Diffusion reflector and manufacture of the same
View Patent ↗There is provided a method of manufacturing a diffusing reflector which assures high diffusion efficiency and excellent reflection characteristic for the lighting. First, a resin film having photosensitivity is formed on a substrate 2 . Next, gathering of pillar-shaped bodies isolated each other by the patterning of resin film with the photolithography is provided. Subsequently, the uneven surface layer having the maximum inclination angle under 12° is formed by gently deforming individual pillar-shaped bodies with the heat treatment. Moreover, the gently deformed uneven surface layer is coated with the resin and the flat openings between pillar-shaped bodies arranged discretely are buried to ease the inclination angle. Finally, a metal film 13 formed on the gently deformed uneven surface layer.
1. A method of manufacturing a diffusing reflector comprising the processes of:
preparing a substrate;
forming a first resin film having photosensitivity on said substrate;
providing a gathering of adjacent pillar-shaped bodies isolated from each other through patterning of said resin film with photolithography;
deforming gently said adjacent pillar-shaped bodies through a reflow;
forming an uneven surface layer having the maximum inclination angle of under 120 by coating with a thin layer of a second resin said gently deformed pillar-shaped bodies;
covering with the second resin open flat spaces located between said isolated adjacent pillar-shaped bodies to form one concave gap between any two adjacent isolated pillar-shaped bodies so that upper end portions of said any two adjacent isolated pillar-shaped bodies are higher than a lower end portion of said one concave gap in the thickness direction of the diffusing reflector, thereby minimizing an occurrence of a flat surface area on said substrate; and
forming a metal film on said uneven surface layer,
wherein,
said first resin film is patterned by straight connected lines that form a continuous polygonal pattern, said straight connected lines providing a continuous and substantially uniform gap between any two of said adjacent polygonal pillar-shaped bodies thereby forming a rectilinear honeycomb-like pattern,
said gap is substantially constant throughout the honeycomb-like pattern and has a size equal to about a minimum resolution of said photolithography, and
a thickness of the second resin is about 500 nm.
2. The method of manufacturing a diffusing reflector as claimed in claim 1 , wherein said maximum inclination angle is about 10°.
3. The method of manufacturing a diffusing reflector as claimed in claim 1 , wherein said reflow process is a heat treatment under the temperature of about 220° C.
4. The method of manufacturing a diffusing reflector as claimed in claim 1 , wherein gathering of polygonal pillar-shaped bodies isolated from each other by the divided patterning of said first resin film by said photolithography is provided.