Patent Application
Utility
App. No. 09/968,273
· Confirmation No. 1124
Method and device for manufacturing semiconductor devices including insulation oxide layers
Inventor:
Yoshimi Shiramizu
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2001-10-02 | TRNA |
Transmittal of New Application | 2 | View | |
| 2001-10-02 | SPEC |
Specification | 23 | View | |
| 2001-10-02 | CLM |
Claims | 4 | View | |
| 2001-10-02 | ABST |
Abstract | 1 | View | |
| 2001-10-02 | DRW |
Drawings-only black and white line drawings | 7 | View | |
| 2001-10-02 | OATH |
Oath or Declaration filed | 3 | View |
Inventors
Yoshimi Shiramizu
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
156/345.5
H10D64/01346
H10P14/6306
H10P14/6322
H10P14/6512
H10P14/6309
H10P14/6509
H10P14/69215
Prosecution
- Examiner
- HASSANZADEH, PARVIZ
- Art Unit
- 1763
- Docket No.
- Q66395
- Confirmation No.
- 1124
Foreign Priority
215945/1999
·
1999-07-29
·
JAPAN
Publication
- Pub. No.
- US20020009899A1
- Pub. Date
- 2002-01-24
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-25
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Quick Facts
- App. No.
- 09/968,273
- Filed
- 2001-10-02
- Pub. No.
- US20020009899A1
- Examiner
- HASSANZADEH, PARVIZ
- Art Unit
- 1763
External Links