Liquid crystal display device free from cross talk and fabrication method thereof
View Patent ↗A liquid crystal display device free from cross talk is disclosed. The device has a supporting column, a contact part and an electrically conductive layer. The supporting column is provided for an upper substrate and vertically extended therefrom to maintain a uniform cell gap. The contact part is provided for a common line disposed at a peripheral region outside an active area of a lower substrate. The contact part faces the supporting column at a corresponding place to guide a communication between the supporting column and the common line. And, the conductive layer is formed on surfaces of the supporting column and the upper substrate. A portion of the conductive layer on the supporting column is joined to the common line within the contact part to establish a signal interconnection between the lower substrate and the upper substrate. A related fabrication method is also disclosed.
1. A liquid crystal display device having upper and lower substrates and an active area having pixels for displaying an image, the display device comprising:
a supporting column extending from the upper substrate to the lower substrate so as to maintain a uniform cell gap therebetween, said supporting column having an outer surface inclined relative to the lower substrate at a first angle, relative to the lower substrate;
a contact part having an interior surface that is inclined with respect to the lower substrate at a second angle, relative to the lower substrate, the second angle being different than the first angle, said contact part being provided for a common line disposed at a peripheral region outside the active area of the lower substrate opposite to the upper substrate, wherein the contact part faces the supporting column at a corresponding position so as to guide electrical communication between the supporting column and the common line; and
an electrically conductive layer formed on the outer surfaces of the supporting column and on a corresponding outer surface of the upper substrate, wherein a portion of the electrically conductive layer on the supporting column is joined to the common line within the contact part so as to establish a signal interconnection between the lower substrate and the upper substrate.
2. The liquid crystal display device of claim 1 , wherein an insulating layer is further provided for the common line, and the contact part is a contact hole formed in the insulating layer so as to expose a portion of the common line.
3. A method for fabricating a liquid crystal display device upper and lower substrates and having an active area having pixels for displaying an image, the method, comprising the steps of:
providing a supporting column extending from the upper substrate to a lower substrate so as to maintain a uniform cell gap between the upper substrate and the lower substrate, said supporting column having an outer surface inclined with respect to the lower substrate to form a first angle between the outer surface of the supporting column and the lower substrate;
forming an electrically conductive layer on the outer surface of the supporting column and on the upper substrate;
providing a contact part for a common line disposed at a peripheral region outside the active area of the lower substrate confronting the upper substrate, wherein the contact part faces the supporting column at a corresponding position and having an interior surface that is inclined with respect to the lower substrate to form a second angle between said interior surface and the lower substrate, said second angle being at different than the first angle; and
uniting the lower substrate and the upper substrate so that a portion of the electrically conductive layer on the supporting column is joined to the common line within the contact part, thereby establishing a signal interconnection between the lower substrate and the upper substrate.
4. The method of claim 3 , wherein the providing of the contact part includes providing an insulating layer for the common line and forming a contact hole in the insulating layer so as to expose a portion of the common line.
5. The method of claim 3 , wherein the electrically conductive layer includes an indium tin oxide (ITO) layer.