Ventilation systems for use with a plasma treatment system

1. A gas containment apparatus for use with an end effector including at least one plasma head, said gas containment apparatus comprising:

at least one enclosing structure coupled to the end effector, wherein said at least one enclosing structure comprises:

a collar configured to circumscribe the plasma head, wherein said collar defines a cavity configured to receive the at least one plasma head therein; and

a shroud coupled to said collar, said shroud configured to capture a gas produced by the at least one plasma head; and

a duct coupled to said at least one enclosing structure, said duct configured to channel the gas from within said enclosing structure.

2. The gas containment apparatus in accordance with claim 1 wherein said collar includes a first end defining a first diameter and a second end defining a second diameter smaller than the first diameter.

3. The gas containment apparatus in accordance with claim 1 wherein said duct is coupled to said shroud.

4. The gas containment apparatus in accordance with claim 1 further comprising a support structure coupled between said at least one enclosing structure and said duct.

5. The gas containment apparatus in accordance with claim 4 further comprising a mounting plate coupled between the end effector and at least one of said duct, said at least one enclosing structure, and said support structure.

6. The gas containment apparatus in accordance with claim 1 , wherein said at least one enclosing structure and said duct are integrally formed by additive manufacturing.

7. The gas containment apparatus in accordance with claim 1 , wherein said at least one enclosing structure comprises a plurality of enclosing structures.

8. The gas containment apparatus in accordance with claim 7 , wherein said duct comprises a common duct portion and a plurality of branches, wherein each said branch extends between said common duct portion and a respective enclosing structure.

9. A ventilation system for use with a plasma treatment system including an end effector having at least one plasma treatment head, said ventilation system comprising:

a gas containment apparatus coupled to the end effector, said gas containment apparatus comprising:

at least one enclosing structure positioned proximate the at least one plasma head, said at least one enclosing structure comprising:

a collar configured to circumscribe the plasma head, wherein said collar defines a cavity configured to receive the at least one plasma head therein; and

a shroud coupled to said collar, said shroud configured to capture a gas produced by the at least one plasma head; and

a duct coupled to said at least one enclosing structure, said duct configured to channel the gas from within said enclosing structure; and

a vacuum pump coupled in flow communication with said gas containment apparatus, said vacuum pump configured to extract the gas from the at least one enclosing structure through said duct.

10. The ventilation system in accordance with claim 9 further comprising a gas cleaning device coupled in flow communication between said vacuum pump and said gas containment apparatus, said gas cleaning device configured to process the gas from said enclosing structure.

11. The ventilation system in accordance with claim 10 further comprising a filter in flow communication between said gas cleaning device and said gas containment apparatus, said filter configured to remove particulate matter entrained in the gas.

12. The ventilation system in accordance with claim 9 further comprising a filter in flow communication between said vacuum pump and said gas containment apparatus, said filter configured to remove particulate matter entrained in the gas.

13. The ventilation system in accordance with claim 9 , wherein said duct is coupled to said shroud.

14. The ventilation system in accordance with claim 9 , wherein said at least one enclosing structure comprises a plurality of enclosing structures, and wherein said duct comprises a common duct portion and a plurality of branches, wherein each said branch extends between said common duct portion and a respective enclosing structure.

15. A method of ventilating a plasma treatment system including an end effector having at least one plasma treatment head, said method comprising:

coupling a gas containment apparatus to the end effector;

wherein coupling a gas containment apparatus comprises positioning at least one enclosing structure of the gas containment apparatus proximate the at least one plasma head such that a cavity defined by a collar of the at least one enclosing structure circumscribes the plasma head and is configured to receive the at least one plasma head therein, wherein the at least one enclosing structure captures a gas produced by the at least one plasma head; and

wherein coupling a gas containment apparatus comprises coupling a duct of the gas containment apparatus to the at least one enclosing structure; and

channeling the gas from within the enclosing structure through the duct using a vacuum pump.

16. The method of claim 15 , wherein positioning the at least one enclosing structure proximate the at least one plasma head comprises positioning a shroud of at least one enclosing structure, and coupled to the collar, about the at least one plasma head such that the shroud captures the gas produced by the at least one plasma head.

17. The method of claim 15 , further comprising:

channeling the gas through a filter to remove particulate matter from the gas; and

channeling the gas through a gas cleaning device to treat the gas.