IP Library Granted Patent US 6,458,636
Granted Patent Utility
US 6,458,636 · Confirmation No. 1104

METHOD FOR FORMING POLYCRYSTALLINE SILICON LAYER AND METHOD FOR FABRICATING THIN FILM TRANSISTOR

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Code Description Pages PDF
2005-04-22 EBCC.AD Notice of Change of Address Place in File Wrapper Due to Electronic Business Center(EBC) Customer Number Update 1 View
2001-12-07 TRNA Transmittal of New Application 2 View
2001-12-07 A.PE Preliminary Amendment 3 View
2001-12-07 SPEC Specification 9 View
2001-12-07 CLM Claims 5 View
2001-12-07 ABST Abstract 1 View
2001-12-07 DRW Drawings-only black and white line drawings 9 View
2001-12-07 OATH Oath or Declaration filed 2 View
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Quick Facts
Patent No.
US 6,458,636
App. No.
10/005,124
Filed
2001-12-07
Granted
2002-10-01
Pub. No.
US20020042168A1
Examiner
NHU, DAVID
Art Unit
2818
PTA
0 days