Patent Application
Utility
App. No. 10/000,324
· Confirmation No. 9760
Capacitance dielectric film and method of manufacturing the same
Inventor:
Hiroyuki Kitamura
Abandoned -- Failure to Respond to an Office Action
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Code | Description | Pages | ||
|---|---|---|---|---|---|
| 2002-03-19 | TRNA |
Transmittal of New Application | 2 | View | |
| 2002-03-19 | DRW |
Drawings-only black and white line drawings | 3 | View | |
| 2001-12-04 | TRNA |
Transmittal of New Application | 1 | View | |
| 2001-12-04 | SPEC |
Specification | 8 | View | |
| 2001-12-04 | CLM |
Claims | 7 | View | |
| 2001-12-04 | ABST |
Abstract | 1 | View | |
| 2001-12-04 | DRW |
Drawings-only black and white line drawings | 3 | View | |
| 2001-12-04 | OATH |
Oath or Declaration filed | 3 | View |
Inventors
Hiroyuki Kitamura
Tokyo, JAPAN
Attorneys & Agents of Record
Classification
USPC
257/310
H10B12/00
H10D1/696
H10B12/315
H10P14/6328
H10P14/418
Prosecution
- Examiner
- TRAN, TAN N
- Art Unit
- 2826
- Docket No.
- Q65773
- Confirmation No.
- 9760
Foreign Priority
373117/2000
·
2000-12-07
·
JAPAN
Publication
- Pub. No.
- US20020089009A1
- Pub. Date
- 2002-07-11
No related applications found.
from
NEC CORPORATION
ASSIGNMENT OF ASSIGNOR'S INTEREST
Recorded 2003-02-25
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Quick Facts
- App. No.
- 10/000,324
- Filed
- 2001-12-04
- Pub. No.
- US20020089009A1
- Examiner
- TRAN, TAN N
- Art Unit
- 2826
External Links