Granted Patent B2

US 6,919,009 · App. 09/969,518 · Granted Jul 19, 2005

Assignee: Nanoplex Technologies, Inc.

Abstract

Claims (43)

1. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising:

a. providing a template comprising a plurality of pores by the method comprising the steps:

i) providing a resist-coated substrate;

ii) exposing a pattern on said resist-coated substrate using a photolithographic technique;

iii) developing said pattern;

iv) etching said pattern to form a plurality of pores;

b. causing deposition of a first material into said pores;

c. causing deposition of a second material into said pores; and

d. releasing said segmented nanoparticles from said template, wherein a segment bisects the length of the particle.

2. The method of claim 1 wherein said photolithographic technique is interference lithography (IL).

3. The method of claim 1 wherein said photolithographic technique is achromatic interference lithography (AIL).

4. The method of claim 1 wherein said photolithographic technique uses a mask to expose said pattern.

5. The method of claim 4 wherein said mask is formed by interference lithography or achromatic interference lithography.

6. The method of claim 1 wherein the deposition of said first or second material is performed by electrochernical deposition.

7. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising:

a. providing a mask comprising a plurality of cylindrical posts, by the method comprising:

i) providing a resist-coated substrate;

ii) exposing a pattern on said resist-coated substrate using a photolithographic technique;

iii) developing said pattern; and

iv) etching said pattern;

b. placing said mask over a substrate;

c. etching a plurality of pores into said substrate;

d. causing deposition of a first material into said pores of the substrate;

e. causing deposition of a second material into said pores of the substrate;

f. releasing said segmented nanoparticles from said substrate, wherein a segment bisects the length of the particle.

8. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising:

a. providing a planer substrate;

b. causing deposition of a layer of a first material on the surface of said substrate;

c. causing deposition of a layer of a second material on the surface of said first material;

d. depositing a layer of photoresist on the surface of the substrate;

e. exposing a pattern on said resist coated substrate using a photolithographic technique;

f. developing said pattern;

g. etching said pattern through said first and second materials to create a segmented nanoparticles on the surface of said substrate; and

h. releasing said segmented nanoparticle from said substrate, wherein a segment bisects the length of the particle.

9. A method for the manufacture of a free standing segmented nanoparticle comprising a plurality of materials, the method comprising:

a. providing a template comprising a plurality of pores by the method comprising the steps:

i) providing a multi-layer stack comprising photoresist;

ii) exposing a pattern on said photoresist;

iii) developing said pattern;

iv) etching said pattern to form a plurality of pores;

b. causing deposition of a first material into said pores;

c. causing deposition of a second material into said pores; and

d. releasing said segmented nanoparticles from said template, wherein a segment bisects the length of the particle.

Assignments (6)

Continuity (10)