Granted Patent
Utility
US 6,596,593
· Confirmation No. 5284
METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE EMPLOYING OXYGEN IMPLANTATION
Inventor:
Kazutoshi Ishii
Inventors
Kazutoshi Ishii
Chiba-shi, JAPAN
Attorneys & Agents of Record
Classification
USPC
438/275
H10D84/013
H10D84/0151
H10D84/038
H10W10/181
H10P90/1908
Prosecution
- Examiner
- CHAUDHARI, CHANDRA P
- Art Unit
- 2813
- Docket No.
- S004-4469
- Confirmation No.
- 5284
Foreign Priority
2000-370187
·
2000-12-05
·
JAPAN
2001-110383
·
2001-04-09
·
JAPAN
2001-129891
·
2001-04-26
·
JAPAN
Publication
- Pub. No.
- US20020068406A1
- Pub. Date
- 2002-06-06
Patent Term Adjustment
-75days
Monitor This Case
Get email alerts when status or documents change.
Order Certified Copies
Most orders are placed with the USPTO same day — all within 24 business hours.
Order via The Patent Place →
Pre-filled with this application's details
Quick Facts
- Patent No.
- US 6,596,593
- App. No.
- 09/997,825
- Filed
- 2001-11-30
- Granted
- 2003-07-22
- Pub. No.
- US20020068406A1
- Examiner
- CHAUDHARI, CHANDRA P
- Art Unit
- 2813
- PTA
- -75 days
External Links