elements; and

apply a temperature-dependent read or verify voltage to a selected word line of one or more non-volatile storage elements undergoing read or verify operations;

wherein the temperature-dependent read or verify voltage varies with temperature according to a first temperature coefficient, and the temperature-dependent biasing of the substrate varies with temperature according to a second temperature coefficient which differs from the first temperature coefficient.

2. The non-volatile storage system of claim 1 , wherein:

the operation involves applying temperature-independent voltages to unselected word lines of the set of word lines during the biasing.

3. The non-volatile storage system of claim 1 , wherein:

a level of the biasing decreases as temperature increases.

4. The non-volatile storage system of claim 1 , wherein:

the biasing is set to vary with temperature to compensate at least one temperature-varying characteristic of non-volatile storage elements of the set of non-volatile storage elements.

5. The non-volatile storage system of claim 4 , wherein:

the at least one temperature-varying characteristic comprises threshold voltage.

6. The non-volatile storage system of claim 4 , wherein:

the at least one temperature-varying characteristic comprises a sub-threshold slope.

7. The non-volatile storage system of claim 4 , wherein:

the at least one temperature-varying characteristic comprises depletion layer width.

8. The non-volatile storage system of claim 4 , wherein:

the at least one temperature-varying characteristic comprises 1/f noise.

9. The non-volatile storage system of claim 1 , wherein:

the set of non-volatile storage elements are provided in at least one NAND string which is formed, at least in part, on the substrate.

10. The non-volatile storage system of claim 1 , wherein:

the biasing comprises applying a forward body bias.

11. The non-volatile storage system of claim 1 , wherein:

the biasing comprises applying a reverse body bias.

12. A non-volatile storage system, comprising:

a set of non-volatile storage elements formed, at least in part, on a substrate;

a set of word lines in communication with the set of non-volatile storage elements, at least one non-volatile storage element of the set of non-volatile storage elements is in communication with a selected word line of the set of word lines; and

one or more control circuits in communication with the set of non-volatile storage elements, the one or more control circuits provide temperature-dependent biasing of the substrate and during the biasing:

perform an operation on the at least one non-volatile storage element;

apply a temperature-independent voltage to at least one of a source side and a drain side of the set of non-volatile storage elements; and

apply temperature-dependent voltages to unselected word lines of the set of word lines;

wherein the temperature-dependent voltages applied to the unselected word lines vary with temperature according to a first temperature coefficient, and the temperature-dependent biasing of the substrate varies with temperature according to a second temperature coefficient which differs from the first temperature coefficient.