IP Library › Granted Patent US 7,060,522
Granted Patent B2
US 7,060,522 · App. 09/986,107 · Granted Jun 13, 2006

Membrane structures for micro-devices, micro-devices including same and methods for making same

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Quick Facts
Patent No.
US 7,060,522
App. No.
09/986,107
Granted
Jun 13, 2006
Kind
B2
Abstract

A structure for a micro-device is fabricated by forming: a first layer of sacrificial material, a layer of structural material over the first sacrificial material layer, a second layer of sacrificial material over the structural material layer and a protective layer over the second sacrificial material layer. A release etch is used to remove the first and second sacrificial material layers at approximately the same rate. A structural feature may also be fabricated by forming: a first layer of a first material; a layer of structural material over the first layer of the first material; at least one cut in the structural material layer; and, a first layer of a sacrificial material, different from the first material, over the structural material layer such that an interface is created between the first layer of the sacrificial material and the first layer of the first material at the at least one cut.

Claims (52)

1. A method for fabricating a membrane of a structural material for a micro-device, comprising:

forming a first layer of a first material;

forming a first layer of structural material over the first layer of the first material;

forming at least one cut in the first layer of structural material;

forming a first layer of a sacrificial material, less resistant to removal than the first material, over the first layer of structural material such that an interface is created between the first material and the sacrificial material at the at least one cut in the first layer of structural material;

forming a second layer of structural material over the first layer of sacrificial material; and

subjecting the first layer of sacrificial material to a release etch to remove the first layer of the sacrificial material such that the second layer of structural material forms the membrane for the micro-device.

2. The method of claim 1 , wherein forming the first layer of structural material comprises forming a layer of polysilicon.

3. The method of claim 1 , wherein forming the first layer of structural material comprises forming a layer of single crystal silicon.

4. The method of claim 1 , wherein forming the at least one cut in the first layer of structural material comprises forming at least one channel.

5. The method of claim 1 , wherein:

forming the first layer of the first material comprises forming a first layer of nitride; and

forming the first layer of the sacrificial material comprises forming a first layer of oxide.

6. The method of claim 1 , further comprising:

forming a second layer of a sacrificial material over the second layer of structural material;

forming a protective layer over the second layer of the sacrificial material;

forming at least one cut in the protective layer;

forming a second layer of a second material over the protective layer such that an interface is created between the second layer of the second material and the second layer of the sacrificial material at the at least one cut in the protective layer; and

subjecting the second layer of the sacrificial material to the release etch to remove the second layer of the sacrificial material.

7. The method of claim 6 , wherein forming the first layer of structural material comprises forming a layer of polysilicon.

8. The method of claim 6 , wherein forming the protective layer comprises forming a protective layer of polysilicon.

9. The method of claim 6 , wherein forming the first layer of structural material comprises forming a layer of single crystal silicon.

10. The method of claim 6 , wherein forming the protective layer comprises forming a protective layer of single crystal silicon.

11. A method for fabricating a membrane of a structural material for a micro-device, comprising:

forming a first layer of a first material:

forming a first layer of structural material over the first layer of the first material;

forming at least one cut in the first layer of structural material;

forming a first layer of a sacrificial material, less resistant to removal than the first material, over the first layer of structural material such that an interface is created between the first material and the sacrificial material at the at least one cut in the first layer of structural material;

forming a second layer of structural material over the first layer of sacrificial material;

subjecting the first layer of sacrificial material to a release etch to remove the first layer of the sacrificial material forming a second layer of a sacrificial material over the second layer of structural material;

forming a protective layer over the second layer of the sacrificial material;

forming at least one cut in the protective layer;

forming a second layer of a second material over the protective layer such that an interface is created between the second layer of the second material and the second layer of the sacrificial material at the at least one cut in the protective layer;

subjecting the second layer of the sacrificial material to the release etch to remove the second layer of the sacrificial material; and

removing the protective layer after subjecting the first and second layers of sacrificial materials to the release etch.

12. The method of claim 11 , wherein removing the protective layer is accomplished mechanically.

13. The method of claim 11 , wherein removing the protective layer is accomplished chemically.

14. A method for fabricating a membrane of a structural material for a micro-device, comprising:

forming a first layer of a first material;

forming a first layer of structural material over the first layer of the first material;

forming at least one cut in the first layer of structural material;

forming a first layer of a sacrificial material, less resistant to removal than the first material, over the first layer of structural material such that an interface is created between the first material and the sacrificial material at the at least one cut in the first layer of structural material;

forming a second layer of structural material over the first layer of sacrificial material;

subjecting the first layer of sacrificial material to a release etch to remove the first layer of the sacrificial material forming a second layer of a sacrificial material over the second layer of structural material;

forming a protective layer over the second layer of the sacrificial material;

forming at least one cut in the protective layer;

forming a second layer of a second material over the protective layer such that an interface is created between the second layer of the second material and the second layer of the sacrificial material at the at least one cut in the protective layer;

subjecting the second layer of the sacrificial material to the release etch to remove the second layer of the sacrificial material; and wherein:

forming the first layer of the first material comprises forming a first layer of nitride;

forming the first layer of the sacrificial material comprises forming a first layer of oxide;

forming the second layer of the second material comprises forming a second layer of nitride; and

forming the second layer of the sacrificial material comprises forming a second layer of oxide.

Assignments (3)
RELEASE OF SECURITY INTEREST Recorded Sep 7, 2022
From: JPMORGAN CHASE BANK, N.A. AS SUCCESSOR-IN-INTEREST ADMINISTRATIVE AGENT AND COLLATERAL AGENT TO BANK ONE, N.A.
To: XEROX CORPORATION
Reel/Frame 061388/0388 →
RELEASE OF SECURITY INTEREST Recorded Sep 7, 2022
From: JPMORGAN CHASE BANK, N.A. AS SUCCESSOR-IN-INTEREST ADMINISTRATIVE AGENT AND COLLATERAL AGENT TO JPMORGAN CHASE BANK
To: XEROX CORPORATION
Reel/Frame 066728/0193 →
RELEASE OF SECURITY INTEREST Recorded Feb 15, 2016
From: BANK ONE, NA
To: XEROX CORPORATION
Reel/Frame 037736/0638 →