Method for producing high-structure area texturing of a substrate, substrates prepared thereby and masks for use therein

A method is provided for preparing high-surface area texturing of a substrate using methods by which material from a substrate is subtracted from or added to the surface of the substrate. In one embodiment, the method is a subtractive lithographic method that involves exposing a laser-ablatable substrate, such as a polymeric or ceramic substrate, to laser light. A mask may be used to define the pattern of light incident on the substrate. High-surface area textured substrates, in particular, miniaturized planar analysis devices having high-surface area textured features, prepared by the methods disclosed herein are also provided. A method by which the high-surface area textured substrate or the miniaturized planar analysis device is used as a master from which replicate copies thereof may be made is also provided.