IP Library › Granted Patent US 6,346,477
Granted Patent Utility Small
US 6,346,477 · Confirmation No. 7754

Method of interlayer mediated epitaxy of cobalt silicide from low temperature chemical vapor deposition of cobalt

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 Code Description Pages PDF
2001-01-09 TRNA Transmittal of New Application 8 View
2001-01-09 SPEC Specification 38 View
2001-01-09 ABST Abstract 1 View
2001-01-09 DRW Drawings-only black and white line drawings 13 View
2001-01-09 OATH Oath or Declaration filed 4 View
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Quick Facts
Patent No.
US 6,346,477
App. No.
09/757,201
Filed
2001-01-09
Granted
2002-02-12
Art Unit
2812
PTA
0 days