IP Library Granted Patent US 7,037,400
Granted Patent B1
US 7,037,400 · App. 09/600,837 · Granted May 2, 2006

Method for forming interconnections between channels and chambers

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Quick Facts
Patent No.
US 7,037,400
App. No.
09/600,837
Granted
May 2, 2006
Kind
B1
Abstract

A method of forming interconnections between channels and/or chambers for use in a micro-fluidic device. Two planer substrates (usually glass and silicon respectively) having etched channels are bonded together to form volmes where the channels overlap. A manifolding cut is then made through the glass, intersecting glass channels only. An organic solution is passed into cut, and flows through silicon channels. An aqueous solution is passed into cut, and flows through glass channels. The solutions meet in the region, where matter is transferred from one solution to another.

Claims (10)

1. Method of connecting channels including a) forming at least one flow path in a first substrate; b) forming at least one flow path in a second substrate; c) contacting the first and second substrates to form at least one channel and d) forming at least one cut in an external face of the first substrate, the cut being of sufficient depth to intersect one or more of the channels such that, in use, a fluid passing along a fluid pathway defined by the at least one cut may pass into the at least one channel, characterised in that the substrates are bonded before the at least one cut is formed therein.

2. Method according to claim 1 including the step of making at least one cut in an external face of the second substrate, the cut being of sufficient depth to intersect one or more of said channels such that only the required interconnections are made by the at least one cut.

3. Method according to claim 2 including the steps of a) forming at least one flow path in a third substrate and b) joining the third substrate to the first and second substrates.

4. Method according to claim 1 wherein the at least one cut formed in the first substrate and the at least one cut formed in the second substrate are off-set.

5. Method according to claim 1 wherein the at least one cut formed substantially perpendicular to the plane of the substrate.

6. Method according to claim 1 wherein the cuts are formed by sawing.

7. Method according to claim 1 wherein the cuts are formed by mechanical milling.

8. Method according to claim 1 wherein the cuts are formed by laser ablation.

9. Method according to claim 1 wherein the cuts are formed by photolithography.

10. Method according to claim 1 wherein the cuts are formed by chemical etching.

Assignments (3)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Feb 8, 2008
From: BRITISH NUCLEAR FUELS PLC
To: NUCLEAR DECOMMISSIONING AUTHORITY
Reel/Frame 020482/0750 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Oct 29, 2002
From: SHAW, JOHN EDWARD ANDREW; TURNER, CHRIS; CENTRAL RESEARCH LABORATORIES LIMITED
To: BRITISH NUCLEAR FUELS
Reel/Frame 013450/0362 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Aug 8, 2001
From: CENTRAL RESEARCH LABORATORIES LIMITED
To: BRITISH NUCLEAR FUELS PLC
Reel/Frame 012043/0803 →