IP Library › Patent Application 09912057
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App. No. 09/912,057 · Confirmation No. 3295

RESIN, A DOUBLE RESIN LAYER FOR EXTREME ULTRAVIOLET LIGHT (EUV) PHOTOLITHOGRAPHY, AND AN EXTREME ULTRAVIOLET LIGHT (EUV) PHOTOLITHOGRAPHY PROCESS

Inventor: Andre Schiltz
Patent Expired Due to NonPayment of Maintenance Fees Under 37 CFR 1.362 View Patent ↗ View Publication ↗
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 Code Description Pages PDF
2003-09-29 IFEE Issue Fee Payment (PTO-85B) 5 View
2001-07-25 TRNA Transmittal of New Application 1 View
2001-07-25 A.PE Preliminary Amendment 13 View
2001-07-25 SPEC Specification 14 View
2001-07-25 CLM Claims 3 View
2001-07-25 ABST Abstract 1 View
2001-07-25 DRW Drawings-only black and white line drawings 2 View
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Quick Facts
App. No.
09/912,057
Filed
2001-07-25
Granted
2003-11-25
Pub. No.
US20020072014A1
Art Unit
1756
PTA
-94 days