Semiconductor device and manufacturing method thereof

1. A semiconductor device, comprising:

a substrate including first and second surfaces;

a first insulating film including third and fourth surfaces, the fourth surface being in contact with the first surface; and

an electrode elongated to penetrate the substrate and the first insulating film, the electrode including a first portion and a second portion,

the first portion comprising first and second end parts and a center part sandwiched between the first and second end parts, the first and second end parts of the first portion being smaller in diameter than at least a portion of the center part of the first portion, and

the second portion being located between the first portion and the third surface, and including a third end part exposed from the third surface and a fourth end part connected to the first end part of the first portion, a diameter at an intermediate point between the third and fourth end parts being larger than a respective diameter of the first and fourth end parts.

2. The semiconductor device as claimed in claim 1 , wherein the third end part is larger in diameter than the fourth end part.

3. The semiconductor device as claimed in claim 1 , wherein the electrode further includes a third portion located between the first portion and the second surface,

wherein the third portion includes a fifth end part connected to the second end part and a sixth end part exposed from the second surface, and

wherein the sixth end part is larger in diameter than the second and fifth end parts.

4. The semiconductor device as claimed in claim 1 , further comprising:

a second insulating film including fifth and sixth surfaces, the fifth surface being in contact with the second surface; and

a first bump limited in the second insulating film and connected to the electrode.

5. The semiconductor device as claimed in claim 1 , further comprising:

a wiring layer formed on the third end part and connected to the electrode; and

a second bump formed on the wiring layer and electrically connected to the electrode.

6. The semiconductor device as claimed in claim 4 , further comprising:

a wiring layer formed on the third end part and connected to the electrode;

a second bump formed on the wiring layer and connected electrically to the electrode; and

a plurality of core chips each including the first and second bumps,

wherein at least one of the first bump of the core chips is coupled with one of the second bump of the core chips.

7. The semiconductor device as claimed in claim 1 , further comprising:

a plurality of core chips each including the substrate and the electrode; and

an interface chip that is electrically connected to the core chips through the electrode of each of the core chips.

8. A semiconductor device, comprising:

a substrate including first and second surfaces;

a first insulating film including third and fourth surfaces, the fourth surface being in contact with the first surface; and

an electrode elongated to penetrate the substrate and the first insulating film, the electrode including a first portion and a second portion,

the first portion comprising first and second end parts and a center part sandwiched between the first and second end parts, and the center part including a bowing shaped part,

the second portion being located between the first portion and the third surface, and including a third end part corresponding to the third surface, a fourth end part corresponding to the first end part of the first portion and an intermediate part corresponding to the first surface, the intermediate part being larger in diameter than the first and fourth end parts.

9. The semiconductor device as claimed in claim 8 , wherein the third end part is larger in diameter than the fourth end part.

10. The semiconductor device as claimed in claim 8 , wherein the electrode further includes a third portion located between the first portion and the second surface,

wherein the third portion includes a fifth end part connected to the second end part and a sixth end part exposed from the second surface, and

wherein the sixth end part is larger in diameter than the second and fifth end parts.

11. The semiconductor device as claimed in claim 8 , further comprising:

a second insulating film including fifth and sixth surfaces, the fifth surface being in contact with the second surface; and

a first bump formed in the second insulating film and connected to the electrode.

12. The semiconductor device as claimed in claim 8 , further comprising:

a wiring layer formed on the third end part and connected to the electrode; and

a second bump formed on the wiring layer and electrically connected to the electrode.

13. The semiconductor device as claimed in claim 8 , further comprising:

a plurality of core chips each including the substrate and the electrode; and

an interface chip that is electrically connected to the core chips through the electrode of each of the core chips.

14. A semiconductor device, comprising:

a first insulating film including first and second surfaces,

a substrate including third and fourth surfaces and a via hole, the third surface being in contact with the second surface, and the via hole being elongated to penetrate from the first surface to the fourth surface and including a bowing shaped part; and

an electrode provided in the via hole and including a first portion and a second portion,

the first portion comprising first and second end parts and a center part sandwiched between the first and second end parts, the center part being corresponding to the bowing shaped part of the via hole; and

the second portion being located between the first portion and the first surface, wherein the second portion includes a third end part exposed from the first surface, and a fourth end part connected to the first end part of the first portion, and an intermediate part exposed from the third surface, the third end part is larger in diameter than the first end parts and the intermediate part.

15. The semiconductor device as claimed in claim 14 , wherein the third end part is larger in diameter than the fourth end part.

16. The semiconductor device as claimed in claim 14 , wherein the electrode further includes a third portion located between the first portion and the second surface,

wherein the third portion includes a fifth end part connected to the second end part and a sixth end part exposed from the fourth surface, and

wherein the sixth end part is larger in diameter than the second and fifth end parts.

17. The semiconductor device as claimed in claim 14 , further comprising:

a second insulating film including fifth and sixth surfaces, the fifth surface being in contact with the fourth surface; and

a first bump formed in the second insulating film and connected to the electrode.

18. The semiconductor device as claimed in claim 14 , wherein the via hole penetrates the second insulating film.

19. The semiconductor device as claimed in claim 14 , further comprising:

a wiring layer formed on the third end part and connected to the electrode; and

a second bump formed on the wiring layer and connected electrically to the electrode.

20. The semiconductor device as claimed in claim 14 , further comprising:

a plurality of core chips each including the substrate and the electrode; and

an interface chip that is electrically connected to the core chips through the electrode of each of the core chips.