Liquid crystal display device and method for manufacturing the same
View Patent ↗A liquid crystal display device comprising a sealing material provided on a periphery of a substrate, projections formed by etching a film formed on the subtrate, and another substrate opposite the substrate being remote therefrom by a gap and being supported by the projections. An area occupying rate of the projections portions with respect to a region enclosed by the sealing material is not less than 0.0001 and not more than 0.003. It is possible to obtain a liquid crystal display device free of display blurs at the time of using the same in a high temperature condition and with which no bubbles are generated when using the same in a low temperature condition by setting the area occupying ratio for the columnar spacers to be optimal value.
1. A liquid crystal display device comprising: a sealing material provided on a periphery of a substrate for preventing leakage of liquid crystal, projections formed by etching a film formed on the substrate, and another substrate opposing the substrate being remote therefrom by a gap and being supported by the projections, wherein an area occupying ratio of the projections with respect to a region enclosed by the sealing material is not less than 0.001 and not more than 0.003.
2. The liquid crystal display device of claim 1 , wherein the area occupying ratio is not less than 0.001 and not more than 0.002.
3. The liquid crystal display device of claim 1 , wherein the area occupying ratio is not less than 0.001 and not more than 0.0015.
4. The liquid crystal display device of any one of claims 1 - 3 , wherein the film is formed of acrylic resin.
5. A method for manufacturing liquid crystal display device comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal though the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a pressure of not less than 20,000 Pa and not more than 40,000 Pa to surfaces of both substrates.
6. The method of claim 5 , wherein a sealing agent is applied to the liquid crystal injection inlet simultaneously with applying pressure to the surfaces of both substrates.
7. A method for manufacturing a liquid crystal display device comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a sealing agent to the injection inlet of the liquid crystal display device after elapse of a specified time from completion of injecting liquid crystal.
8. The method of claim 7 , wherein the specified time is not less than 30 minutes and not more than 60 minutes.
9. A method for manufacturing liquid crystal display device comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal, an area occupying ratio of the projections with respect to a region enclosed by the sealing material being designed to be not less than 0.001 and not more than 0.003; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a pressure of not less than 20,000 Pa and not more than 40,000 Pa to surfaces of both substrates.
10. A method for manufacturing a liquid crystal display device comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal, an area occupying ratio of the projections with respect to a region enclosed by the sealing material being designed to be not less than 0.001 and not more than 0.003; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the seal agent; and applying a sealing agent to the injection inlet of the liquid crystal display device after elapse of a specified time from completion of injecting liquid crystal.
11. A method for manufacturing liquid crystal display device of a transverse field method comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a pressure of not less than 20,000 Pa and not more than 40,000 Pa to surfaces of both substrates, wherein a sealing agent is applied to the liquid crystal injection inlet simultaneously with applying pressure to surfaces of both substrates.
12. A method for manufacturing a liquid crystal display device of a transverse field method comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a sealing agent to the injection inlet of the liquid crystal display device after elapse of a specified time from completion of injecting liquid crystal.
13. The method of claim 12 , wherein the specified time is not less than 30 minutes and not more than 60 minutes.
14. A method for manufacturing liquid crystal display device of a transverse field method comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal, an area occupying ratio of the projections with respect to a region enclosed by the sealing material being designed to be not less than 0.001 and not more than 0.003; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a pressure of not less than 20,000 Pa and not more than 40,000 Pa to surfaces of both substrates.
15. A method for manufacturing a liquid crystal display device of a transverse field method comprising: forming projections by etching a film formed on a substrate; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal, an area occupying ratio of the projections with respect to a region enclosed by the sealing material being designed to be not less than 0.001 and not more than 0.003; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the seal agent; and applying a sealing agent to the injection inlet of the liquid crystal display device after elapse of a specified time from completion of injecting liquid crystal, the specified time being not less than 30 minutes and not more than 60 minutes.
16. A method for manufacturing a liquid crystal display of a transverse field method device comprising: forming projections by etching a film formed on a substrate, heights of projections being varied by not less than 0.05 μm and not more than 0.2 μm; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal, an area occupying ratio of the projections with respect to a region enclosed by the sealing material being designed to be not less than 0.0014 and not more than 0.0029; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a sealing agent to the injection inlet of the liquid crystal display device after elapse of a specified time from completion of injecting liquid crystal, the specified time being not less than 30 minutes and not more than 60 minutes.
17. A method for manufacturing liquid crystal display device of a transverse field method comprising: forming projections by etching a film formed on a substrate, heights of projections being varied by not less than 0.05 μm and not more than 0.2 μm; applying a sealing material on a periphery of the substrate in an annular form except for an injection inlet for liquid crystal, an area occupying ratio of the projections with respect to a region enclosed by the sealing material being designed to be not less than 0.0014 and not more than 0.0029; overlapping another substrate onto the substrate with the projections and the sealing material being interposed therebetween; injecting liquid crystal through the liquid crystal injection inlet into a region enclosed by the sealing material; and applying a pressure of not less than 20,000 Pa and not more than 40,000 Pa to surfaces of both substrates.