IP Library Granted Patent US 6,705,124
Granted Patent Utility
US 6,705,124 · Confirmation No. 5827

HIGH-DENSITY PLASMA DEPOSITION PROCESS FOR FABRICATING A TOP CLAD FOR PLANAR LIGHTWAVE CIRCUIT DEVICES

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2005-06-10 LET. Miscellaneous Incoming Letter 4 View
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2003-12-19 LET. Miscellaneous Incoming Letter 1 View
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2003-09-17 EXIN Examiner Interview Summary Record (PTOL - 413) 1 View
2003-09-17 NFDR Notice of Formal Drawings Required 1 View
2003-09-17 1449 List of References cited by applicant and considered by examiner 1 View
2003-09-17 892 List of references cited by examiner 2 View
2003-09-17 IIFW Issue Information including classification, examiner, name, claim, renumbering, etc. 1 View
2003-09-17 FWCLM Index of Claims 1 View
2003-09-17 SRFW Search information including classification, databases and other search related notes 1 View
2003-09-10 SRNT Examiner's search strategy and results 4 View
2003-09-07 SRNT Examiner's search strategy and results 4 View
2001-10-09 IDS Information Disclosure Statement (IDS) Form (SB08) 4 View
2001-06-04 WFEE Fee Worksheet (SB06) 1 View
2001-06-04 TRNA Transmittal of New Application 2 View
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2001-06-04 SPEC Specification 16 View
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2001-06-04 OATH Oath or Declaration filed 3 View
2001-06-04 SPEC Specification 16 View
2001-06-04 CLM Claims 4 View
2001-06-04 ABST Abstract 1 View
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2001-06-04 OATH Oath or Declaration filed 3 View
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Quick Facts
Patent No.
US 6,705,124
App. No.
09/874,434
Filed
2001-06-04
Granted
2004-03-16
Pub. No.
US20020178759A1
Art Unit
1731
PTA
-91 days