Narrow write head pole tip fabricated by sidewall processing
View Patent ↗The magnetic head includes a P2 pole tip in which the P2 pole tip material is electroplated upon a sidewall of the P2 pole tip photolithographic trench. To accomplish this, a block of material is deposited upon a write gap layer, such that a generally straight, vertical sidewall of the block of material is disposed at the P2 pole tip location. Thereafter, an electroplating seed layer is deposited upon the sidewall. A P2 pole tip trench is photolithographically fabricated such that the sidewall (with its deposited seed layer) is exposed within the P2 pole tip trench. Thereafter, the P2 pole tip is formed by electroplating pole tip material upon the seed layer and outward from the sidewall within the trench, The width of the P2 pole tip is thus determined by the quantity of pole tip material that is deposited upon the sidewall.
1. A magnetic head comprising:
a substrate;
a read head being fabricated upon said substrate;
a P1 pole being fabricated upon said read head;
a write gap layer being fabricated upon said P1 pole;
a P2 pole tip fabricated upon of the write gap layer, wherein the P2 pole tip consists of a first sidewall portion, which is formed from a seed layer, and a second portion, which is composed of a pole tip material, and wherein the P2 pole tip has a thickness dimension t, and a base having width dimension W;
and wherein said seed layer is comprised of an integrally formed layer of seed layer material that forms said base of said P2 pole tip and said first sidewall portion of said P2 pole tip that extends throughout said thickness t of said P2 pole tip.
2. A magnetic head as described in claim 1 wherein said pole tip material that comprises said second portion of said P2 pole tip is disposed upon said seed layer material that forms said first sidewall portion of said P2 pole tip.
3. A magnetic head as described in claim 1 wherein said seed layer material is formed with a thickness of approximately 50 Å to approximately 500 Å, and said pole tip material is formed with a thickness of approximately 100 Å to approximately 5000 Å.
4. A magnetic head as described in claim 3 wherein said seed layer material thickness is approximately 250 Å and said pole tip material thickness is approximately 1500 Å.
5. A magnetic head as described in claim 3 wherein said seed layer material is comprised of deposited NiFe and said pole tip material is comprised of electroplated NiFe.
6. A hard disk drive comprising:
at least one hard disk being fabricated for rotary motion upon a disk drive;
at least one magnetic head adapted to fly over said hard disk for writing data on said hard disk, said magnetic head including:
a substrate;
a read head being fabricated upon said substrate;
a P1 pole being fabricated upon said read head;
a write gap layer being fabricated upon said P1 pole;
a P2 pole tip fabricated upon of the write gap layer, wherein said P2 pole tip consists a first sidewall portion, which is formed from a seed layer, and a second portion, which is composed of a pole tip material, and wherein the P2 pole tip has a thickness dimension t, and a base having a width dimension W;
and wherein said seed layer is comprised of an intergrally formed layer of seed layer material that forms said base of said P2 pole tip and said first sidewall portion of said P2 pole tip that extends throughout said thickness t of said P2 pole tip.
7. A hard disk drive as described in claim 6 wherein said pole tip material that comprises said second portion of said P2 pole tip disposed upon said seed layer material that forms said first sidewall portion of said P2 pole tip.
8. A hard disk drive as described in claim 6 wherein said seed layer material is formed with a thickness of approximately 50 Å to approximately 500 Å, and said pole tip material is formed with a thickness of approximately 100 Å to approximately 5000 Å.
9. A hard disk drive as described in claim 8 wherein said seed layer material thickness is approximately 250 Å and said pole tip material thickness is approximately 1500 Å.
10. A hard disk drive as described in claim 8 wherein said seed layer material is comprised of deposited NiFe and said pole tip material is comprised of electroplated NiFe.
11. A method for head comprising:
a substrate;
a read head being fabricated upon said substrate;
a P1 pole being fabricated upon said read head;
a write gap layer being fabricated upon said P1 pole;
a P2 pole tip being fabricated upon portions of said write gap layer, wherein said P2 pole tip includes a base surface layer that is disposed upon said write gap layer and a first sidewall surface layer that is disposed generally perpendicularly to said base surface layer, and wherein said base surface layer and said first sidewall surface layer are comprised of an integrally formed layer of P2 pole tip seed layer material;
and wherein said P2 pole tip includes pole tip material portion, and wherein said P2 pole tip includes a second sidewall surface layer that is disposed opposite to said first sidewall surface layer, and wherein said second sidewall surface layer is comprised of said non-seed layer material.
12. A magnetic head as described in claim 11 wherein said base surface layer defines a width W of said P2 pole tip and said first sidewall layer defines a thickness t of said P2 pole tip.
13. A magnetic head as described in claim 12 , wherein said pole tip material portion is disposed in part upon said first sidewall surface seed layer material.
14. A magnetic head as described in claim 13 wherein said seed layer material is formed with a thickness of approximately 50 Å to approximately 500 Å, and said pole tip material is formed with a thickness of approximately 100 Å to approximately 5000 Å.
15. A magnetic head as described in claim 13 wherein said seed layer material thickness is approximately 250 Å and said pole tip material thickness is approximately 1500 Å.
16. A magnetic head as described in claim 13 wherein said seed layer material is comprised of deposited NiFe and said pole tip material is comprised of electroplated NiFe.