IP Library Granted Patent US 6,985,050
Granted Patent B2
US 6,985,050 · App. 09/838,483 · Granted Jan 10, 2006

Waveguide-finline tunable phase shifter

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Quick Facts
Patent No.
US 6,985,050
App. No.
09/838,483
Granted
Jan 10, 2006
Kind
B2
Abstract

A tunable phase shifter includes a waveguide, a finline substrate positioned within the waveguide, a tunable dielectric layer positioned on the finline substrate, a first conductor positioned on the tunable dielectric layer, and a second conductor positioned on the tunable dielectric layer, with the first and second conductors being separated to form a gap. By controlling a voltage applied to the tunable dielectric material, the phase of a signal passing through the waveguide can be controlled.

Claims (45)

1. A device comprising;

a waveguide;

a finline substrate positioned within the waveguide;

a tunable dielectric layer positioned on the finline substrate, wherein the tunable dielectric layer comprises a barium strontium titanate (BSTO) composite containing materials that enable low insertion loss and phase tuning at room temperature;

a first conductor positioned on the tunable dielectric layer; and

a second conductor positioned on the tunable dielectric layer, the first and second conductors being separated to form a gap having a minimum width ranging from 2 micron to 50 micron; the tunable dielectric layer comprising an electronically tunable dielectric phase and at least two metal oxide phases.

2. A device comprising;

a waveguide;

a finline substrate positioned within the waveguide;

a tunable dielectric layer positioned on the finline substrate, wherein the tunable dielectric layer comprises a barium strontium titanate (BSTO) composite containing materials that enable low insertion loss and phase tuning at room temperature;

a first conductor positioned on the tunable dielectric layer; and

a second conductor positioned on the tunable dielectric layer, the first and second conductors being separated to form a gap having a minimum width ranging from 2 micron to 50 micron;

the gap extending from a first end of the tunable dielectric layer to a second end of the tunable dielectric layer;

the gap including a first end, a center portion and a second end; and

the gap including exponentially tapered portions adjacent to said first and second ends.

3. The device according to claim 2 , wherein the tunable dielectric layer comprises a barium strontium titanate (BSTO) composite; the composite comprising at least one substance selected from the group of:

BSTO-MgO, BSTO-MgAl 2 O 4 , BSTO-CaTiO 3 , BSTO-MgTiO 3 , BSTO-MgSrZrTiO 6 .

4. A device comprising;

a waveguide;

a finline substrate positioned within the waveguide;

a tunable dielectric layer positioned on the finline substrate, wherein the tunable dielectric layer comprises a barium strontium titanate (BSTO) composite containing materials that enable low insertion loss and phase tuning at room temperature;

a first conductor positioned on the tunable dielectric layer;

a second conductor positioned on the tunable dielectric layer, the first and second conductors extending between a first end and a second end and being separated to form a gap having a minimum width ranging from 2 micron to 50 micron; and

an impedance matching section formed by at least one exponentially tapered gap between the first and second conductors; the at least one exponentially tapered gap being situated adjacent at least one of the first end and the second end.

5. A device comprising;

a waveguide;

a finline substrate positioned within the waveguide;

a tunable dielectric layer positioned on the finline substrate, wherein the tunable dielectric layer comprises a composite material that enables low insertion loss and phase tuning at room temperature; the composite material being comprised of at least one substance selected from the group of:

Mg 2 SiO 4 , CaSiO 3 , BaSiO 3 , SrSiO 3 , Na 2 SiO 3 , NaSiO 3 -5H 2 O, LiAlSiO 4 , LiSiO 3 , Li 4 SiO 4 , Al 2 Si 2 O 7 , ZrSiO 4 , KAlSi 3 O 8 , NaAlSi 3 O 8 , CaAl 2 Si 2 O 8 , CaMgSi 2 O 6 , BaTiSi 3 O 9 and Zn 2 SiO 4 ;

a first conductor positioned on the tunable dielectric layer; and

a second conductor positioned on the tunable dielectric layer, the first and second conductors being separated to form a gap having a minimum width ranging from 2 micron to 50 micron.

6. A device comprising:

a waveguide;

a finline substrate positioned within the waveguide;

a tunable dielectric layer positioned on the finline substrate, wherein the tunable dielectric layer comprises a barium strontium titanate (BSTO) composite containing materials that enable low insertion loss and phase tuning at room temperature;

a first conductor positioned on the tunable dielectric layer; and

a second conductor positioned on the tunable dielectric layer, the first and second conductors being separated to form a gap having a minimum width ranging from 2 micron to 50 micron; the second conductor comprising an RF choke.

7. A device comprising;

a waveguide;

a finline substrate positioned within the waveguide;

a tunable dielectric layer positioned on the finline substrate, wherein the tunable dielectric layer comprises a barium strontium titanate (BSTO) composite containing materials that enable low insertion loss and phase tuning at room temperature;

a first conductor positioned on the tunable dielectric layer; and

a second conductor positioned on the tunable dielectric layer, the first and second conductors being separated to form a gap having a minimum width ranging from 2 micron to 50 micron; the waveguide including first and second sections, and the device further comprising:

a first conductive plate positioned between the first and second sections of the waveguide; and

a second conductive plate positioned between the first and second sections of the waveguide, the first conductive plate being insulated from the waveguide and the second conductive plate being electrically connected to the waveguide.

Assignments (7)
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Mar 5, 2020
From: BLACKBERRY LIMITED
To: NXP USA, INC.
Reel/Frame 052095/0443 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 30, 2013
From: RESEARCH IN MOTION RF, INC.
To: RESEARCH IN MOTION CORPORATION
Reel/Frame 030909/0908 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Jul 30, 2013
From: RESEARCH IN MOTION CORPORATION
To: BLACKBERRY LIMITED
Reel/Frame 030909/0933 →
CHANGE OF NAME Recorded Jul 31, 2012
From: PARATEK MICROWAVE, INC.
To: RESEARCH IN MOTION RF, INC.
Reel/Frame 028686/0432 →
RELEASE Recorded May 3, 2004
From: SILICON VALLEY BANK; GATX VENTURES, INC.
To: PARATEK MICROWAVE INC.
Reel/Frame 015279/0502 →
SECURITY INTEREST Recorded Jun 25, 2002
From: PARATAK MICROWAVE, INC.
To: SILICON VALLEY BANK; GATX VENTURES, INC.
Reel/Frame 013025/0132 →
ASSIGNMENT OF ASSIGNOR'S INTEREST Recorded Sep 20, 2001
From: SENGUPTA, LOUISE C.; KOZYREV, ANDREY
To: PARATEK MICROWAVE, INC.
Reel/Frame 012186/0020 →