IP Library Granted Patent US 6,844,217
Granted Patent B2
US 6,844,217 · App. 09/972,649 · Granted Jan 18, 2005

Die support structure

Assignee: Micron Technology, Inc.
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Quick Facts
Patent No.
US 6,844,217
App. No.
09/972,649
Granted
Jan 18, 2005
Kind
B2
Abstract

Disclosed is a method of forming a support structure for supporting multiple dies and resulting structure. The support structure has a cavity with an upper die support surface, sidewalls providing the upper die support surface, and a lower die support bottom surface connected with the sidewalls. The support structure can be formed of a plurality of layers. A first semiconductor die is secured on the lower die support surface and a second semiconductor die is secured to the upper die support surface. An aperture can be formed from the structure bottom surface to the cavity to facilitate electrical connections between the first die and electrical contact areas on the support structure. An encapsulating material is formed around the dies, the electrical connections, and the vacant cavity space to form a packaged semiconductor device.

Claims (56)

1. A method of fabricating a die support structure for supporting multiple dice comprising the steps of:

providing a semiconductor support structure having a top and bottom surface;

providing a cavity in said support structure, said cavity being defined by an upper diet support surface which has an opening therein, first sidewalls, and a lower die support surface extending inwardly from said first sidewalls, said lower die support surface having an aperture therein which extends to an opening in a bottom surface of said die support structure; and

coupling a first semiconductor die to said lower die support surface;

coupling a second semiconductor die to said upper die support surface.

2. The method of claim 1 , wherein said support structure comprises a plurality of laminated layers.

3. The method of claim 1 , further comprising providing a conductive path in said support structure from said upper die support surface to the bottom surface of said support structure.

4. A method as in claim 3 , further comprising:

forming a first conductive bonding area on said upper die support surface coupled to said conductive path, said first conductive bonding area adapted to electrically couple to said second semiconductor die mounted on said upper die support surface; and

forming a second conductive bonding area on said bottom surface coupled to said conductive path.

5. A method as in claim 4 , further comprising: electrically coupling said first semiconductor die to said second electrically conductive area on said bottom surface.

6. The method of claim 1 , further comprising the step of electrically coupling said at least one semiconductor die to said support structure.

7. A method of forming a semiconductor assembly comprising the steps of:

providing a die support structure having a top and bottom surface;

providing a cavity in said support structure, said cavity being defined by an upper die support surface which has an opening therein, sidewalls, and a lower die support surface connected with said sidewalls, said lower die support surface having an aperture therein whereby said aperture has a smaller perimeter than said cavity, and said cavity extending from said opening to said lower die support surface;

securing at least one semiconductor die to said lower die support surface; and

securing at least another semiconductor die to a top surface of said upper die support surface.

8. The method of claim 7 , wherein said at least one semiconductor die is a board-on-chip.

9. A method as in claim 7 , further comprising:

forming a plurality of electrically conductive vias through said die support structure from said upper die support surface to said bottom surface of said die support structure;

electrically coupling said another semiconductor die to an exposed portion of said electrically conductive vias on said upper die support surface; and

forming a plurality of separate electrical couplings between said semiconductor die coupled to said lower support structure to exposed portions of said plurality of electrically conductive vias on said bottom surface of said die support structure.

10. A method of forming a semiconductor assembly comprising the steps of:

providing a die support structure having a top and bottom surface;

providing a cavity in said support structure, said cavity being defined by an upper die support surface which has an opening therein, sidewalls which provide said upper die support surface, and a lower die support surface, said cavity extending from said opening to said lower die support surface;

providing an aperture in said lower die support surface, said aperture extending from the support structure bottom surface to said cavity, said aperture having a smaller area than an area of said cavity;

forming at least one conductive area on said support structure bottom surface adapted to be electrically coupled through said aperture to at least one conductive area of a die mounted within said cavity;

securing at least one semiconductor die to said upper die support surface; and

securing at least another semiconductor die to a top surface of said lower die support surface.

11. The method of claim 10 , wherein said at least one semiconductor die secured to said upper die support surface is a flip chip.

12. The method of claim 10 , further comprising the steps of at least partially encapsulating said support structure with encapsulation material.

13. A method as in claim 10 , further comprising:

forming a plurality of electrically conductive paths from said upper die support structure to said bottom surface of said die support surface.

14. A method as an claim 13 , further comprising forming an electrically conductive bonding wire between an exposed portion of at least one of said electrically conductive paths on said bottom surface of said die support surface to said die mounted within said cavity.

15. A method of fabricating a die support structure for supporting multiple dice comprising the steps of:

forming a semiconductor support structure having a top and bottom external surface;

providing a cavity in said semiconductor support structure, said cavity being defined by:

an upper die support surface on said top external surface which has an opening therein;

first sidewalls extending to a lower die support surface within said cavity, said lower die support surface extending substantially laterally from said first sidewalls, said lower die support surface further defined by an aperture therein;

second sidewalls extending from said lower die support surface surrounding said aperture to said support structure bottom external surface, said aperture having a smaller area than that of a portion of said cavity defined by said first sidewalls above said lower die support surface;

wherein said aperture is adapted to allow the routing at least one electrical path through said aperture from a die mounted on said lower die support surface to at least one conductive area located on said support structure bottom external surface; and

mounting a first semiconductor die on said lower die support surface;

mounting a second semiconductor die on said upper die support surface.

16. A method as in claim 15 , further comprising forming said semiconductor support structure with a plurality of laminated layers which are adhered together to form said semiconductor support structure.

17. A method as in claim 15 , further comprising:

forming at least one conductive area on said support structure external bottom surface adapted to be electrically coupled with a die coupled to said lower die support surface through said aperture.

18. A method as in claim 17 , wherein said conductive path is internal to said sidewalls.

19. A method as in claim 17 , wherein said conductive path is formed on at least one surface of said sidewalls.

20. A method as in claim 17 , further comprising forming at least one electrical contact area on said upper die support surface.

21. A method as in claim 20 , further comprising forming at least one electrical path from said die mounted on said lower die support surface to said at least one conductive area on said support structure external bottom surface through one of said at least one aperture.

22. A method as in claim 21 , further comprising filling said cavity with an encapsulation material.

23. A method as in claim 20 , further comprising:

forming a conductive path from said electrical contact area on said upper die support surface through said semiconductor support structure to one of said at least one conductive area located on said support structure bottom external surface.

24. A method as in claim 23 , further comprising:

electrically coupling said first semiconductor die to said at least one conductive area located on said support structure bottom external surface.

25. A method as in claim 21 , further comprising forming encapsulation material around said at least one electrical path.

Assignments (5)
RELEASE OF SECURITY INTEREST Recorded Oct 9, 2019
From: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 050937/0001 →
RELEASE OF SECURITY INTEREST Recorded Aug 23, 2018
From: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
To: MICRON TECHNOLOGY, INC.
Reel/Frame 047243/0001 →
CORRECTIVE ASSIGNMENT TO CORRECT THE REPLACE ERRONEOUSLY FILED PATENT #7358718 WITH THE CORRECT PATENT #7358178 PREVIOUSLY RECORDED ON REEL 038669 FRAME 0001. ASSIGNOR(S) HEREBY CONFIRMS THE SECURITY INTEREST. Recorded Jun 8, 2017
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 043079/0001 →
PATENT SECURITY AGREEMENT Recorded Jun 2, 2016
From: MICRON TECHNOLOGY, INC.
To: MORGAN STANLEY SENIOR FUNDING, INC., AS COLLATERAL AGENT
Reel/Frame 038954/0001 →
SECURITY INTEREST Recorded May 12, 2016
From: MICRON TECHNOLOGY, INC.
To: U.S. BANK NATIONAL ASSOCIATION, AS COLLATERAL AGENT
Reel/Frame 038669/0001 →
Priority Claims (1)
SG 200101488 · Mar 9, 2001 · national
Continuity (2)
Division 0980304500 · Mar 12, 2001
Related Publication 20020125567A1 · Sep 12, 2002