Liquid crystal display device and fabricating method thereof
View Patent ↗A liquid crystal display device includes a substrate, a gate electrode disposed on the substrate, a gate pad disposed on the substrate, an insulating film disposed on the gate electrode and the gate pad, an active layer disposed on the insulating film above the gate electrode, an ohmic contact layer disposed on portions of the active layer, a source electrode and a drain electrode disposed on the ohmic contact layer, a passivation layer disposed on the source and drain electrodes, a pixel electrode disposed on the passivation layer and contacting the drain electrode, and a transparent electrode disposed on the passivation layer and contacts the gate pad, wherein the gate electrode and the gate pad both include a first layer formed of a first metal and a second layer formed of an alloy of the first metal and a second metal disposed at an upper surface of the first layer.
1. A liquid crystal display device, comprising:
a substrate;
a gate electrode disposed on the substrate;
a gate pad disposed on the substrate;
an insulating film disposed on the gate electrode and the gate pad;
an active layer disposed on the insulating film above the gate electrode;
an ohmic contact layer disposed on portions of the active layer;
a source electrode and a drain electrode disposed on the ohmic contact layer;
a passivation layer disposed on the source and drain electrodes;
a pixel electrode disposed on the passivation layer and contacting the drain electrode; and
a transparent electrode disposed on the passivation layer and contacting the gate pad,
wherein the gate electrode and the gate pad both include a first layer formed of a first metal and an alloy layer formed on the surface of the first layer by heat generated by continuously depositing a second metal on the first metal, a residual of the second metal is entirely removed so that the alloy layer of the gate pad is directly connected to the transparent electrode, and
wherein the first metal includes aluminum, and the alloy layer includes an alloy of aluminum and the second metal.
2. The liquid crystal display device according to claim 1 , wherein the transparent electrode is disposed within a via formed through the passivation layer and insulating film.
3. The liquid crystal display device according to claim 1 , wherein the passivation layer covers side surfaces of the source and drain electrodes.
4. The liquid crystal display device according to claim 1 , wherein the passivation layer is disposed on the insulating film.
5. The liquid crystal display device according to claim 1 , wherein the passivation layer contacts a portion of the active layer between the source and drain electrodes.
6. A liquid crystal display device, comprising:
a substrate;
a gate electrode disposed on the substrate;
a gate pad disposed on the substrate;
an insulating film formed of a silicon oxide or a silicon nitride, and disposed on the gate electrode and the gate pad;
an active layer disposed on the insulating film above the gate electrode;
an ohmic contact layer disposed on portions of the active layer;
a source electrode and a drain electrode formed of one selected from a group consisting of MoW, MoTa and MoNb, and disposed on the ohmic contact layer;
a passivation layer formed of benzocyclobutene (BCB) or perfluorocyclobutane (PFCB), and disposed on the source and drain electrodes;
a pixel electrode disposed on the passivation layer and contacting the drain electrode; and
a transparent electrode disposed on the passivation layer and contacting the gate pad,
wherein the gate electrode and the gate pad both include a AlNd layer, and a AlNd—Mo or a AlNd—Cr alloy layer formed on the surface of the AlNd layer, and the AlNd—Mo or the AlNd—Cr alloy layer is directly connected to the transparent electrode.